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    INSPECTION SYSTEM AND METHOD FOR INSPECTING A SAMPLE BY USING A PLURALITY OF SPACED APART BEAMS
    82.
    发明申请
    INSPECTION SYSTEM AND METHOD FOR INSPECTING A SAMPLE BY USING A PLURALITY OF SPACED APART BEAMS 审中-公开

    公开(公告)号：US20170307539A1

    公开(公告)日：2017-10-26

    申请号：US15134278

    申请日：2016-04-20

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Boris Golberg ,  Ron Naftali

    IPC: G01N21/88

    CPC classification number: G01N21/8851 ,  G01N2201/063 ,  G01N2201/105

    Abstract: An inspection system that may include an illumination module that may be configured to scan a sample during multiple scan iterations; wherein during each scan iteration the illumination module scans each beam of a plurality of spaced apart beams along a scan line; a mechanical stage that may be configured to move the sample during the multiple scan iterations; a detection module; and a processor; wherein when the inspection system operates in an interlaced mode, the mechanical stage may be configured to move at a first speed thereby preventing a substantial overlap between scan lines obtained during the multiple scan iterations; wherein when the inspection system operates in a non-interlaced mode: the mechanical stage may be configured to move at a second speed that differs from the first speed thereby introducing an overlap between scan lines of different beams that may be obtained during different scan iterations; the detection module may be configured to generate detection signals in response to a detection of radiation emitted from the sample as a result of each scan line; and wherein the processor may be configured to independently process detection signals relating to different scan lines.

    METHODS AND SYSTEMS FOR OPTICAL-BASED MEASUREMENT WITH SELECTABLE EXCITATION LIGHT PATHS
    83.
    发明申请
    METHODS AND SYSTEMS FOR OPTICAL-BASED MEASUREMENT WITH SELECTABLE EXCITATION LIGHT PATHS 审中-公开

    公开(公告)号：US20170307528A1

    公开(公告)日：2017-10-26

    申请号：US15138660

    申请日：2016-04-26

    Applicant: Molecular Devices, LLC

    Inventor： Josef J. Atzler ,  Michael Katzlinger ,  Klaus Wagner

    IPC: G01N21/64

    CPC classification number: G01N21/6428 ,  G01N21/6408 ,  G01N21/6445 ,  G01N21/645 ,  G01N2021/174 ,  G01N2201/061 ,  G01N2201/063

    Abstract: In an optical-based sample analysis, for example fluorescence-based or absorbance-based measurement, a selection is made between a first excitation light path and a second excitation light path. The first excitation light path directs excitation light from a light source, through an excitation monochromator, through an excitation filter, and to a sample. The second excitation light path directs excitation light from the light source, through the excitation filter, and to the sample while bypassing the excitation monochromator. Excitation light generated by the light source is transmitted along either the first excitation light path or the second excitation light path in accordance with the selection made, thereby irradiating the sample. In response the sample produces emission light (transmitted light in the case of absorbance measurements), which is transmitted to and measured by a light detector.

    Defect inspection device
    87.
    发明授权
    Defect inspection device 有权

    公开(公告)号：US09683947B2

    公开(公告)日：2017-06-20

    申请号：US15000715

    申请日：2016-01-19

    Applicant: NuFlare Technology, Inc.

    Inventor： Masatoshi Hirono ,  Riki Ogawa ,  Takeshi Fujiwara

    IPC: G01N21/88 ,  G01N21/95 ,  G03F1/84 ,  G01N21/956

    CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/063 ,  G03F1/84

    Abstract: According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.

    STRUCTURED ILLUMINATION DEVICE AND STRUCTURED ILLUMINATION MICROSCOPE DEVICE
    90.
    发明申请
    STRUCTURED ILLUMINATION DEVICE AND STRUCTURED ILLUMINATION MICROSCOPE DEVICE 有权
    结构照明装置和结构化照明显微镜装置

    公开(公告)号：US20160131885A1

    公开(公告)日：2016-05-12

    申请号：US14996717

    申请日：2016-01-15

    Applicant: NIKON CORPORATION

    Inventor： Hiroaki NAKAYAMA ,  Yumiko OUCHI

    IPC: G02B21/06 ,  G02B21/16 ,  G01N21/64

    CPC classification number: G02B21/06 ,  G01N21/64 ,  G01N21/6428 ,  G01N2021/6439 ,  G01N2201/063 ,  G01N2201/0638 ,  G02B21/0032 ,  G02B21/0076 ,  G02B21/16 ,  G02B21/367 ,  G02B27/58

    Abstract: A structured illumination device includes: a diffraction unit that diffracts light beams of a plurality of wavelengths that are emitted simultaneously or sequentially by a light source into a plurality of diffracted beams; and an optical system that forms interference fringes on a surface of a sample using the plurality of diffracted beams diffracted by the diffraction unit, the optical system including a first optical system and a second optical system that focuses the plurality of diffracted beams at positions on or near a pupil plane of the first optical system, and a magnification characteristic dY(λ) of the second optical system satisfying the condition of (fo·nw−afλ/P)≦dY(λ)≦(fo·NA−afλ/P), where a=1 (for M=1, 2) or a=2 (for M=3).

    Abstract translation: 结构化照明装置包括：衍射单元，将由光源同时或顺序地发射的多个波长的光束衍射成多个衍射光束; 以及光学系统，其使用由衍射单元衍射的多个衍射光束在样品的表面上形成干涉条纹，所述光学系统包括第一光学系统和第二光学系统，所述第一光学系统和第二光学系统将所述多个衍射光束聚焦在或 在第一光学系统的光瞳面附近，满足条件（fo·nw-afλ/ P）＆nlE; dY（λ）＆nlE;（fo·NA-afλ）的第二光学系统的放大特性dY（λ） / P），其中a = 1（对于M = 1,2）或a = 2（对于M = 3）。

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