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公开(公告)号：US12284745B2
公开(公告)日：2025-04-22
申请号：US17823049
申请日：2022-08-29
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki Honda , Hirokazu Hosoda , Kouichiro Kouge
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.
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公开(公告)号：US11366390B2
公开(公告)日：2022-06-21
申请号：US17337560
申请日：2021-06-03
Applicant: Gigaphoton Inc.
Inventor： Takanari Kobayashi , Hirokazu Hosoda , Yoshiyuki Honda
IPC: G03F7/20 , H05G2/00 , H01L21/027
Abstract: An extreme ultraviolet light generation system may include a laser system emitting first prepulse laser light, second prepulse laser light, and main pulse laser light in this order; a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light; a target supply unit supplying a target to a predetermined region in the chamber; and a processor controlling the laser system to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light.
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3.发明授权公开(公告)号：US10976665B2
公开(公告)日：2021-04-13
申请号：US16989328
申请日：2020-08-10
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki Honda
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber having an internal space in which a laser beam is condensed and plasma generation occurs at a focusing position of the laser beam; a condensing mirror configured to condense extreme ultraviolet light generated through the plasma generation; and a magnetic field generation unit configured to generate a magnetic field. The condensing mirror includes a substrate, a reflective layer, and a protective layer. The protective layer includes a first protective layer disposed in a first region, and a second protective layer disposed in a second region. A material of the first protective layer is less dense than a material of the second protective layer. The material of the second protective layer has a transmittance for the extreme ultraviolet light higher than that of the material of the first protective layer.
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Patent Agency Ranking
4.发明授权公开(公告)号：US11410785B2
公开(公告)日：2022-08-09
申请号：US17230456
申请日：2021-04-14
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki Honda , Masayuki Morita
Abstract: An extreme ultraviolet light concentrating mirror may include a substrate, a multilayer reflection film provided on the substrate and configured to reflect extreme ultraviolet light, and a protective film provided on the multilayer reflection film. Here, the protective film may include a mixed film in which a network-forming oxide is mixed with an amorphous titanium oxide, or a mixed film in which two or more amorphous titanium oxide layers and two or more network-forming oxide layers are each alternately laminated.
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公开(公告)号：US10820400B2
公开(公告)日：2020-10-27
申请号：US16677882
申请日：2019-11-08
Applicant: Gigaphoton Inc.
Inventor： Hiroaki Tomuro , Shinji Nagai , Yoshiyuki Honda
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).
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6.发明申请公开(公告)号：US20210407700A1
公开(公告)日：2021-12-30
申请号：US17230456
申请日：2021-04-14
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki Honda , Masayuki Morita
Abstract: An extreme ultraviolet light concentrating mirror may include a substrate, a multilayer reflection film provided on the substrate and configured to reflect extreme ultraviolet light, and a protective film provided on the multilayer reflection film. Here, the protective film may include a mixed film in which a network-forming oxide is mixed with an amorphous titanium oxide, or a mixed film in which two or more amorphous titanium oxide layers and two or more network-forming oxide layers are each alternately laminated.
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公开(公告)号：US11614572B2
公开(公告)日：2023-03-28
申请号：US16814384
申请日：2020-03-10
Applicant: Gigaphoton Inc.
Inventor： Osamu Wakabayashi , Yoshiyuki Honda
Abstract: A mirror for extreme ultraviolet light includes: a substrate (41); a multilayer film (42) provided on the substrate and configured to reflect extreme ultraviolet light; and a capping layer (53) provided on the multilayer film, and the capping layer includes a first layer (61) containing an oxide of a metal, and a second layer (62) arranged between the first layer and the multilayer film and containing at least one of a boride of the metal and a nitride of the metal.
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8.发明授权公开(公告)号：US11924955B2
公开(公告)日：2024-03-05
申请号：US18052129
申请日：2022-11-02
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki Honda
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70191 , G03F7/70533 , G21K1/067 , H05G2/003
Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit configured to output a droplet target into a chamber device, a prepulse laser light irradiation system configured to irradiate the droplet target with prepulse laser light having linear polarization to generate a diffusion target, and a main pulse laser light irradiation system configured to irradiate the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, a cross section perpendicular to an optical axis of the main pulse laser light when being radiated to the diffusion target having a shape longer in a polarization direction of the prepulse laser light when being radiated to the droplet target than in directions other than the polarization direction.
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