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公开(公告)号：US10447001B2
公开(公告)日：2019-10-15
申请号：US15858219
申请日：2017-12-29
Applicant: GIGAPHOTON INC.
Inventor： Minoru Taniyama , Hakaru Mizoguchi , Osamu Wakabayashi
IPC: H01S3/038 , H01S3/086 , H01S3/104 , H01S3/134 , H01S3/08 , H01S3/136 , H01S3/0971 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/00
Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0
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公开(公告)号：US10371469B2
公开(公告)日：2019-08-06
申请号：US15857055
申请日：2017-12-28
Applicant: Gigaphoton Inc.
Inventor： Yasufumi Kawasuji , Masazumi Komori , Osamu Wakabayashi
Abstract: A device for controlling the temperature of cooling water includes a three-way valve having a first inlet, a second inlet, and an outlet; a first feed pipe; a second feed pipe; and a return pipe for connecting between an outlet of the temperature-control target and an inlet of the cooling water supply unit. The device also includes a return-side bypass pipe for connecting between the return pipe and the second inlet of the three-way valve; a pump provided on the second feed pipe for circulating the cooling water between the three-way valve and the temperature-control target; and a temperature measuring unit for measuring a temperature of the cooling water flowing in the second feed pipe. In addition, the device includes a controller for controlling the three-way valve and the pump in accordance with a detection result of the temperature measuring unit.
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公开(公告)号：US10172225B2
公开(公告)日：2019-01-01
申请号：US15860137
申请日：2018-01-02
Applicant: Gigaphoton Inc.
Inventor： Toru Suzuki , Tamotsu Abe , Osamu Wakabayashi , Tatsuya Yanagida
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
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公开(公告)号：US10117317B2
公开(公告)日：2018-10-30
申请号：US15832476
申请日：2017-12-05
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi , Hakaru Mizoguchi
IPC: H05G2/00 , H01S3/104 , H01S3/16 , H01S3/223 , H01S3/23 , H01S3/11 , H01S3/09 , H01S3/102 , H01S3/00
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20180236602A1
公开(公告)日：2018-08-23
申请号：US15962664
申请日：2018-04-25
Applicant: GIGAPHOTON INC.
Inventor： Akiyoshi Suzuki , Minoru Taniyama , Osamu Wakabayashi
CPC classification number: B23K26/10 , B23K26/00 , B23K26/073 , G02B26/08 , H01L21/20 , H01L21/268 , H01S3/00 , H01S3/10
Abstract: A laser irradiation apparatus may include: an irradiation head section including first and second irradiation heads each configured to perform laser light irradiation on a workpiece; a laser unit section including first and second laser units configured to respectively output first laser light and second laser light; a beam delivery section provided in an optical path between the laser unit section and the irradiation head section, and configured to perform switching of optical paths between optical paths of the first laser light and the second laser light to cause the first or second laser light to enter the first or second irradiation head; a first beam property varying section provided in an optical path between the first laser unit and the irradiation head section; and a second beam property varying section provided in an optical path between the second laser unit and the irradiation head section.
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Patent Agency Ranking
公开(公告)号：US10038295B2
公开(公告)日：2018-07-31
申请号：US15631676
申请日：2017-06-23
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
CPC classification number: H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US09883574B2
公开(公告)日：2018-01-30
申请号：US15161628
申请日：2016-05-23
Applicant: GIGAPHOTON INC.
Inventor： Fumio Iwamoto , Takashi Saito , Tsukasa Hori , Osamu Wakabayashi
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005
Abstract: An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.
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公开(公告)号：US09847618B2
公开(公告)日：2017-12-19
申请号：US15218294
申请日：2016-07-25
Applicant: Gigaphoton Inc.
Inventor： Seiji Nogiwa , Osamu Wakabayashi
CPC classification number: H01S3/1305 , G02B19/0095 , G03F7/70033 , H01S3/13 , H01S3/1307 , H01S3/2232 , H01S3/2316 , H01S3/2366 , H05G2/003 , H05G2/008
Abstract: A laser apparatus may include a beam splitter configured to split a pulse laser beam into a first beam path and a second beam path, an optical sensor provided in the first beam path, an amplifier including an amplification region provided in the second beam path and being configured to amplify and emit the pulse laser beam incident thereon along the second beam path, a wavefront controller provided in the second beam path between the beam splitter and the amplifier, and a processor configured to receive an output signal from the optical sensor and transmit a control signal to the wavefront controller.
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公开(公告)号：US09841684B2
公开(公告)日：2017-12-12
申请号：US14629282
申请日：2015-02-23
Applicant: GIGAPHOTON INC.
Inventor： Hiroshi Tanaka , Akihiko Kurosu , Hiroyuki Masuda , Hideyuki Ochiai , Osamu Wakabayashi , Masato Moriya
IPC: G03F7/20 , H01L21/268 , H01L21/67 , H01L21/66
CPC classification number: G03F7/70483 , G03F7/70041 , G03F7/70058 , G03F7/70358 , H01L21/268 , H01L21/67115 , H01L21/67253 , H01L22/10 , H01L22/26
Abstract: A light source apparatus according to an embodiment may be used for an exposure apparatus which exposes a plurality of wafers by repeating a wafer exposure for exposing a total exposure area of each wafer. The wafer exposure may include a sequential execution of scanning exposures in which each divided area defined by dividing the total exposure area of each wafer is scanned by pulsed light. The apparatus may comprise: a light source controller configured to execute a control for outputting the pulsed light based on a luminescence trigger signal received from the exposure apparatus; a detector configured to detect a characteristic of the pulsed light; and a data collection processor configured to collect at least a piece of data in data included in a pulse light data group related to the pulsed light detected by the detector and a control data group related to the control, and execute a mapping process of mapping the collected data by at least one of scanning exposure basis and wafer exposure basis.
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公开(公告)号：US09806490B2
公开(公告)日：2017-10-31
申请号：US15354670
申请日：2016-11-17
Applicant: Gigaphoton Inc.
Inventor： Hiroshi Umeda , Takeshi Asayama , Osamu Wakabayashi
IPC: H01S3/097 , H01S3/23 , H01L21/02 , H01L21/67 , H01S3/139 , B23K26/00 , H01S3/13 , H01S3/104 , H01S3/225 , H01S3/00
CPC classification number: H01S3/09702 , B23K26/00 , B23K26/0608 , H01L21/02686 , H01L21/67115 , H01S3/0057 , H01S3/104 , H01S3/1305 , H01S3/1394 , H01S3/225 , H01S3/2308 , H01S3/2383
Abstract: The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.
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