公开(公告)号：US20020077244A1

公开(公告)日：2002-06-20

申请号：US09967841

申请日：2001-09-27

Inventor： Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

IPC: C03C003/06

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02null1018 molecules/cm3 and about 0.18null1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract translation: 公开了平版印刷方法。 在一种这样的方法中，用于产生波长短于约300nm的波长小于10mJ / cm 2 /脉冲的紫外光刻辐射的脉冲紫外辐射源和具有分子氢浓度的高纯度熔融石英光刻玻璃 提供约0.02×10 18分子/ cm 3和约0.18×10 18分子/ cm 3。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

公开(公告)号：US20020015546A1

公开(公告)日：2002-02-07

申请号：US09874721

申请日：2001-06-05

Inventor： Venkata A. Bhagavatula ,  Nicholas F. Borrelli ,  Monica K. Davis ,  Edward F. Murphy

IPC: G02F001/295 ,  G02B006/34

CPC classification number: G02B6/29334 ,  C03C3/064 ,  C03C3/091 ,  C03C4/0085 ,  C03C4/04 ,  C03C4/085 ,  C03C17/3411 ,  C03C23/00 ,  C03C23/002 ,  C03C2201/21 ,  G02B6/02114 ,  G02B6/12007 ,  G02B6/124 ,  G02B6/125 ,  G02B6/29319 ,  G02B2006/12147

Abstract: The present invention provides photonic devices utilized in optical telecommunications. The photonic devices include photosensitive bulk glass bodies which contain Bragg gratings, particularly with the ultraviolet photosensitive bulk glass bodies directing optical telecommunications wavelength range bands. Preferably the ultraviolet photosensitive bulk glass bodies are batch meltable alkali boro-alumino-silicate bulk glass bodies. The invention includes an optical communications wavelength device for use with wavelength range bands, with the device comprising an input optical waveguide collimator for collimating an input light beam out of an optical waveguide to provide an unguided input light beam including at least one reflective wavelength range band nullR and at least one wavelengths range band nulln; an internal bulk Bragg grating including a transparent photosensitive bulk optical grating medium with an internal modulated refractive index grating with a grating pattern for reflecting the at least one wavelength range band nullR; at least one output coupler for outputting an at least one output wavelength range band; and a substrate structure for securing said bulk Bragg grating relative to the input collimator and the output coupler, with the bulk Bragg grating disposed in the unguided input light beam wherein the at least one wavelengths range band nulln is transmitted through the bulk Bragg grating and the at least one wavelength range band nullR is reflected by the bulk Bragg grating.

Abstract translation: 本发明提供了在光通信中使用的光子器件。 光子器件包括含有布拉格光栅的感光体玻璃体，特别是引导光通信波长范围带的紫外感光体玻璃体。 优选地，紫外线感光体玻璃体是可分批熔融的碱金属硼铝硅酸盐块状玻璃体。 本发明包括用于波长范围带的光通信波长装置，该装置包括用于将输入光束准直到光波导中的输入光波导准直器，以提供包括至少一个反射波长范围带的非导向输入光束 lambdR和至少一个波长范围lambdn; 内部体积布拉格光栅，其包括具有内部调制折射率光栅的透明感光体光栅介质，其具有用于反射所述至少一个波长范围谱带lambdR的光栅图案; 至少一个输出耦合器，用于输出至少一个输出波长范围带; 以及用于相对于输入准直器和输出耦合器固定所述体布拉格光栅的衬底结构，其中布拉格光栅布置在非导向输入光束中，其中至少一个波长范围带宽lambdn通过体布拉格光栅传输，并且 至少一个波长范围带lambdR被体布拉格光栅反射。

公开(公告)号：US20010019991A1

公开(公告)日：2001-09-06

申请号：US09851126

申请日：2001-05-09

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Abe ,  Seiki Ejima ,  Akira J. Ikushima ,  Takumi Fujiwara

IPC: C03C003/253 ,  C03C003/00

CPC classification number: C03C23/009 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/31 ,  C03B2203/26 ,  C03C3/06 ,  C03C23/002 ,  C03C23/007 ,  C03C23/0095 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/31 ,  C03C2203/54 ,  G02F1/3555 ,  G02F1/3558

Abstract: There is disclosed second-order nonlinear glass material wherein a part having second-order nonlinearity contains Ge, H and OH and has second-order nonlinear optical constant d of 1 pm/V or more, and a method for producing second-order nonlinear glass material comprising treating a porous glass material containing Ge with hydrogen, sintering it and subjecting it to a ultraviolet poling treatment. There can be provided second-order nonlinear glass material having second-order nonlinearity which is a sufficiently high and has a sufficiently long lifetime for a practical purpose, in use of the glass material for optical functional elements or the like.

Abstract translation: 公开了二阶非线性玻璃材料，其中具有二阶非线性的部分包含Ge，H和OH，并且具有1pm / V以上的二次非线性光学常数d，以及二阶非线性玻璃的制造方法 包括用氢处理含有Ge的多孔玻璃材料，烧结并对其进行紫外线处理。 在使用光学功能元件等的玻璃材料时，可以提供具有二次非线性的二阶非线性玻璃材料，该二次非线性度足够高并且在实际应用中具有足够长的使用寿命。

公开(公告)号：US6094941A

公开(公告)日：2000-08-01

申请号：US115741

申请日：1998-07-15

Applicant: Akira Fujinoki ,  Toshikatsu Matsuya ,  Hiroyuki Nishimura

Inventor： Akira Fujinoki ,  Toshikatsu Matsuya ,  Hiroyuki Nishimura

IPC: C03B19/14 ,  C03C3/06 ,  C03C15/00 ,  C03B27/012 ,  C03B37/00 ,  C03B37/01 ,  C03B37/018

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: An excellent quartz glass optical member having stable laser beam resistance, can be obtained by preparing quartz glass in a process having:a first step of subjecting a starting material obtained from silicon halide, alkoxysilane, alkylalkoxysilane, etc. to an oxidizing heat treatment in a temperature range between 600 and 1,500.degree. C., to decrease the hydrogen concentration to 5.times.10.sup.16 molecules/cm.sup.3 or less and at the same time eliminate reducing defects;a second step of subsequently holding the quartz in a hydrogen-containing atmosphere in a temperature range between 200 and 600.degree. C., to establish a hydrogen concentration in the glass of 1.times.10.sup.17 molecules/cm.sup.3 ; anda third step of carrying out a treatment of making the hydrogen concentration of the resultant quartz glass uniform in an atmosphere of air, inert gas, hydrogen, a mixture of hydrogen and inert gas, or a mixture of air and inert gas in a temperature range between 300 and 800.degree. C.

Abstract translation: 具有稳定的激光束电阻的优良的石英玻璃光学部件可以通过以下工序制备石英玻璃得到：第一步是将由卤化硅，烷氧基硅烷，烷基烷氧基硅烷等获得的原料进行氧化热处理 温度范围为600〜1500℃，将氢浓度降低至5×1016分子/ cm3以下，同时消除了缺陷; 随后在200℃至600℃的温度范围内将石英保持在含氢气氛中，以在玻璃中形成1×10 17分子/ cm 3的氢浓度; 以及在空气，惰性气体，氢气，氢气和惰性气体的混合物或空气和惰性气体的混合物的温度下进行使所得石英玻璃的氢浓度均匀的处理的第三步骤 范围在300和800℃之间

公开(公告)号：US5719698A

公开(公告)日：1998-02-17

申请号：US711471

申请日：1996-09-06

Applicant: Hiroyuki Hiraiwa ,  Issey Tanaka

Inventor： Hiroyuki Hiraiwa ,  Issey Tanaka

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20 ,  C03C3/04 ,  C03C8/04

CPC classification number: C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract translation: 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 本发明提供一种二氧化硅玻璃构件，其通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元素，用作用于UV光刻的光学元件。 另外，在二氧化硅玻璃的合成中，通过引入氢分子，而不是使用二次氢气导入来提供对紫外线照射的耐久性优异的二氧化硅玻璃。

公开(公告)号：US5702495A

公开(公告)日：1997-12-30

申请号：US479130

申请日：1995-06-07

Applicant: Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Hiroki Jinbo ,  Jun Takano ,  Seishi Fujiwara

Inventor： Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Hiroki Jinbo ,  Jun Takano ,  Seishi Fujiwara

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20 ,  C03B20/00

CPC classification number: C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract translation: 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元件，适于用作UV光刻的光学元件的二氧化硅玻璃构件。 另外，通过在合成二氧化硅玻璃时引入氢分子，可以提供在紫外线照射下的耐久性优异的二氧化硅玻璃构件，而不是二次处理导入氢。

公开(公告)号：US5699183A

公开(公告)日：1997-12-16

申请号：US484863

申请日：1995-06-07

Applicant: Hiroyuki Hiraiwa ,  Seishi Fujiwara ,  Hiroki Jinbo ,  Jun Takano ,  Norio Komine ,  Kazuhiro Nakagawa ,  Issey Tanaka

Inventor： Hiroyuki Hiraiwa ,  Seishi Fujiwara ,  Hiroki Jinbo ,  Jun Takano ,  Norio Komine ,  Kazuhiro Nakagawa ,  Issey Tanaka

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20 ,  G03B27/42

CPC classification number: C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

Abstract: Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Abstract translation: 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 本发明提供一种二氧化硅玻璃构件，其通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元素，用作用于UV光刻的光学元件。 另外，在二氧化硅玻璃的合成中，通过引入氢分子，而不是使用二次氢气导入来提供对紫外线照射的耐久性优异的二氧化硅玻璃。

公开(公告)号：US5679125A

公开(公告)日：1997-10-21

申请号：US498157

申请日：1995-07-05

Applicant: Hiroyuki Hiraiwa ,  Seishi Fujiwara ,  Norio Komine

Inventor： Hiroyuki Hiraiwa ,  Seishi Fujiwara ,  Norio Komine

IPC: C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G03F7/20 ,  C03B37/075 ,  C03C13/00 ,  G02B6/00

CPC classification number: G03F7/70058 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G03F7/70216 ,  G03F7/70958 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y10S65/90

Abstract: A method for producing a synthetic silica glass for use with vacuum ultraviolet light comprises the steps of: (a) producing a soot preform; (b) heating the soot preform in an atmosphere containing fluorine to obtain a fluorine-doped soot preform; (c) consolidating the fluorine-doped soot preform to obtain a fluorine-doped synthetic silica glass; and (d) heating the fluorine-doped synthetic silica glass in an atmosphere containing hydrogen gas to obtain a synthetic silica glass doped with fluorine and hydrogen molecules. A synthetic silica glass having both a high transmittance and high ultraviolet light resistance with respect to light in the vacuum ultraviolet wavelength range can be produced.

Abstract translation: 一种用于真空紫外光的合成石英玻璃的制造方法包括以下步骤：（a）制造烟灰预制件; （b）在含氟气氛中加热烟炱预制件以获得掺氟烟炱预制件; （c）固结氟掺杂烟炱预制件以获得掺氟合成石英玻璃; 和（d）在含有氢气的气氛中加热氟掺杂的合成石英玻璃，得到掺有氟和氢分子的合成二氧化硅玻璃。 可以制造在真空紫外线波长范围内相对于光具有高透射率和高耐紫外光性的合成二氧化硅玻璃。

公开(公告)号：US5410428A

公开(公告)日：1995-04-25

申请号：US779737

申请日：1991-10-23

Applicant: Shigeru Yamagata ,  Michiyou Kuriyama ,  Kyoichi Inaki ,  Ralf Takke

Inventor： Shigeru Yamagata ,  Michiyou Kuriyama ,  Kyoichi Inaki ,  Ralf Takke

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G03F7/20 ,  H01S3/034 ,  C03C4/08

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03C3/06 ,  C03C4/0071 ,  G02B1/00 ,  G03F7/70241 ,  H01S3/034 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/10 ,  C03C2203/54 ,  Y10S359/90 ,  Y10S501/905

Abstract: This invention relates to an optical member made of highly transparent, high-purity synthetic silica glass, to a method for manufacturing a blank or an optical member of such glass, and to the optical members themselves. The optical members have an absolute refractive index, n.sub.d, of 1.460 or more and a hydrogen molecule concentration of at least 5.times.10.sup.16 molecules/cm.sup.3 uniformly distributed throughout the glass and are particularly well suited for use in apparatus in which they are exposed to a high-power laser beam such as that produced by an excimer laser.

Abstract translation: 本发明涉及由高透明，高纯度的合成石英玻璃制成的光学构件，制造这种玻璃的坯料或光学构件的方法以及光学构件本身。 光学构件的绝对折射率nd为1.460以上，氢分子浓度至少为5×10 16分/ cm 3，均匀分布在整个玻璃中，特别适用于将其暴露于高分子量的设备中， 功率激光束，例如由准分子激光器产生的激光束。

公开(公告)号：US09932265B2

公开(公告)日：2018-04-03

申请号：US15351782

申请日：2016-11-15

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Tetsuya Haruna ,  Masaaki Hirano ,  Yoshiaki Tamura ,  Tetsuya Nakanishi

IPC: C03C3/06 ,  G02B6/02 ,  C03C13/04 ,  C03B37/027

CPC classification number: C03C13/046 ,  C03B37/02727 ,  C03B2201/50 ,  C03B2205/55 ,  C03B2205/56 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/54 ,  G02B6/02395 ,  Y02P40/57

Abstract: There is provided a method for producing a low-loss alkali metal-doped silica core optical fiber having excellent hydrogen resistance. The method for producing the optical fiber according to the present invention includes a drawing step of drawing an optical fiber preform in a drawing furnace to produce a silica glass-based optical fiber including a core region containing an alkali metal with an average concentration of 0.5 atomic ppm or more and a cladding region that surrounds the core region and a heating step of heating the optical fiber in a heating furnace through which the optical fiber drawn from the drawing furnace passes.