Wiring board, wiring board manufacturing method, and via paste
    71.
    发明授权
    Wiring board, wiring board manufacturing method, and via paste 有权
    接线板,接线板制造方法和通孔贴

    公开(公告)号:US08563872B2

    公开(公告)日:2013-10-22

    申请号:US13145271

    申请日:2011-02-22

    Abstract: A wiring board includes a plurality of wirings laid via an insulating resin layer, and a via-hole conductor provided for electrically connecting the wirings. The via-hole conductor includes metal and resin portions. The metal portion includes a region made of copper particles, a first metal region mainly composed of tin, a tin-copper alloy, or a tin-copper intermetallic compound, and a second metal region mainly composed of bismuth, and has Cu/Sn of from 1.59 to 21.43. The copper particles are in contact with one another, thereby electrically connecting the wirings, and at least part of the first metal region covers around and extends over the portions where the copper particles are in plane contact with one another.

    Abstract translation: 布线板包括通过绝缘树脂层铺设的多条布线,以及用于电连接布线的通孔导体。 通孔导体包括金属和树脂部分。 金属部分包括由铜颗粒制成的区域,主要由锡,锡 - 铜合金或锡 - 铜金属间化合物构成的第一金属区域和主要由铋组成的第二金属区域,并且具有Cu / Sn 从1.59到21.43。 铜颗粒彼此接触,从而电连接布线,并且第一金属区域的至少一部分围绕并延伸到铜颗粒彼此平面接触的部分上。

    Rolled Copper Foil or Electrolytic Copper Foil for Electronic Circuit, and Method of Forming Electronic Circuit Using Same
    72.
    发明申请
    Rolled Copper Foil or Electrolytic Copper Foil for Electronic Circuit, and Method of Forming Electronic Circuit Using Same 审中-公开
    用于电子电路的轧制铜箔或电解铜箔,以及使用其形成电子电路的方法

    公开(公告)号:US20130270218A1

    公开(公告)日:2013-10-17

    申请号:US13912406

    申请日:2013-06-07

    Abstract: A rolled copper foil or electrolytic copper foil for an electronic circuit to be used for forming a circuit by etching, characterized in comprising a layer of metal of one or more types among a platinum group, gold and silver with an etching rate that is lower than the copper formed on an etching surface side of the rolled copper foil or the electrolytic copper foil, or alternatively comprising a layer of an alloy having the above-described metal as its main component. The following can be achieved upon forming a circuit by etching a copper foil of a copper clad laminate: sagging caused by the etching is prevented; a uniform circuit of the intended circuit width is formed; the time required to form a circuit by etching is reduced; etching properties in pattern etching are improved; and the occurrence of short circuits and defects in the circuit width are prevented.

    Abstract translation: 一种用于通过蚀刻形成电路的电子电路用的卷绕铜箔或电解铜箔,其特征在于,在铂族金,金和银中含有一种或多种类型的金属,其蚀刻速率低于 形成在轧制铜箔或电解铜箔的蚀刻表面侧上的铜,或者可选地包括具有上述金属作为其主要成分的合金层。 通过蚀刻覆铜层压板的铜箔形成电路可以实现以下目的:防止由蚀刻引起的下垂; 形成预期电路宽度的均匀电路; 减少了通过蚀刻形成电路所需的时间; 图案蚀刻中的蚀刻性能得到改善; 并且防止电路宽度的短路和缺陷的发生。

    Method for Forming Circuit on Flexible Laminate Substrate
    74.
    发明申请
    Method for Forming Circuit on Flexible Laminate Substrate 审中-公开
    柔性层压基板上形成电路的方法

    公开(公告)号:US20130256006A1

    公开(公告)日:2013-10-03

    申请号:US13884650

    申请日:2011-11-08

    Abstract: A method for forming a circuit on a flexible laminate substrate, wherein when a circuit is formed using an adhesive-free flexible laminate having a polyimide film that serves as a flexible laminate substrate at least one surface of which is plasma-treated, a tie-coat layer A formed on the polyimide film, a metal conductor layer B formed on the tie-coat layer, and a nickel-copper alloy layer as an alloy layer C on the metal conductor layer, a photoresist is applied on the alloy layer C formed on the metal conductor layer, the photoresist is exposed and developed, the sputter layer C, the metal conductor layer B, and the alloy layer C are removed by etching using the same etching solution so as to retain a circuit portion, and the photoresist of the circuit portion is further removed so as to form the circuit.

    Abstract translation: 一种在柔性层压基板上形成电路的方法,其中当使用不含粘合剂的柔性层压体形成电路时,该层压板具有聚酰亚胺膜,该聚酰亚胺膜用作至少一个表面被等离子体处理的柔性层压基板, 形成在聚酰亚胺膜上的涂层A,在接合涂层上形成的金属导体层B和在金属导体层上作为合金层C的镍 - 铜合金层,在形成的合金层C上施加光致抗蚀剂 在金属导体层上,曝光和显影光致抗蚀剂,通过使用相同的蚀刻溶液进行蚀刻来去除溅射层C,金属导体层B和合金层C,以便保持电路部分,并且光致抗蚀剂 电路部分被进一步去除以形成电路。

    Surface treated copper foil and copper clad laminate
    76.
    发明授权
    Surface treated copper foil and copper clad laminate 有权
    表面处理铜箔和覆铜层压板

    公开(公告)号:US08512873B2

    公开(公告)日:2013-08-20

    申请号:US13055353

    申请日:2009-07-22

    Abstract: To provide a surface treated copper foil satisfying all of the bonding strength to polyimide film, chemical resistance, and etching property, and to provide a CCL using the surface treated copper foil, a surface treated copper foil is formed being comprising an untreated copper foil on at least one surface of which Ni—Zn alloy is deposited, wherein Zn content (wt %)=Zn deposition amount/(Ni deposition amount+Zn deposition amount)×100 is 6% or more and 15% or less, and Zn deposition amount is 0.08 mg/dm2 or more, or, a CCL is formed being comprising a surface treated copper foil and a polyimide film laminated on the surface treated copper foil, wherein the surface treated copper foil comprises an untreated copper foil on at least one surface of which Ni—Zn alloy is deposited, Zn content (wt %)=Zn deposition amount/(Ni deposition amount+Zn deposition amount)×100 is 6% or more and 15% or less, and Zn deposition amount is 0.08 mg/dm2 or more.

    Abstract translation: 为了提供满足与聚酰亚胺膜的全部接合强度的表面处理铜箔,耐化学性和蚀刻性能,并且使用表面处理铜箔提供CCL,形成表面处理铜箔,其包括未处理的铜箔 其中Zn含量(wt%)= Zn沉积量/(Ni沉积量+ Zn沉积量)×100为6%以上且15%以下,Zn沉积物的至少一个表面为Ni-Zn合金,Zn沉积量 量为0.08mg / dm 2以上,或者由表面处理铜箔和层叠在表面处理铜箔上的聚酰亚胺膜形成CCL,其中表面处理铜箔在至少一个表面上包含未处理的铜箔 其中沉积Ni-Zn合金,Zn含量(wt%)= Zn沉积量/(Ni沉积量+ Zn沉积量)×100为6%以上且15%以下,Zn沉积量为0.08mg / dm2以上。

    Transfer film and method for fabricating a circuit
    79.
    发明授权
    Transfer film and method for fabricating a circuit 有权
    转印膜和制造电路的方法

    公开(公告)号:US08398869B2

    公开(公告)日:2013-03-19

    申请号:US12277391

    申请日:2008-11-25

    Abstract: A method of fabricating a circuit includes bonding an electrically conductive layer to a carrier film using an adhesive selected from acrylic polymer and silicone polymer, removing selected portions of the electrically conductive layer from the carrier film to provide a circuit arrangement, and transferring the circuit arrangement from the carrier film to a substrate.

    Abstract translation: 一种制造电路的方法包括使用选自丙烯酸聚合物和硅氧烷聚合物的粘合剂将导电层粘合到载体膜上,从载体膜去除导电层的选定部分以提供电路布置,并将电路装置 从载体膜到基底。

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