公开(公告)号：US20110315876A1

公开(公告)日：2011-12-29

申请号：US13168415

申请日：2011-06-24

Applicant: Bart Buijsse ,  Peter Christiaan Tiemeijer

Inventor： Bart Buijsse ,  Peter Christiaan Tiemeijer

IPC: H01J37/295

CPC classification number: H01J37/263 ,  H01J37/09 ,  H01J2237/043 ,  H01J2237/223 ,  H01J2237/2614 ,  H01J2237/2802

Abstract: The invention relates to a blocking member to be placed in the diffraction plane of a TEM. It resembles the knife edge used for single sideband imaging, but blocks only electrons deflected over a small angle. As a result the Contrast Transfer Function of the TEM according to this invention will equal that of a single sideband microscope at low frequencies and that of a normal microscope for high frequencies. Preferable the highest frequency blocked by the blocking member is such that a microscope without the blocking member would show a CTF of 0.5.

Abstract translation: 本发明涉及一种放置在TEM衍射平面中的阻挡构件。 它类似于用于单边带成像的刀刃，但仅阻挡在小角度偏转的电子。 结果，根据本发明的TEM的对比度传递函数将等于低频下的单边带显微镜的对比度传递函数，而与正常显微镜在低频下相同。 优选地，阻挡构件阻挡的最高频率使得没有阻挡构件的显微镜将显示为0.5的CTF。

公开(公告)号：US07928379B2

公开(公告)日：2011-04-19

申请号：US12224667

申请日：2007-10-26

Applicant: Joachim Zach

Inventor： Joachim Zach

IPC: H01J37/26

CPC classification number: H01J37/263 ,  H01J2237/226 ,  H01J2237/2614

Abstract: The invention concerns a phase plate for electron optical imaging, wherein the zero beam (4) is phase-shifted in order to obtain an image with optimum contrast through interference with the diffracted electron beams (5, 5′). The shading of diffracted electron beams (5, 5′) is kept to a minimum and shading that cannot be reconstructed from the obtained image data is prevented. This is achieved in that the electrode (1′) is designed as a shielded conductor (7), which is disposed to extend from a mounting (8) in a substantially radial direction towards the area of the zero beam (4), wherein the shielded conductor (7) has an end (9) in front of the area of the zero beam (4) such that a field (6) is formed between the conductor (7) and the shielding (10) surrounding it, which overlaps this area. The invention also concerns an imaging method for complete reconstruction of the image and an electron microscope (12) which is provided with the phase plate (1).

Abstract translation: 本发明涉及用于电子光学成像的相位板，其中零光束（4）被相移，以便通过与衍射电子束（5,5'）的干涉来获得具有最佳对比度的图像。 衍射电子束（5,5'）的阴影保持最小，并且防止了从获得的图像数据不能重建的阴影。 这是通过将电极（1'）设计为屏蔽导体（7）来实现的，屏蔽导体（7）设置成从安装件（8）沿基本径向延伸到零光束（4）的区域，其中 屏蔽导体（7）在零光束（4）的区域的前面具有端部（9），使得在导体（7）和围绕它的屏蔽（10）之间形成一个场（6） 区。 本发明还涉及一种完全重建图像的成像方法和一个设置有相位板（1）的电子显微镜（12）。

公开(公告)号：US20110024621A1

公开(公告)日：2011-02-03

申请号：US12826181

申请日：2010-06-29

Applicant: Bunshiro SAYA

Inventor： Bunshiro SAYA

IPC: H01J37/28 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/24495

Abstract: An SEM control device comprises: an image acquisition unit that acquires by an SEM a plurality of images of a prescribed object, each of which is formed of a plurality of pixels lined up in a first direction, at a plurality of positions in a second direction perpendicular to the first direction; a variation range calculation unit that obtains maximum values and minimum values of gray scale values among the plurality of images at respective locations of the plurality of pixels, and calculates a variation range of the maximum values and a variation range of the minimum values for the plurality of pixels; and a brightness/contrast adjustment unit that adjusts brightness and contrast of the SEM so as to minimize difference between the variation range of the maximum values and the variation range of the minimum values.

Abstract translation: 一种SEM控制装置，包括：图像获取单元，其通过SEM在第二方向上的多个位置处通过SEM获取多个图像，所述多个图像由沿着第一方向排列的多个像素形成的规定对象 垂直于第一方向; 变化范围计算单元，其获得所述多个像素的各个位置处的所述多个图像中的灰度值的最大值和最小值，并且计算所述多个像素中的最大值的最小值的变化范围和最小值的变化范围 的像素; 以及亮度/对比度调整单元，其调整SEM的亮度和对比度，以最小化最大值的变化范围和最小值的变化范围之间的差异。

公开(公告)号：US20110012029A1

公开(公告)日：2011-01-20

申请号：US12709264

申请日：2010-02-19

Applicant: Hideaki ABE

Inventor： Hideaki ABE

IPC: G21K5/00

CPC classification number: H01J37/28 ,  H01J37/263 ,  H01J2237/0048 ,  H01J2237/281 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The pattern observation method for observing a pattern which is formed on an insulating film, includes: irradiating an entirety of the pattern with a charged particle beam, to obtain a temporary image of the pattern which has region information of a convex pattern and a concave pattern; irradiating the convex and concave patterns with the charged particle beam having a first and second voltages based on the region information, to thereby form an electric field between a top surface of the convex pattern and a bottom surface of the concave pattern so that charged particles emitted from the bottom surface of the concave pattern may be drawn out to an outside of the pattern; and irradiating the entirety of the pattern with the charged particle beam to obtain an image of the pattern having the information of the bottom surface of the concave pattern.

Abstract translation: 用于观察形成在绝缘膜上的图案的图案观察方法包括：用带电粒子束照射整个图案，以获得具有凸形图案和凹图案的区域信息的图案的临时图像 ; 利用基于区域信息的具有第一和第二电压的带电粒子束照射凸和凹图案，从而在凸形图案的顶表面和凹图案的底表面之间形成电场，使得带电粒子发射 从凹形图案的底面可以被拉出到图案的外侧; 并用带电粒子束照射整个图案，以获得具有凹形图案底面信息的图案的图像。

公开(公告)号：US20100314539A1

公开(公告)日：2010-12-16

申请号：US12483220

申请日：2009-06-11

Applicant: HONG XIAO ,  WEI FANG

Inventor： HONG XIAO ,  WEI FANG

IPC: G01N23/04

CPC classification number: H01J37/26 ,  H01J37/1474 ,  H01J37/263 ,  H01J37/28 ,  H01L22/12

Abstract: A method of inspecting for plug-to-plug short (short circuit) defects on a sample is disclosed. A charged particle beam for imaging the sample is repeatedly line-scanned over the sample with a line-to-line advancement direction perpendicular to the line-scan direction. The method includes scanning the sample with a line-to-line advancement along a first and a second direction, to obtain a first and a second image of the sample, respectively. Then, the method includes identifying plug patterns, represented in the obtained images with abnormal grey levels, as abnormal plug patterns. Next, the method compares the locations of the abnormal plug patterns to determine the presence of plug-to-plug short defects on the sample.

Abstract translation: 公开了一种检查样品上插头短插（短路）缺陷的方法。 用于对样品进行成像的带电粒子束在垂直于线扫描方向的线对线前进方向上在样品上重复线扫描。 该方法包括沿着第一和第二方向以线对线前进扫描样品，以分别获得样品的第一和第二图像。 然后，该方法包括将获得的具有异常灰度级的图像表示的插头图案识别为异常插头图案。 接下来，该方法比较异常插头图案的位置，以确定样品上插头到插头短缺陷的存在。

公开(公告)号：US07825378B2

公开(公告)日：2010-11-02

申请号：US12274962

申请日：2008-11-20

Applicant: Alevtyna Yakushevska ,  Erwan Sourty ,  Uwe Luecken ,  Bert Freitag

Inventor： Alevtyna Yakushevska ,  Erwan Sourty ,  Uwe Luecken ,  Bert Freitag

IPC: H01J37/256 ,  H01J37/30 ,  G21K5/10 ,  G01N13/10

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2802 ,  H01J2237/2803 ,  H01J2237/2809

Abstract: A method for improving the resolution of STEM images of thick samples. In STEM, the diameter of the cross-over depends on the opening half-angle α of the beam and can be as low as 0.1 nm. For optimum resolution an opening half-angle is chosen at which the diameter of the cross-over R(α) shows a minimum. For thick samples the resolution is, for those parts of the sample removed from the cross-over plane, limited by the convergence of the beam, resulting in a diameter D of the beam at the surface of the sample. The opening angle is chosen to balance the contribution of convergence and of diameter of the cross-over by choosing an opening half-angle smaller than the optimum opening half-angle. Effectively the sample is then scanned with a beam that has a substantially constant diameter over the length of the sample material through which the electrons have to travel.

Abstract translation: 一种改善厚样品STEM图像分辨率的方法。 在STEM中，交叉的直径取决于梁的开口半角α，并且可以低至0.1nm。 为了获得最佳分辨率，选择开角半角，其中交叉R（α）的直径显示为最小。 对于厚样品，对于从交叉平面去除的样品的那些部分，由束的会聚限制，导致样品表面处的光束的直径D。 选择开放角度以通过选择小于最佳开口半角的开口半角平衡会聚的贡献和交叉的直径。 然后有效地将样品用在电子必须行进的样品材料长度上具有基本恒定直径的光束进行扫描。

公开(公告)号：US20100258719A1

公开(公告)日：2010-10-14

申请号：US12756455

申请日：2010-04-08

Applicant: Gerd Benner ,  Matthias Langer

Inventor： Gerd Benner ,  Matthias Langer

IPC: G01N23/00 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/24475 ,  H01J2237/262 ,  H01J2237/28

Abstract: A particle beam microscope includes an illumination system generating a particle beam having a ring-shaped conical configuration. A selective detection system is configured to selectively detect one of two groups of particles having traversed the object region. The first group of particles includes the particles that traversed the object region un-scattered or scattered by a small scattering amount. The second group of particles includes particles scattered in the object region by a greater scattering amount.

Abstract translation: 粒子束显微镜包括产生具有环形锥形构造的粒子束的照明系统。 选择性检测系统被配置为选择性地检测穿过对象区域的两组颗粒中的一个。 第一组粒子包括通过小散射量穿过物体区域而不散射或散射的粒子。 第二组颗粒包括在物体区域散射较大散射量的颗粒。

公开(公告)号：US20100001183A1

公开(公告)日：2010-01-07

申请号：US12224667

申请日：2007-10-26

Applicant: Joachim Zach

Inventor： Joachim Zach

IPC: H01J37/26

CPC classification number: H01J37/263 ,  H01J2237/226 ,  H01J2237/2614

Abstract: The invention concerns a phase plate for electron optical imaging, wherein the zero beam (4) is phase-shifted in order to obtain an image with optimum contrast through interference with the diffracted electron beams (5, 5′). The shading of diffracted electron beams (5, 5′) is kept to a minimum and shading that cannot be reconstructed from the obtained image data is prevented. This is achieved in that the electrode (1′) is designed as a shielded conductor (7), which is disposed to extend from a mounting (8) in a substantially radial direction towards the area of the zero beam (4), wherein the shielded conductor (7) has an end (9) in front of the area of the zero beam (4) such that a field (6) is formed between the conductor (7) and the shielding (10) surrounding it, which overlaps this area. The invention also concerns an imaging method for complete reconstruction of the image and an electron microscope (12) which is provided with the phase plate (1).

Abstract translation: 本发明涉及用于电子光学成像的相位板，其中零光束（4）被相移，以便通过与衍射电子束（5,5'）的干涉来获得具有最佳对比度的图像。 衍射电子束（5,5'）的阴影保持最小，并且防止了从获得的图像数据不能重建的阴影。 这是通过将电极（1'）设计为屏蔽导体（7）来实现的，屏蔽导体（7）设置成从安装件（8）沿基本径向延伸到零光束（4）的区域，其中 屏蔽导体（7）在零光束（4）的区域的前面具有端部（9），使得在导体（7）和围绕它的屏蔽（10）之间形成一个场（6） 区。 本发明还涉及一种完全重建图像的成像方法和一个设置有相位板（1）的电子显微镜（12）。

公开(公告)号：US07633064B2

公开(公告)日：2009-12-15

申请号：US11773840

申请日：2007-07-05

Applicant: Ruriko Tsuneta ,  Masanari Koguchi ,  Hiromi Inada

Inventor： Ruriko Tsuneta ,  Masanari Koguchi ,  Hiromi Inada

IPC: H01J37/153

CPC classification number: H01J37/1475 ,  G06T5/006 ,  H01J37/153 ,  H01J37/222 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/1526 ,  H01J2237/1536 ,  H01J2237/221 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/2818 ,  H01J2237/2826 ,  H01J2237/3045

Abstract: An electric charged particle beam microscope measures a geometric distortion at an arbitrary magnification with high precision, and corrects the geometric distortion. A geometric distortion at a first magnification is measured as an absolute distortion based on a standard specimen having a cyclic structure. A microscopic structure specimen is photographed at a geometric distortion measured first magnification and at a geometric distortion unmeasured second magnification. The image at the first magnification is equally transformed to the second magnification to generate a scaled image. The geometric distortion at the second magnification is measured as a relative distortion based on the scaled image. The absolute distortion at the second magnification is obtained on the basis of the absolute distortion at the first magnification and the relative distortion at the second magnification. Subsequently, the second magnification is replaced with the first magnification, and the relative distortion measurement is repeated.

Abstract translation: 带电粒子束显微镜可以高精度地测量任意倍率的几何畸变，校正几何失真。 基于具有循环结构的标准样品，测量第一倍率下的几何失真作为绝对变形。 以几何失真测量的第一放大倍率和几何失真未测量的第二倍率拍摄微观结构样本。 将第一放大倍率下的图像等效地变换为第二放大率以生成缩放图像。 第二倍率下的几何畸变被测量为基于缩放图像的相对失真。 基于第一倍率下的绝对失真和第二倍率下的相对失真，获得第二放大倍率下的绝对失真。 随后，用第一倍率代替第二倍率，并重复相对失真测量。

公开(公告)号：US20090133167A1

公开(公告)日：2009-05-21

申请号：US12274962

申请日：2008-11-20

Applicant: Alevtyna Yakushevska ,  Bert Freitag ,  Uwe Luecken ,  Erwan Sourty

Inventor： Alevtyna Yakushevska ,  Bert Freitag ,  Uwe Luecken ,  Erwan Sourty

IPC: G01N13/10 ,  G01N23/00

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2802 ,  H01J2237/2803 ,  H01J2237/2809

Abstract: A method for improving the resolution of STEM images of thick samples. In STEM, the diameter of the cross-over depends on the opening half-angle α of the beam and can be as low as 0.1 nm. For optimum resolution an opening half-angle is chosen at which the diameter of the cross-over R(α) shows a minimum. For thick samples the resolution is, for those parts of the sample removed from the cross-over plane, limited by the convergence of the beam, resulting in a diameter D of the beam at the surface of the sample. The opening angle is chosen to balance the contribution of convergence and of diameter of the cross-over by choosing an opening half-angle smaller than the optimum opening half-angle. Effectively the sample is then scanned with a beam that has a substantially constant diameter over the length of the sample material through which the electrons have to travel.

Abstract translation: 一种改善厚样品STEM图像分辨率的方法。 在STEM中，交叉的直径取决于梁的开口半角α，可以低至0.1nm。 为了获得最佳分辨率，选择开角半角，其中交叉R（α）的直径最小。 对于厚样品，对于从交叉平面去除的样品的那些部分，受到束的会聚限制，导致样品表面处的光束的直径D。 选择开放角度以通过选择小于最佳开口半角的开口半角平衡会聚的贡献和交叉的直径。 然后有效地将样品用在电子必须行进的样品材料长度上具有基本恒定直径的光束进行扫描。