公开(公告)号：US07312170B2

公开(公告)日：2007-12-25

申请号：US10548237

申请日：2004-03-03

Applicant: Hiroyuki Nishimura ,  Akira Fujinoki

Inventor： Hiroyuki Nishimura ,  Akira Fujinoki

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC classification number: C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

Abstract: The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

Abstract translation: 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US07248763B1

公开(公告)日：2007-07-24

申请号：US10885892

申请日：2004-07-06

Applicant: Dmitri A. Kossakovski ,  Vladimir Ilchenko

Inventor： Dmitri A. Kossakovski ,  Vladimir Ilchenko

IPC: G02B6/26 ,  G02B6/42

CPC classification number: G02B6/34 ,  C03B32/00 ,  C03C3/06 ,  C03C19/00 ,  C03C2201/22 ,  C03C2201/23 ,  C09G1/04

Abstract: This application describes optical resonators substantially free of hydrogen and hydroxyl radicals and related fabrication techniques.

Abstract translation: 本申请描述了基本上不含氢和羟基的光学谐振器和相关的制造技术。

公开(公告)号：US07232778B2

公开(公告)日：2007-06-19

申请号：US10315984

申请日：2002-12-11

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota

IPC: C03C3/06

CPC classification number: C03B19/1415 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52

Abstract: In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, striae visible when viewed from a direction perpendicular to the silica growth direction are distributed periodically over the silica growth direction. The ingot can be used in the production of optical-grade high-homogeneity synthetic quartz glass elements for excimer laser applications, particularly ArF excimer laser applications, in the production of laser damage-resistant optical elements used with light sources such as excimer lasers, and in the production of UV optical fiber.

Abstract translation: 在通过气相水解或氧化分解氧化氢火焰中的二氧化硅形成起始化合物而生成的合成石英玻璃锭中，使得二氧化硅生长沿方向发生在二氧化硅颗粒沉积和熔化面上，从方向观察可见的条纹 垂直于二氧化硅生长方向在二氧化硅生长方向周期性地分布。 该锭可用于生产用于准分子激光应用的光学级高均匀合成石英玻璃元件，特别是ArF准分子激光应用，用于生产与诸如准分子激光器的光源一起使用的激光损伤光学元件，以及 在生产UV光纤时。

公开(公告)号：US20070134566A1

公开(公告)日：2007-06-14

申请号：US11634270

申请日：2006-12-06

Applicant: Shigeru Maida ,  Motoyuki Yamada

Inventor： Shigeru Maida ,  Motoyuki Yamada

IPC: G02B6/42 ,  B32B15/00 ,  C03B37/018 ,  C03B8/00 ,  B32B17/06 ,  G03F1/00 ,  G02B6/26

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US07159418B2

公开(公告)日：2007-01-09

申请号：US09930693

申请日：2001-08-17

Applicant: Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Shigeru Maida

Inventor： Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Shigeru Maida

IPC: C03B19/14 ,  C03C3/06

CPC classification number: C03B19/1453 ,  C03B19/1423 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/64 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  C03C2203/54 ,  Y02P40/57

Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90–120° so that the porous silica matrix has a density of 0.1–1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.

Abstract translation: 含氟合成石英玻璃是通过将二氧化硅形成材料，氢气和氧气从燃烧器送入反应区而产生的，火焰水解反应区中二氧化硅形成材料，形成二氧化硅颗粒，将二氧化硅颗粒沉积在 反应区中的可旋转基底，形成多孔二氧化硅基质，并在含氟化合物气体的气氛中加热和玻璃化多孔二氧化硅基质。 在形成多孔二氧化硅基体期间，将二氧化硅基体的中心轴线与来自燃烧器的形成二氧化硅的反应物火焰之间的角度调节至90-120°，使得多孔二氧化硅基质的密度为0.1-1.0g / cm 3，窄分布在0.1g / cm 3以内。 所得的石英玻璃对于低于200nm的真空紫外线区域的光具有高透射率。

公开(公告)号：US20060281623A1

公开(公告)日：2006-12-14

申请号：US11266638

申请日：2005-11-03

Applicant: Michael Winnen ,  Todd Springer

Inventor： Michael Winnen ,  Todd Springer

IPC: C03C3/06 ,  C03B11/00 ,  C03B13/00 ,  C03B23/00 ,  C03B18/02

CPC classification number: C03B20/00 ,  C03B19/02 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C10/0009 ,  C03C2201/23 ,  Y02P40/57

Abstract: A method to form quartz glass ingots of ultra low contamination and defect levels by firing a high-purity quartz form as the feedstock, wherein the quartz glass ingot is free-formed on a platen rotating concentrically with the feedstock quartz article.

Abstract translation: 通过烧制高纯度石英形式作为原料来形成超低污染和缺陷水平的石英玻璃锭的方法，其中石英玻璃锭自由形成在与原料石英制品同心旋转的压板上。

公开(公告)号：US20060234848A1

公开(公告)日：2006-10-19

申请号：US11403267

申请日：2006-04-13

Applicant: Bodo Kuehn ,  Stefan Ochs ,  Steffen Kaiser ,  Denis Kassube

Inventor： Bodo Kuehn ,  Stefan Ochs ,  Steffen Kaiser ,  Denis Kassube

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件，用于工作波长低于250nm的浸没式光刻，其被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应显示几种性能的组合：特别是基本上没有氧缺陷的玻璃结构，羟基的平均含量小于60重量ppm，氟的平均含量小于 10重量ppm，氯的平均含量小于1重量ppm。 制造这种光学部件的方法包括以下步骤：在还原条件下制备和干燥SiO 2烟炱体，并在玻璃化之前或期间用与氧缺陷反应的试剂处理干燥的烟炱体 石英玻璃结构。

公开(公告)号：US20060204193A1

公开(公告)日：2006-09-14

申请号：US11433576

申请日：2006-05-15

Applicant: Kenji Okada ,  Koichi Harada ,  Shunichirou Hirafune ,  Munehisa Fujimaki

Inventor： Kenji Okada ,  Koichi Harada ,  Shunichirou Hirafune ,  Munehisa Fujimaki

IPC: G02B6/02

CPC classification number: C03B37/0253 ,  C03B37/02718 ,  C03B37/029 ,  C03B2201/23 ,  C03B2205/40 ,  C03B2205/56 ,  C03B2205/72 ,  C03C13/045 ,  C03C2201/23 ,  Y02P40/57

Abstract: A drawing method for a bare optical fiber, comprises the steps of: melting an optical fiber preform using a heating device and drawing the bare optical fiber; and naturally cooling down the bare optical fiber or forcibly cooling down the bare optical fiber by a cooling device after the heating and melting step, wherein a temperature history during the drawing the optical fiber preform to obtain the bare optical fiber in the heating device satisfies a relational expression: T≦−0.01X+12 where a time period when the heated and molten portion of the optical fiber preform heated and molten by the heating device reaches 1800° C. or higher is T (min) and a OH group concentration in a cladding layer of the optical fiber preform is X (wtppm).

Abstract translation: 一种裸光纤的拉丝方法，包括以下步骤：使用加热装置熔化光纤预制棒并拉制裸光纤; 并且在加热熔融步骤之后自然地冷却裸光纤或强制地冷却裸光纤，其中在加热装置中获得裸光纤的拉伸期间的温度历史满足了 关系表达式：T <= -0.01X + 12其中加热装置加热熔化的光纤预制件的加热和熔融部分达到1800℃或更高的时间段为T（min），OH基浓度 在光纤预制件的包覆层中为X（wtppm）。

公开(公告)号：US20060081008A1

公开(公告)日：2006-04-20

申请号：US11248185

申请日：2005-10-13

Applicant: Hiroyasu Hirata ,  Yuji Fukasawa ,  Masanobu Ezaki

Inventor： Hiroyasu Hirata ,  Yuji Fukasawa ,  Masanobu Ezaki

IPC: C03B32/00 ,  C03C17/00 ,  C03C23/00 ,  C03C15/00 ,  C03C19/00 ,  C03C21/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B25/025 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

Abstract: The invention provides a method for efficiently manufacturing a synthetic silica glass substrate for photomasks excellent in light stability and capable of being applied to ArF-Wet photolithography with maximum birefringence of 1.4 nm/cm or less, homogeneity of diffractive index of 2×10−5 or less and an average content of hydrogen atoms of 1018 to 1019, comprising the steps of: forming a mask-plain substrate by slicing a block of a synthetic silica glass; heating each sheet of the mask-plain substrate at a temperature of 1100° C. or more; slowly cooling the substrate at a cooling rate of 0.01 to 0.8° C./min; and placing the substrate in a hydrogen gas atmosphere at least at the latter half of the slow cooling step or after the slow cooling step.

Abstract translation: 本发明提供了一种有效地制造光稳定性优异的光掩模用合成石英玻璃基板的方法，能够适用于1.4nm / cm以下的双折射最大双折射的ArF-Wet光刻法，2×10 -6的衍射指数的均匀性， 5或更低，氢原子的平均含量为10 18至10 19，包括以下步骤：通过切割块来形成掩模 - 平版底物 的合成石英玻璃; 在1100℃以上的温度下对每片掩模基片进行加热; 以0.01〜0.8℃/ min的冷却速度缓慢冷却基板; 以及至少在缓慢冷却步骤的后半段或缓慢冷却步骤之后将衬底放置在氢气气氛中。

公开(公告)号：US07002298B2

公开(公告)日：2006-02-21

申请号：US10775218

申请日：2004-02-11

Applicant: Kensuke Fukushima

Inventor： Kensuke Fukushima

IPC: H01J17/16

CPC classification number: H01J61/86 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/32 ,  H01J61/302 ,  H01J61/822

Abstract: An ultra-high pressure discharge lamp in which the disadvantage of the reduction of the illuminance maintenance factor due to formation of blackening and milky opacification in the discharge vessel and the disadvantage of formation of cracks in the discharge vessel is eliminated by the discharge vessel being made of a silica glass that contains 0.1 ppm by weight to 290 ppm by weight hydrogen. Further advantages are obtained by the silica glass having a content of OH radicals that is at most 1 ppm by weight and a content of aluminum in a range of 2 ppm by weight to 30 ppm by weight.

Abstract translation: 通过放电容器被消除，由于在放电容器中形成黑化和乳白色混浊而导致的照度维持系数降低的缺点和放电容器中形成裂缝的缺点的超高压放电灯 的含有0.1重量ppm至290重量ppm氢的二氧化硅玻璃。 通过具有至多1重量ppm的OH基含量的二氧化硅玻璃和在2重量ppm至30重量ppm的范围内的铝的含量可获得其它优点。