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71.发明授权公开(公告)号：US10955751B2
公开(公告)日：2021-03-23
申请号：US16842421
申请日：2020-04-07
Applicant: Gigaphoton Inc.
Inventor： Yuta Takashima , Yoshifumi Ueno
Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.
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公开(公告)号：US20210080842A1
公开(公告)日：2021-03-18
申请号：US16985165
申请日：2020-08-04
Applicant: Gigaphoton Inc.
Inventor： Georg SAUMAGNE
Abstract: An extreme ultraviolet light generation device according to an aspect of the present disclosure includes: a chamber; a mirror configured to condense extreme ultraviolet light radiated from plasma generated by irradiating a target supplied into the chamber with a laser beam; an electromagnet disposed outside the chamber to form a magnetic field between a generation region of the plasma in the chamber and the mirror; a current inversion device configured to invert the direction of current flowing through the electromagnet; and a controller configured to control the current inversion device to invert the direction of the current when a set condition is satisfied.
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73.发明申请公开(公告)号：US20210076478A1
公开(公告)日：2021-03-11
申请号：US16938895
申请日：2020-07-24
Applicant: Gigaphoton Inc.
Inventor： Akihiro TAKAYAMA
Abstract: An EUV light generating apparatus includes: a chamber device including an inner wall surrounding a space, and a plasma generating region in the space in which plasma is generated from a droplet irradiated with a laser beam; a heat shield including a through-hole and a channel portion, and disposed between the inner wall and the plasma generating region; a gas supply device that supplies gas; a gas introducing cylinder that is provided in the space on a side opposite to the plasma generating region, extends toward the through-hole, and introduces the gas supplied from the gas supply device through the through-hole toward the plasma generating region over the heat shield; and an optical unit optically coupled to the space through an internal space of the gas introducing cylinder and the through-hole. An entire front end surface of the gas introducing cylinder faces the heat shield.
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公开(公告)号：US10932350B2
公开(公告)日：2021-02-23
申请号：US16710208
申请日：2019-12-11
Applicant: Gigaphoton Inc.
Inventor： Tatsuya Yanagida , Osamu Wakabayashi
IPC: H05G2/00 , G03F7/20 , H01S3/223 , H01S3/06 , H01S3/11 , H01S3/08 , H01S3/107 , H01S3/23 , H01S3/16 , H01S3/00 , H01S3/102
Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.
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公开(公告)号：US10916910B2
公开(公告)日：2021-02-09
申请号：US16571390
申请日：2019-09-16
Applicant: Gigaphoton Inc.
Inventor： Shinichi Matsumoto , Miwa Igarashi
Abstract: A line narrowing module includes a prism that refracts laser light in a first plane, a grating that disperses the laser light in the first plane, first to fourth elements, and a rotation mechanism and narrows the linewidth of the laser light. The second element is supported between the first and fourth elements by the first element. The rotation mechanism rotates the second element relative to the first element around an axis intersecting the first plane. The prism is located between the second and fourth elements and so supported by the second element that the rotation mechanism rotates the prism and the second element. The third element has elasticity and is compressed and located between the prism and the fourth element. The fourth element receives reaction force from the compressed third element. The second element is mechanically independent of the fourth element in the rotational direction of the rotation mechanism.
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Patent Agency Ranking
76.发明申请公开(公告)号：US20210033981A1
公开(公告)日：2021-02-04
申请号：US16889596
申请日：2020-06-01
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber device including an internal space; a target supply unit disposed at the chamber device and configured to supply a droplet of a target substance to the internal space; a target collection unit disposed at the chamber device, communicated with the internal space through an opening provided to an inner wall of the chamber device, and configured to collect the droplet passing through the opening; a detection unit disposed at the chamber device and configured to detect the target substance accumulating in the vicinity of the opening of the inner wall; and a control unit configured to stop the target supply unit depending on a result of the detection by the detection unit.
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公开(公告)号：US10908429B2
公开(公告)日：2021-02-02
申请号：US16853585
申请日：2020-04-20
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Yuichi Nishimura
Abstract: An extreme ultraviolet light generation system according to one aspect of the present disclosure includes: a pulse laser apparatus configured to output a pulse laser beam, the pulse laser beam being supplied to a predetermined region in a chamber in which plasma containing extreme ultraviolet light is to be generated; a sensor configured to detect a beam size of the pulse laser beam; an actuator configured to change the beam size; and a controller. The controller performs, based on a first algorithm, first control that controls the actuator by a first control amount in a beam size minifying direction when the beam size has exceeded a first upper limit threshold in one burst duration, and then performs, based on a second algorithm, second control that controls the actuator by a second control amount smaller than the first control amount so that the beam size becomes closer to a target value.
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公开(公告)号：US20210026254A1
公开(公告)日：2021-01-28
申请号：US16894657
申请日：2020-06-05
Applicant: Gigaphoton Inc.
Inventor： Takanari KOBAYASHI , Hirokazu HOSODA
Abstract: An extreme ultraviolet light generation system includes: a chamber; a target generation unit; a laser system configured to output a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that fluence of the first pre-pulse laser beam is 1.5 J/cm2 to 16 J/cm2 inclusive at a position where a target is irradiated with the first pre-pulse laser beam; and a control unit configured to control the laser system so that a first delay time from a timing of irradiation of the target with the first pre-pulse laser beam to a timing of irradiation with the second pre-pulse laser beam and a second delay time from the timing of irradiation of the target with the second pre-pulse laser beam to a timing of irradiation with the main pulse laser beam have a following relation: the first delay time
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公开(公告)号：US10897118B2
公开(公告)日：2021-01-19
申请号：US16052658
申请日：2018-08-02
Applicant: Gigaphoton Inc.
Inventor： Yoshiaki Kurosawa
IPC: H01S3/23 , H01S3/104 , H01S3/10 , H01S5/0683 , H01S3/00 , H01S5/34 , H01S3/223 , H01S5/40 , H01S3/134 , H05G2/00 , G03F7/20
Abstract: The laser apparatus includes a master oscillator, an amplifier, a power source, and a controller to control the power source. The controller controls the power source such that an excitation intensity of the amplifier in a burst oscillation period performing the burst oscillation is a first excitation intensity, controls the power source such that, if the predetermined repetition frequency is a first repetition frequency, an excitation intensity of the amplifier in a suspension period suspending the burst oscillation is a second excitation intensity equal to or lower than the first excitation intensity, and controls the power source such that, if the predetermined repetition frequency is a second repetition frequency higher than the first repetition frequency, the excitation intensity of the amplifier in the suspension period is a third excitation intensity lower than the second excitation intensity.
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公开(公告)号：US10820400B2
公开(公告)日：2020-10-27
申请号：US16677882
申请日：2019-11-08
Applicant: Gigaphoton Inc.
Inventor： Hiroaki Tomuro , Shinji Nagai , Yoshiyuki Honda
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).
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