公开(公告)号：US20040091798A1

公开(公告)日：2004-05-13

申请号：US10702266

申请日：2003-11-05

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: G03F009/00 ,  C03C015/00 ,  C03C003/04 ,  C03C003/06 ,  C03C003/112 ,  G03C005/00

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content

Abstract translation: 公开了具有优选氟含量<0.5重量％的氟氧化硅玻璃，适合用作光刻应用中的低于190nm的VUV波长区域的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不具有OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低 氯水平。

公开(公告)号：US20040057692A1

公开(公告)日：2004-03-25

申请号：US10231865

申请日：2002-08-28

Inventor： Laura J. Ball ,  Bruno P. M. Baney ,  Dana C. Bookbinder ,  Keith L. House ,  Rostislav R. Khrapko ,  Susan L. Schiefelbein

IPC: G02B006/00

CPC classification number: C03C3/06 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/01426 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/26 ,  C03B2207/30 ,  C03B2207/90 ,  C03C25/602 ,  C03C25/607 ,  C03C25/68 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/50 ,  G02B6/02

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract translation: 公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。 石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。 含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。 石英玻璃制品可以进一步加工以形成完整的光纤预型件。 当预成型件被拉入光纤时，表现出低的衰减。

公开(公告)号：US06705115B2

公开(公告)日：2004-03-16

申请号：US09747953

申请日：2000-12-27

Applicant: Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota

Inventor： Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota

IPC: C03B1914

CPC classification number: C03B19/1423 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40

Abstract: A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses Si—Si bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.

Abstract translation: 使用由多个同心喷嘴构成的燃烧器来生产合成石英玻璃的方法包括以下步骤：将来自中心喷嘴的二氧化硅生成原料气体和氟化合物气体供给到反应区域，从第二喷嘴 在中心喷嘴外部，并且从第三喷嘴供给氧气和/或氢气。 二氧化硅形成原料气体被水解以形成二氧化硅细颗粒，该颗粒沉积在可转动的基底上，以便形成多孔二氧化硅基质，然后熔化以得到石英玻璃。 控制从第二喷嘴供给的氧气的流量和原料气体的流量，从而提供1.1-3.5倍化学计量的过量的氧气。 过量的氧抑制石英玻璃中的Si-Si键的形成，能够在真空紫外线区域中制造具有高透射率的合成石英玻璃。

公开(公告)号：US20030140659A1

公开(公告)日：2003-07-31

申请号：US10296089

申请日：2002-11-22

Inventor： Heinz Fabian

IPC: C03B037/028

CPC classification number: C03B37/01211 ,  C03B37/014 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12

Abstract: In a known procedure for the manufacture of an optical fiber by drawing from a preform with a core-clad structure or from a coaxial arrangement of several components forming a core-clad structure, a core cylinder is produced with a soot deposition method, with the core cylinder having a core glass layer of a higher refractive index, nullnKnull, and outer diameter, nulldKnull, said core glass layer being encased by a first cladding glass layer having a lower refractive index, nullnM1null, and outer diameter, nulldM1null, followed by applying a second cladding glass layer onto the core cylinder. The modification of this procedure according to the invention is characterized by its lower optical fiber production costs. This is achieved by providing the second cladding glass layer (4) in the form of a cladding tube manufactured in a separate step of the procedure, said cladding tube having a mean OH concentration of max. 1 wt.-ppm, and applying the second cladding glass layer (4) by collapsing the cladding tube onto the core cylinder (2; 3), and by using a core cylinder with a nulldM1null/nulldKnull ratio between 1 and 2.2 and a mean OH concentration of max. 1 wt-ppm in its superficial area up to a depth of 10 nullm (FIG. 1).

Abstract translation: 在通过从具有芯包层结构的预成型件或由形成芯包层结构的多个部件的同轴布置拉制制造光纤的已知方法中，使用烟灰沉积方法制造芯筒， 具有较高折射率的核心玻璃层“nK”和外径“dK”的芯部圆筒，所述芯部玻璃层被具有较低折射率的第一包层玻璃层“nM1”和外径 ，“dM1”，然后在核心圆筒上施加第二包层玻璃层。 根据本发明的该过程的修改的特征在于其较低的光纤生产成本。 这是通过在步骤的单独步骤中提供以包层管形式形成的第二包覆玻璃层（4）来实现的，所述包层管的平均OH浓度为最大。 1重量ppm，并且通过将包层管折叠到芯筒（2; 3）上并通过使用具有“dM1”/“dK”比的芯筒在1和1之间施加第二包层玻璃层 2.2和平均OH浓度最大。 在其表层面积为1重量ppm至10微米深度（图1）。

公开(公告)号：US20030110811A1

公开(公告)日：2003-06-19

申请号：US10304844

申请日：2002-11-26

Applicant: SINGLE MODE OPTICAL FIBER AND MANUFACTURING METHOD THEREFOR

Inventor： Tomohiro Nunome ,  Hiroshi Kutami ,  Manabu Saitou ,  Kenji Okada ,  Munehisa Fujimaki ,  Koichi Harada

IPC: C03B037/025

CPC classification number: C03B37/01413 ,  C03B37/02718 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2205/56 ,  G02B6/03622 ,  Y02P40/57

Abstract: An optical fiber is formed by performing vapor phase deposition of SiO2 on the outside of a glass rod comprising a core section and a first cladding section and drawing a glass preform which formed by a second cladding section. Also, a single mode optical fiber is manufactured so that the ratio of the diameter D of the first cladding section and the diameter d of the core section is in a range of 4.0 to 4.8, and OH concentration is 0.1 ppm or less. Also, an optical fiber is manufactured so that a value of D/d>4.8, and the OH concentration is 0.1 ppm or less. It is thereby possible to maintain an initial loss in the 1380 nm wavelength range even if hydrogen diffusion occurs.

Abstract translation: 通过在包括芯部和第一包层部分的玻璃棒的外部进行SiO 2的气相沉积并且拉制由第二包层部形成的玻璃预制件来形成光纤。 此外，制造单模光纤，使得第一包层部分的直径D和芯部分的直径d的比率在4.0至4.8的范围内，并且OH浓度为0.1ppm或更小。 此外，制造光纤，使得D / d> 4.8，OH浓度为0.1ppm以下。 因此即使发生氢扩散，也可以保持1380nm波长范围的初始损耗。

公开(公告)号：US20030096693A1

公开(公告)日：2003-05-22

申请号：US10298924

申请日：2002-11-19

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Yuichi Ohga ,  Tadashi Enomoto

IPC: C03C003/06 ,  C03C003/112

CPC classification number: C03C23/0025 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/70 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/54

Abstract: Fluorine-containing glass which comprises silica and contains, in said silica, not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, said fluorine-containing glass having a concentration ratio of F/Cl of 100 or more. Also disclosed is fluorine-containing glass which contains not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, and has a concentration ratio of F/Cl of 1000 or more.

公开(公告)号：US06466365B1

公开(公告)日：2002-10-15

申请号：US09567725

申请日：2000-05-10

Applicant: Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

Inventor： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC: G02B1314

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract translation: 本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用不大于约193nm的真空紫外光（VUV）光刻波长的240nm以下的光学光刻系统的光学光刻元件，例如VUV投影光刻系统 利用193nm或157nm区域中的波长。 光学器件利用沉积的氟氧化硅膜操纵小于250nm的真空紫外光刻光。 沉积的氟氧化硅光学涂层有助于对入射光的操纵并保护底层的光学材料，层和表面。

公开(公告)号：US20020144521A1

公开(公告)日：2002-10-10

申请号：US10117228

申请日：2002-04-08

Applicant: ALCATEL

Inventor： Gerard Orcel ,  Marc Nicolardot ,  Jean-Florent Campion

IPC: C03B037/018 ,  C03B037/075

CPC classification number: C03B37/01291 ,  C03B37/01205 ,  C03B37/01892 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20

Abstract: The invention provides a low cost method of manufacturing high capacity preforms by chemical vapor deposition. More particularly, there is described a method of manufacturing an optical fiber preform, which method comprises the steps of providing a substrate tube of silica doped with sufficient chlorine to obtain an OH concentration of less than 100 ppb and doped with sufficient fluorine proportional to the chlorine doping to obtain a refractive index that is lower than that of a natural silica, depositing inner cladding and an optical core inside the substrate tube, collapsing the substrate tube to form a primary preform, and depositing outer cladding of said natural silica on the resulting primary preform. The invention is applicable to manufacturing optical fibers.

Abstract translation: 本发明提供了一种通过化学气相沉积制造高容量预成型件的低成本方法。 更具体地，描述了一种制造光纤预制件的方法，该方法包括以下步骤：提供掺杂足够氯的二氧化硅衬底管，以获得小于100ppb的OH浓度并掺入与氯成正比的足够的氟 掺杂以获得低于天然二氧化硅的折射率，在衬底管内沉积内包层和光学芯，使衬底管折叠以形成初级预制件，并将所述天然二氧化硅的外包层沉积在所得到的初级 预制件。 本发明适用于制造光纤。

公开(公告)号：US20020134111A1

公开(公告)日：2002-09-26

申请号：US09997782

申请日：2001-11-28

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03C023/00 ,  C03B032/00

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a nulldry,null silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06451719B1

公开(公告)日：2002-09-17

申请号：US09692014

申请日：2000-10-19

Applicant: Shigeru Yamagata

Inventor： Shigeru Yamagata

IPC: C03C306

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y10S501/905

Abstract: A silica glass optical material for transmitting light with a wavelength of from 155 to 195 nm emitted from an excimer laser or an excimer lamp, which comprises silica glass optical material of ultrahigh purity, containing from 1 to 100 wtppm of OH groups, from 5×1016 to 5×1019 molecules/cm3 of H2, and from 10 to 10,000 wtppm of F, but substantially free from halogens other than F, and having a fluctuation in refractive index, &Dgr;n, of from 3×10−6 to 3×10−7.

Abstract translation: 一种二氧化硅玻璃光学材料，用于从准分子激光或准分子灯发射波长为155至195nm的光，其包括含有1至100重量ppm的OH基团的超高纯度的石英玻璃光学材料，从5×10 16至 5×1019分子/ cm 3的H 2和10至10,000重量ppm的F，但基本上不含F以外的卤素，并且具有3×10 -6至3×10 -7的折射率DELTAn。