公开(公告)号：US20140373571A1

公开(公告)日：2014-12-25

申请号：US14269409

申请日：2014-05-05

Applicant: Corning Incorporated

Inventor： Kenneth Edward Hrdina ,  Changyi Lai ,  Lisa Anne Moore ,  Ulrich Wilhelm Heinz Neukirch ,  William Rogers Rosch

IPC: C03C23/00

CPC classification number: C03C23/0095 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/22 ,  C03C3/06 ,  C03C4/0085 ,  C03C21/007 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54

Abstract: A fused silica glass article having greater resistance to damage induced by exposure to laser radiation such as laser induced wavefront distortion at deep ultraviolet (DUV) wavelengths, and behaviors such as fluence dependent transmission, which are related to intrinsic defects in the glass. The improved resistance to laser damage may be achieved in some embodiments by loading the glass article with molecular hydrogen (H2) at temperatures of about 400° C. or less, or 350° C. or less. The combined OH and deuteroxyl (OD) concentration may be less than 10 ppm by weight. In other embodiments, the improved resistance may be achieved by providing the glass with 10 to 60 ppm deuteroxyl (OD) species by weight. In still other embodiments, improved resistance to such laser damage may be achieved by both loading the glass article with molecular hydrogen at temperatures of about 350° C. or less and providing the glass with less than 10 ppm combined OH and OD, or 10 to 60 ppm OD by weight.

Abstract translation: 一种熔融石英玻璃制品，其具有较强的耐受暴露于激光辐射（例如在深紫外（DUV）波长处的激光诱导波前失真）以及与玻璃中的固有缺陷有关的诸如通量依赖透射的行为的损伤。 在一些实施方案中，可以通过在约400℃或更低或350℃或更低的温度下加载具有分子氢（H 2）的玻璃制品来实现对激光损伤的改进的抗性。 组合的OH和氘氧化（OD）浓度可以小于10ppm重量。 在其它实施方案中，可以通过为玻璃提供10至60ppm的重量的氘氧化（OD）种类来实现改进的电阻。 在另外的其它实施方案中，可以通过在大约350℃或更低的温度下将玻璃制品加载到分子氢中来提供对这种激光损伤的改进的抗性，并且使玻璃具有小于10ppm的组合的OH和OD，或10至 60ppm OD重量。

公开(公告)号：US08820122B2

公开(公告)日：2014-09-02

申请号：US13223808

申请日：2011-09-01

Applicant: Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

IPC: C03B37/018

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/62 ,  C03B2207/64 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/42

Abstract: A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.

Abstract translation: 通过将供氧反应气体和提供钛的反应气体与氢气和氧气一起通过燃烧器进行供给，使反应物气体进行氧化或火焰水解以形成合成物，制备适合作为EUV光刻元件的二氧化钛掺杂石英玻璃 二氧化硅 - 二氧化钛细颗粒，将颗粒沉积在旋转靶上，并同时熔化和玻璃化沉积的颗粒以生长掺杂二氧化钛的石英玻璃的锭。 目标被缩回，使得锭的生长前部可以与燃烧器尖端间隔至少250mm的距离。

公开(公告)号：US20120219260A1

公开(公告)日：2012-08-30

申请号：US13403983

申请日：2012-02-24

Applicant: Hiroshi OYAMADA

Inventor： Hiroshi OYAMADA

IPC: G02B6/028 ,  C03C25/60

CPC classification number: C03C25/607 ,  C03C2201/21 ,  C03C2201/22

Abstract: A method for manufacturing deuterium-treated silica glass includes exposing silica glass to a deuterium-containing atmosphere for a predetermined period of time to diffuse deuterium molecules within the silica glass, maintaining the silica glass at 40° C. or higher, and cooling the silica glass to room temperature. The silica glass is a silica glass-based optical fiber having a core made of silica glass, where the core is positioned at a center of the optical fiber and contains at least germanium, and a clad made of silica glass, where the clad surrounds the core and has a lower refractive index than the core. A surface of the silica glass is covered with a resin coating.

Abstract translation: 制备氘处理石英玻璃的方法包括将二氧化硅玻璃暴露于含氘气氛中一段预定的时间以将氘分子扩散到二氧化硅玻璃内，保持二氧化硅玻璃在40℃或更高，并冷却二氧化硅 玻璃到室温。 石英玻璃是具有由石英玻璃制成的芯的二氧化硅玻璃基光纤，其中芯位于光纤的中心并且至少包含锗，并且由石英玻璃制成的包层，其中包层围绕 并具有比芯更低的折射率。 石英玻璃的表面被树脂涂层覆盖。

公开(公告)号：US08176752B2

公开(公告)日：2012-05-15

申请号：US12507950

申请日：2009-07-23

Applicant: Susan Lee Schiefelbein ,  Charlene Marie Smith

Inventor： Susan Lee Schiefelbein ,  Charlene Marie Smith

IPC: C03B19/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B32/00 ,  C03B2201/21 ,  C03C4/0071 ,  C03C4/0085 ,  C03C23/0025 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.

Abstract translation: 石英玻璃制品，例如步进/扫描仪系统中的透镜，在小于约250nm的波长处具有饱和诱导吸收。 通过首先通过在这种缺陷处形成硅氢化物（SiH）来除去二氧化硅玻璃中的Si-O缺陷，并将石英玻璃与氢气一起加载到石英玻璃制品中通过SiH光解产生的E'中心反应而实现饱和诱导吸收 。 氢化硅是通过在至少475℃的温度下加载二氧化硅玻璃与分子氢形成的。在形成SiH之后，二氧化硅玻璃在小于475℃的温度下装载另外的分子氢。

公开(公告)号：US08012653B2

公开(公告)日：2011-09-06

申请号：US12490833

申请日：2009-06-24

Applicant: Akio Koike ,  Ken Ebihara

Inventor： Akio Koike ,  Ken Ebihara

IPC: G03F1/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/21 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/14 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  Y02P40/57

Abstract: A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.

Abstract translation: 提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。 由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量 基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。

公开(公告)号：US07954340B2

公开(公告)日：2011-06-07

申请号：US12417466

申请日：2009-04-02

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota ,  Osamu Sekizawa

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota ,  Osamu Sekizawa

IPC: C03C19/00

CPC classification number: C03B19/1469 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/32 ,  C03B2207/34 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/21 ,  Y02P40/57

Abstract: When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.

Abstract translation: 当从合成石英玻璃块制备合成石英玻璃基板时，（I）该嵌段的氢分子浓度为5×1017-1×1019分子/ cm3，（II）基板的氢分子浓度为5× 1015-5×1017分子/ cm3，（III）基板的内部透射率在193.4nm处具有高达0.2％的面内变化，（IV）基板的内透射率至少为99.6％ 193.4nm。 合成石英玻璃基板具有高透射率和均匀的透射率分布，并且适用于准分子激光器，特别是ArF准分子激光器。

公开(公告)号：US20090288448A1

公开(公告)日：2009-11-26

申请号：US12512436

申请日：2009-07-30

Applicant: Shigeru MAIDA ,  Motoyuki YAMADA

Inventor： Shigeru MAIDA ,  Motoyuki YAMADA

IPC: C03C17/23

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US07501367B2

公开(公告)日：2009-03-10

申请号：US11403267

申请日：2006-04-13

Applicant: Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

Inventor： Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件，用于工作波长低于250nm的浸没式光刻，其被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应显示几种性能的组合：特别是基本上没有氧缺陷的玻璃结构，羟基的平均含量小于60重量ppm，氟的平均含量小于 10重量ppm，氯的平均含量小于1重量ppm。 一种制造这种光学元件的方法包括以下方法步骤：在还原条件下制备和干燥SiO 2烟炱体，并在玻璃化之前或期间用与石英玻璃结构的氧缺陷反应的试剂处理干燥的烟炱体。

公开(公告)号：US07368403B2

公开(公告)日：2008-05-06

申请号：US10969954

申请日：2004-10-22

Applicant: Yoshiaki Ikuta ,  Noriyuki Agata

Inventor： Yoshiaki Ikuta ,  Noriyuki Agata

IPC: C03C3/06

CPC classification number: G03F7/70958 ,  C03C3/06 ,  C03C2201/21 ,  G02B1/02

Abstract: A synthetic quartz glass for an optical member, which is to be used in an optical device employing an ArF excimer laser beam as a light source at an energy density of at most 2 mJ/cm2/pulse or in an optical device employing a KrF excimer laser beam as a light source at an energy density of at most 30 mJ/cm2/pulse, characterized in that the hydrogen molecule concentration is within a range of at least 1×1016 molecules/cm3 and less than 5×1016 molecules/cm3.

Abstract translation: 一种用于光学构件的合成石英玻璃，其用于以能量密度为至多2mJ / cm 2 /脉冲的ArF准分子激光束作为光源的光学装置，或 在使用KrF准分子激光束作为光源的能量密度为至多30mJ / cm 2 /脉冲的光学装置中，其特征在于，所述氢分子浓度在至少 1×10 16分子/ cm 3和小于5×10 16分子/ cm 3。

公开(公告)号：US07232778B2

公开(公告)日：2007-06-19

申请号：US10315984

申请日：2002-12-11

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota

IPC: C03C3/06

CPC classification number: C03B19/1415 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52

Abstract: In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, striae visible when viewed from a direction perpendicular to the silica growth direction are distributed periodically over the silica growth direction. The ingot can be used in the production of optical-grade high-homogeneity synthetic quartz glass elements for excimer laser applications, particularly ArF excimer laser applications, in the production of laser damage-resistant optical elements used with light sources such as excimer lasers, and in the production of UV optical fiber.

Abstract translation: 在通过气相水解或氧化分解氧化氢火焰中的二氧化硅形成起始化合物而生成的合成石英玻璃锭中，使得二氧化硅生长沿方向发生在二氧化硅颗粒沉积和熔化面上，从方向观察可见的条纹 垂直于二氧化硅生长方向在二氧化硅生长方向周期性地分布。 该锭可用于生产用于准分子激光应用的光学级高均匀合成石英玻璃元件，特别是ArF准分子激光应用，用于生产与诸如准分子激光器的光源一起使用的激光损伤光学元件，以及 在生产UV光纤时。