公开(公告)号：US07141783B2

公开(公告)日：2006-11-28

申请号：US10976095

申请日：2004-10-27

Applicant: Sang Soo Kim ,  Hyung Ho Park ,  Sang Bok Kim

Inventor： Sang Soo Kim ,  Hyung Ho Park ,  Sang Bok Kim

IPC: H01J41/04

CPC classification number: H01J27/024

Abstract: The present invention relates to an apparatus for focusing particle beams using a radiation pressure capable of obtaining the same flow amount and a narrower particle beam width with respect to the particle size and a higher numeral density. It is possible to form the particle beams by applying the radiation pressure to the particles with respect to the flow condition that cannot form the particle beams with respect to the set particle sizes. There is provided an apparatus for focusing particle beams using a radiation pressure, comprising an orifice part that is provided at a predetermined portion of the flow tube, and a lens having a hole with a predetermined diameter for thereby focusing the particle flow into a particle beam and applying a radiation pressure to the flow particles; and a light source supply part (A) provided at a portion opposite to the discharge outlet of the mixing tube.

公开(公告)号：US20060249376A1

公开(公告)日：2006-11-09

申请号：US11123228

申请日：2005-05-06

Applicant: Hugh Walton

Inventor： Hugh Walton

IPC: C25B9/06

CPC classification number: H01J27/143 ,  H01J27/024 ,  H01J2237/083

Abstract: In certain example embodiments of this invention, there is provided an ion source including an anode and a cathode. In certain example embodiments, a multi-piece outer cathode is provided. The multi-piece outer cathode allows precision adjustments to be made, thereby permitting adjustment of the magnetic gap between the inner and outer cathodes. This allows improved performance to be realized, and/or prolonged operating life of certain components. This may also permit multiple types of gap adjustment to be performed with different sized outer cathode end pieces. In certain example embodiments, cathode fabrication costs may also be reduced.

Abstract translation: 在本发明的某些示例性实施例中，提供了一种包括阳极和阴极的离子源。 在某些示例性实施例中，提供多片外部阴极。 多片外阴极允许进行精密调节，从而允许调节内阴极和外阴极之间的磁隙。 这允许实现改进的性能，和/或延长某些部件的使用寿命。 这也可以允许用不同尺寸的外部阴极端部件执行多种类型的间隙调节。 在某些示例性实施例中，也可以降低阴极制造成本。

公开(公告)号：US20060152164A1

公开(公告)日：2006-07-13

申请号：US11208728

申请日：2005-08-23

Applicant: Yung Hee Lee ,  Yun Kwang Jeon ,  Jin Seok Lee

Inventor： Yung Hee Lee ,  Yun Kwang Jeon ,  Jin Seok Lee

IPC: H01J1/46

CPC classification number: H01J37/08 ,  H01J27/024

Abstract: An ion beam extractor controls a direction and an intensity of ion beams by adjusting a voltage applied to a grid having slits formed therein, thereby enhancing uniformity of an etching rate of a wafer, leading to an increase of productivity of semiconductor diodes. The ion beam extractor comprises an ion source to produce an ion beam and at least one grid located at a rear end of the ion source in a progressing path of the ion beam produced by the ion source to adjust a direction of the ion beam by controlling a voltage applied to the at least one grid.

Abstract translation: 离子束提取器通过调节施加到其上形成有狭缝的栅格的电压来控制离子束的方向和强度，从而提高晶片的蚀刻速率的均匀性，从而提高半导体二极管的生产率。 离子束提取器包括离子源以产生离子束和位于离子源的后端处的离子源的至少一个格栅，在由离子源产生的离子束的前进路径中，通过控制离子束来调节离子束的方向 施加到所述至少一个栅格的电压。

公开(公告)号：US20050017645A1

公开(公告)日：2005-01-27

申请号：US10867580

申请日：2004-06-14

Applicant: Erik Wahlin

Inventor： Erik Wahlin

IPC: H01J27/02 ,  H01J7/24

CPC classification number: H01J27/024

Abstract: A multi-grid ion beam source has an extraction grid, an acceleration grid, a focus grid, and a shield grid to produce a highly collimated ion beam. A five grid ion beam source is also disclosed having two shield grids. The extraction grid has a high positive potential and covers a plasma chamber containing plasma. The acceleration grid has a non-positive potential. The focus grid is positioned between the acceleration grid and the shield grid. The combination of the extraction grid and the acceleration grid extracts ions from the plasma. The focus grid acts to change momentum of the ions exiting the acceleration grid, focusing the ions into a more collimated ion beam than previous approaches. In one embodiment, the focus grid has a large positive potential. In another embodiment, the focus grid has a large negative potential.

Abstract translation: 多栅离子束源具有提取栅格，加速栅格，焦点栅格和屏蔽栅格，以产生高度准直的离子束。 还公开了一种五栅离子束源，其具有两个屏蔽网格。 提取格栅具有高正电位并且覆盖包含等离子体的等离子体室。 加速度网格具有非正电位。 焦点网格位于加速网格和屏蔽网格之间。 提取网格和加速度格栅的组合从等离子体中提取离子。 焦点网格用于改变离开加速度格栅的离子的动量，将离子聚焦成比以前的方法更准确的离子束。 在一个实施例中，聚焦网格具有大的正电位。 在另一个实施例中，焦点栅格具有大的负电位。

公开(公告)号：US5934965A

公开(公告)日：1999-08-10

申请号：US833742

申请日：1997-04-11

Applicant: John R. Beattie

Inventor： John R. Beattie

IPC: G03F7/00 ,  B64G1/40 ,  F03H1/00 ,  G03F7/24 ,  H01J27/02 ,  H01J27/20 ,  H01J37/08 ,  H01J9/02

CPC classification number: F03H1/0043 ,  G03F7/24 ,  H01J27/024

Abstract: Positional accuracy of apertures in nonplanar electrodes is improved with a new fabrication method. This method precedes process steps which establish a photoresist pattern that defines apertures with deformation steps which produce a nonplanar electrode. Thus, the deformation steps do not have an opportunity to spatially alter the photoresist pattern. The improved positional accuracy enhances the performance and lifetime of ion thrusters which include nonplanar electrodes that are fabricated with this process.

Abstract translation: 通过新的制造方法，提高了非平面电极孔径的位置精度。 该方法先于制造光刻胶图案的工艺步骤，其形成具有产生非平面电极的变形步骤的孔。 因此，变形步骤不具有在空间上改变光致抗蚀剂图案的机会。 改进的位置精度提高了离子推进器的性能和寿命，其包括用该工艺制造的非平面电极。

公开(公告)号：US5661308A

公开(公告)日：1997-08-26

申请号：US655448

申请日：1996-05-30

Applicant: Victor M. Benveniste ,  Michasel Cristoforo

Inventor： Victor M. Benveniste ,  Michasel Cristoforo

IPC: H05H1/46 ,  H01J27/16 ,  H01J37/08 ,  H01J37/317 ,  H01L21/265 ,  H01J27/00

CPC classification number: H01J27/024 ,  H01J27/16

Abstract: An ion source for use in an ion implanter. The ion source includes a gas confinement chamber having conductive chamber walls that bound a gas ionization zone. The gas confinement chamber includes an exit opening to allow ions to exit the chamber. A base positions the gas confinement chamber relative to structure for forming an ion beam from ions exiting the gas confinement chamber. A supply of ionizable material routes the material into the gas confinement chamber. An antenna that is supported by the base has a metallic radio frequency conducting segment mounted directly within the gas confinement chamber to deliver ionizing energy into the gas ionization zone.

Abstract translation: 用于离子注入机的离子源。 离子源包括气体限制室，其具有结合气体电离区的导电室壁。 气体限制室包括允许离子离开室的出口。 基座相对于从离开气体限制室的离子形成离子束的结构定位气体限制室。 可电离材料的供应将材料引导进入气体限制室。 由基座支撑的天线具有直接安装在气体限制室内的金属射频传导段，以将电离能传递到气体电离区。

公开(公告)号：US5551904A

公开(公告)日：1996-09-03

申请号：US463581

申请日：1995-06-05

Applicant: Daniel E. Hedges ,  Jere S. Meserole, Jr. ,  Michael E. Rorabaugh

Inventor： Daniel E. Hedges ,  Jere S. Meserole, Jr. ,  Michael E. Rorabaugh

IPC: F03H1/00

CPC classification number: F03H1/0043 ,  H01J27/024

Abstract: Carbon-carbon grids for ion optics sets are thermomechanically stable under the extreme temperature changes that are experienced in ion thrusters. Screen, accelerator and decelerator grids are thermomechanically stable, lightweight, and resistant to erosion from ion sputtering and have extended lifetimes over conventional molybdenum grids.

Abstract translation: 用于离子光学器件的碳 - 碳网格在离子推进器所经历的极端温度变化下是热机械稳定的。 屏幕，加速器和减速器网格在机械上稳定，重量轻，并且能抵抗离子溅射的侵蚀，并延长寿命超过常规钼网格。

公开(公告)号：US5272412A

公开(公告)日：1993-12-21

申请号：US20754

申请日：1992-07-28

Applicant: Gianfranco Cirri

Inventor： Gianfranco Cirri

IPC: H01J9/02 ,  C23C16/28 ,  H01J9/14 ,  H01J27/02 ,  H01J27/08 ,  H01J37/08 ,  H01J49/10 ,  B32B3/24 ,  H01J1/52

CPC classification number: H01J27/024 ,  C23C16/28 ,  H01J9/14 ,  Y10T428/24091

Abstract: An innovative method is proposed for the production of ion extraction grids, comprising the stages of:disposing a plurality of wires or metallic filaments in a lattice structure;coating said structure with a layer of boron.The coating with boron may take place by thermal reduction of boron trichloride in a hydrogen atmosphere. This makes it possible to produce grids at low cost and with high resistance to sputtering, suitable for use for the extraction, focusing and acceleration of the beam in ion sources for industrial and space applications.

公开(公告)号：US4873467A

公开(公告)日：1989-10-10

申请号：US197525

申请日：1988-05-23

Applicant: Harold R. Kaufman ,  Raymond S. Robinson

Inventor： Harold R. Kaufman ,  Raymond S. Robinson

IPC: F03H1/00 ,  H01J27/20

CPC classification number: F03H1/0043 ,  H01J27/024

Abstract: An ion source has the typical chamber wherein ions are produced and caused to be propelled outwardly through at least a pair of grids which have a mutually-aligned respective plurality of apertures. Thus, there are the usual cathode, anode, magnet assembly, ionizable gas inlet and supporting power supplies as well as neutralizing means. First and second grids each have an integrally-formed peripheral marginal portion. A support element has a shape which matches and overlies the marginal portion of one grid, while a clamp has a shape which matches that of and overlies the other marginal portion. The support element and clamp are secured together. First and second mutually-aligned seats are successively spaced around the respective marginal portions. A plurality of insulators, each having of circular cross-section, are individually seated between the two different marginal portions in a manner to cause general alignment while enabling radial movement due to thermal expansion of the marginal portions relative to the support element and the clamp and each other.

Abstract translation: 离子源具有典型的室，其中离子被产生并通过至少一对具有相互排列的多个孔的栅格向外推进。 因此，存在通常的阴极，阳极，磁体组件，可电离气体入口和支撑电源以及中和装置。 第一和第二栅极各自具有整体形成的外围边缘部分。 支撑元件具有与一个栅格的边缘部分相匹配并覆盖的形状，而夹具具有与另一边缘部分的边缘部分相匹配的形状。 支撑元件和夹具固定在一起。 第一和第二相互对准的座位在相应的边缘部分周围连续间隔开。 每个具有圆形横截面的多个绝缘体以一种方式单独地安置在两个不同的边缘部分之间以引起总体对准，同时由于边缘部分相对于支撑元件和夹具的热膨胀而能够径向移动，并且 彼此。

公开(公告)号：US3263415A

公开(公告)日：1966-08-02

申请号：US9379461

申请日：1961-03-06

Applicant: AEROJET GENERAL CO

Inventor： SUNDERLAND ROBERT J ,  RADBILL JOHN R

IPC: B64G1/40 ,  F03H1/00

CPC classification number: F03H1/0043 ,  B64G1/405 ,  H01J27/024 ,  H01J27/26