公开(公告)号：US12125671B2

公开(公告)日：2024-10-22

申请号：US17778036

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Stijn Wilem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Albertus Victor Gerardus Mangnus

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/141 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/2817

Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.

公开(公告)号：US11961698B2

公开(公告)日：2024-04-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan Otten ,  Peter-Paul Crans ,  Marc Smits ,  Laura Del Tin ,  Christan Teunissen ,  Yang-Shan Huang ,  Stijn Wilem Herman Karel Steenbrink ,  Xuerang Hu ,  Qingpo Xi ,  Xinan Luo ,  Xuedong Liu

IPC: H01J37/15 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/15 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.