公开(公告)号：US06400794B1

公开(公告)日：2002-06-04

申请号：US09705662

申请日：2000-11-03

Applicant: Jörg Schultz ,  Johannes Wangler

Inventor： Jörg Schultz ,  Johannes Wangler

IPC: G21K504

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K2201/06

Abstract: The invention concerns an illumination system for wavelengths (193 nm, particularly for EUV lithography with at least one light source, which has an illumination A in one surface; at least one device for producing secondary light sources; at least one mirror or lens device, comprising at least one mirror or one lens, which is (are) divided into raster elements; one or more optical elements, which are arranged between the mirror or lens device that comprises at least one mirror or one lens, which is (are) divided into raster elements, and the reticle plane, wherein the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the light source is a light source for producing radiation with a wavelength ≦193 nm, which irradiates in a well-defined plane with a wavelength spectrum, wherein the range of wavelengths used for the application, particularly for lithography, has a beam divergence perpendicular to this plane that is smaller than 5 mrads.

Abstract translation: 本发明涉及用于波长的照明系统（193nm，特别是对于具有至少一个光源的EUV光刻，其在一个表面中具有照明A;至少一个用于产生二次光源的装置;至少一个反射镜或透镜装置， 包括被分成光栅元件的至少一个反射镜或一个透镜;布置在反射镜或透镜装置之间的一个或多个光学元件，其包括至少一个反射镜或一个透镜，其被分割 光栅元件和光罩平面，其中光学元件对照明系统的出射光瞳中的次级光源进行成像。照明系统的特征在于光源是用于产生波长< = 193nm，其在具有波长谱的明确定义的平面中照射，其中用于应用的波长范围，特别是用于光刻的波长范围具有光束偏离 相当于该平面小于5 mrads。

公开(公告)号：US5850425A

公开(公告)日：1998-12-15

申请号：US845211

申请日：1997-04-21

Applicant: Stephen W. Wilkins

Inventor： Stephen W. Wilkins

IPC: G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/29 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06

CPC classification number: A61B6/484 ,  G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/2914 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/068 ,  G21K2207/005

Abstract: An x-ray or neutron optic configuration includes a plurality of single crystal portions formed with respective spaced x-ray or neutron reflection faces formed at predetermined asymmetry angles to a Bragg diffraction plane in the respective crystal portion. The crystal portions are interconnected to maintain a first and second of these faces spaced apart for receipt of a sample between them and to allow small adjustments of the relative angle of the faces about the normal to the plane of diffraction while maintaining the normals to the Bragg planes for the first and second faces substantially in the plane of diffraction. A first face is arranged to be a monochromator and collimator with respect to x-rays or neutrons of appropriate wavelength incident reflected through the sample for receipt by the second face, which thereby serves as analyzer face.

Abstract translation: X射线或中子光学配置包括多个单晶部分，其形成有各自间隔开的x射线或中子反射面，其以相应的晶体部分中的布拉格衍射平面以预定的不对称角度形成。 晶体部分相互连接以保持这些面中的第一和第二面间隔开以便在它们之间接收样品，并且允许小面调整相对于衍射平面的法线的相对角度，同时保持与布拉格的法线 第一和第二面的平面基本上在衍射平面中。 第一面被布置为相对于通过样品反射的x射线或适当波长的中子的单色仪和准直器，由第二面接收，从而用作分析器面。

公开(公告)号：US5744813A

公开(公告)日：1998-04-28

申请号：US602844

申请日：1996-02-26

Applicant: Muradin Abubekirovich Kumakhov

Inventor： Muradin Abubekirovich Kumakhov

IPC: G01N23/04 ,  G21K1/06 ,  G02B5/124

CPC classification number: B82Y10/00 ,  G01N23/04 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/068

Abstract: The present invention provides for bending the beams, their focusing, transforming a divergent radiation into a quasi-parallel one, and vice versa, its filtering and monochromatization. Also attained are reduced radiation transfer losses, extended range of energies used, and higher radiation concentration. A possibility is provided for the use of larger radiation sources without decreasing the proportion of the captured particles, as well as for controlling the radiation spectrum. With this purpose in view, provision is made in the proposed method, apart from multiple reflection of particles upon interaction with different-density alternating media, for diffuse and potential scattering or interference of particles that diffract on multilayer structures applied to reflecting surfaces. In a device carrying the proposed method into effect, the aforementioned surfaces are coated with layers differing in electromagnetic properties. The optical system of the device appears principally as a set of miniature lenses or bemilenses 28, built up of a plurality of capillaries or polycapillaries, the walls of whose channels 24 are provided with an appropriate coating 22. No use of any support structures for forming the profiles of the optical system is required.

Abstract translation: PCT No. PCT / RU94 / 00146 Sec。 371日期1996年2月26日 102（e）日期1996年2月26日PCT提交1994年7月8日PCT公布。 第WO96 / 02058号公报 日期1996年1月25日本发明提供了弯曲梁，它们的聚焦，将发散辐射变换成准并联辐射，反之亦然，其过滤和单色化。 还获得了减少辐射传输损失，使用的能量的扩大范围和更高的辐射浓度。 提供了使用更大辐射源的可能性，而不会降低捕获的颗粒的比例，以及用于控制辐射光谱。 鉴于此目的，在所提出的方法中，除了在与不同密度的交替介质相互作用之间的多个反射颗粒之外，提供了用于扩散和潜在的散射或衍射到施加到反射表面的多层结构上的颗粒的干涉。 在实施所提出的方法的装置中，上述表面涂覆有不同电磁特性的层。 该装置的光学系统主要表现为由多个毛细管或多毛细管构成的一组微型透镜或壳体28，其通道24的壁设置有合适的涂层22.不使用任何支撑结构用于形成 需要光学系统的轮廓。

公开(公告)号：US5604782A

公开(公告)日：1997-02-18

申请号：US514134

申请日：1995-08-11

Applicant: Webster C. Cash, Jr.

Inventor： Webster C. Cash, Jr.

IPC: G02B5/08 ,  G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06

Abstract: An optical system for x-rays combines at least two spherical or near spherical mirrors for each dimension in grazing incidence orientation to provide the functions of a lens in the x-ray region. To focus x-ray radiation in both the X and the Y dimensions, one of the mirrors focusses the X dimension, a second mirror focusses the Y direction, a third mirror corrects the X dimension by removing comatic aberration and a fourth mirror corrects the Y dimension. Spherical aberration may also be removed for an even better focus. The order of the mirrors is unimportant.

Abstract translation: 用于x射线的光学系统在掠射入射取向中针对每个尺寸组合至少两个球形或近球形镜，以提供X射线区域中的透镜的功能。 为了将X射线辐射聚焦在X和Y维度中，其中一个镜子聚焦于X尺寸，第二个镜子聚焦于Y方向，第三个镜子通过去除彗形像差来校正X尺寸，第四个镜子校正Y 尺寸。 也可以去除球面像差以获得更好的聚焦。 镜子的顺序是不重要的。

公开(公告)号：USH313H

公开(公告)日：1987-07-07

申请号：US854708

申请日：1986-04-23

Applicant: Jean-Louis Staudenmann ,  Gerald L. Liedl

Inventor： Jean-Louis Staudenmann ,  Gerald L. Liedl

IPC: G21K1/06 ,  G01N23/20 ,  G01J1/00

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/067

Abstract: A monochromator for use with synchrotron x-ray radiation comprises two diffraction means which can be rotated independently and independent means for translationally moving one diffraction means with respect to the other. The independence of the rotational and translational motions allows Bragg angles from 3.5.degree. to 86.5.degree., and facilitates precise and high-resolution monochromatization over a wide energy range. The diffraction means are removably mounted so as to be readily interchangeable, which allows the monochromator to be used for both non-dispersive and low dispersive work.

公开(公告)号：US20160125968A1

公开(公告)日：2016-05-05

申请号：US14530426

申请日：2014-10-31

Applicant: Geraldine M. Hamilton

Inventor： Geraldine M. Hamilton

IPC: G21K4/00

CPC classification number: G21K4/00 ,  G21K2004/06 ,  G21K2004/12 ,  G21K2201/06

Abstract: An intensifying screen for exposing X-ray film includes a screen support backing, a luminescent layer having a luminescent material that emits light in the presence of X-rays, and a reflective layer disposed between the luminescent layer and the screen support backing, the reflective layer including a plurality of micro-prisms that reflect light emitted by the luminescent material. An X-ray film cassette includes at least one intensifying screen and a housing surrounding the at least one intensifying screen.

Abstract translation: 用于曝光X射线胶片的增强屏幕包括屏幕支撑背衬，具有在存在X射线的情况下发光的发光材料的发光层和设置在发光层和屏幕支撑背衬之间的反射层，反射 层包括反射由发光材料发射的光的多个微棱镜。 X射线胶片盒包括至少一个增强屏幕和围绕至少一个增强屏幕的壳体。

公开(公告)号：US08989353B2

公开(公告)日：2015-03-24

申请号：US13521725

申请日：2011-03-18

Applicant: Yasuhisa Kaneko

Inventor： Yasuhisa Kaneko

IPC: H01L31/18 ,  C25D5/02 ,  G21K1/06 ,  G21K1/02 ,  C25D3/00 ,  A61B6/00

CPC classification number: G21K1/06 ,  A61B6/4092 ,  A61B6/4291 ,  A61B6/484 ,  C25D3/00 ,  G21K1/02 ,  G21K1/025 ,  G21K2201/06 ,  G21K2201/067 ,  G21K2207/005

Abstract: A conductive substrate (18) and an etching substrate (20) are bonded to each other. An etch mask (25) is formed on the etching substrate (20) using a photolithography technique. On the etching substrate (20), grooves (20a) and X-ray transmitting sections (14b) are formed by dry etching using Bosch process. The grooves (20a) are filled with Au (27) by an electroplating method using the conductive substrate (18) as an electrode. Thus, X-ray absorbing sections (14a) are formed.

Abstract translation: 导电基板（18）和蚀刻基板（20）彼此接合。 使用光刻技术在蚀刻基板（20）上形成蚀刻掩模（25）。 在蚀刻基板（20）上，通过使用Bosch工艺的干蚀刻形成槽（20a）和X射线透过部（14b）。 通过使用导电性基板（18）作为电极的电镀方法将凹槽（20a）填充有Au（27）。 因此，形成X射线吸收部（14a）。

公开(公告)号：US08895946B2

公开(公告)日：2014-11-25

申请号：US13761189

申请日：2013-02-07

Applicant: Media Lario, S.R.L.

Inventor： Natale M. Ceglio ,  Daniel Stearns ,  Jacques Kools ,  Giuseppe Valsecchi ,  Fabio Zocchi ,  Riccardo Binda

IPC: H05G2/00 ,  G21K1/06 ,  G02B5/20 ,  G02B19/00 ,  G02B27/42

CPC classification number: H05G2/005 ,  G02B5/203 ,  G02B19/0095 ,  G02B27/425 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70916 ,  G21K1/067 ,  H05G2/008 ,  G21K2201/06 ,  G21K2201/064

Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.

Abstract translation: 公开了用于EUV光刻系统的源极集电极模块，其中源极 - 集电极模块采用激光产生的等离子体EUV辐射源和放电入射收集器。 通过首先形成低密度等离子体，然后用足够强度的红外辐射照射低密度等离子体来产生EUV辐射源，以产生最终的EUV发射等离子体。 掠入射收集器可以包括被配置为防止红外辐射到达中间焦点的光栅。 使用碎片减轻装置可以保持源 - 收集器模块的使用寿命。

公开(公告)号：US08744046B2

公开(公告)日：2014-06-03

申请号：US13203095

申请日：2009-03-19

Applicant: Kazuto Yamauchi ,  Hidekazu Mimura ,  Hiromi Okada

Inventor： Kazuto Yamauchi ,  Hidekazu Mimura ,  Hiromi Okada

IPC: G01N23/20

CPC classification number: G01N23/201 ,  G21K2201/06 ,  G21K2207/00

Abstract: Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion. The knife edge (4) is so set that an x-ray beam may traverse the knife edge (4) at such a thickness position as to achieve a phase shift in a range wherein a transmitted x-ray and a diffracted x-ray diffracted at the end of the knife edge may reinforce each other, and a superposed x-ray of the diffracted x-ray and the transmitted x-ray is measured by an x-ray detector.

Abstract translation: 提供了一种精确测量x射线nanobeam的强度分布的方法和装置，其可以用一个刀刃测量具有不同波长的x射线，并且可以执行对应于x射线束的焦深的最佳测量 以及使用暗场测量方法的其他测量装置的条件，其能够使用刀刃精确测量X射线束的轮廓并使用衍射和透射的x射线。 刀刃（4）由重金属形成，其使穿过其的X射线的相位前进，并且以这样的方式制造，使得厚度可以在纵向方向上连续地或以逐步的方式改变。 刀刃（4）被设定为使得X射线束可以在这样的厚度位置处横穿刀刃（4），以在其中透射的x射线和衍射的X射线衍射的范围内实现相移 在刀刃的端部可以彼此加强，并且通过x射线检测器测量衍射X射线和透射的X射线的叠加X射线。

公开(公告)号：US20140126703A1

公开(公告)日：2014-05-08

申请号：US14068322

申请日：2013-10-31

Applicant: Carl Zeiss X-ray Microscopy, Inc.

Inventor： Michael Feser ,  Alan Francis Lyon

IPC: G21K1/00

CPC classification number: G21K1/00 ,  G21K1/06 ,  G21K7/00 ,  G21K2201/06 ,  G21K2201/067

Abstract: A compound x-ray lens and method of fabricating these lenses are disclosed. These compound lenses use multiple zone plate stacking to achieve a pitch frequency increase for the resulting combined zone plate. The compound equivalent zone plate includes a first zone plate having an initial pitch frequency stacked onto a second zone plate to form an equivalent compound zone plate. The equivalent zone plate has a pitch frequency that is at least twice the initial pitch frequency. Also, in one example, the equivalent zone plate has a mark-to-space ratio of 1:1.

Abstract translation: 公开了一种复合X射线透镜及其制造方法。 这些复合透镜使用多个区域板堆叠来实现所得到的组合区域板的俯仰频率增加。 化合物等效区域板包括具有堆叠在第二区域板上的初始间距频率以形成等效的复合区域板的第一区域板。 等效区域板具有至少是初始俯仰频率的两倍的俯仰频率。 而且，在一个示例中，等效的带状板具有1：1的标记空间比。