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    Scanning Transmission Electron Microscope and Method of Image Generation
    3.
    发明申请
    Scanning Transmission Electron Microscope and Method of Image Generation 审中-公开

    公开(公告)号：US20180337019A1

    公开(公告)日：2018-11-22

    申请号：US15824047

    申请日：2017-11-28

    Applicant: JEOL Ltd.

    Inventor： Ryusuke Sagawa

    IPC: H01J37/28 ,  H01J37/26 ,  H01J37/147 ,  H01J37/10 ,  H01J37/244

    CPC classification number: H01J37/28 ,  G01N23/20058 ,  G01N2223/0565 ,  G01N2223/102 ,  G01N2223/3302 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/1475 ,  H01J37/1477 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/2446 ,  H01J2237/2802 ,  H01J2237/2803

    Abstract: There is provided a scanning transmission electron microscope capable of producing plural types of STEM (scanning transmission electron microscopy) images using a single detector. The electron microscope (100) has an electron source (10) emitting an electron beam, a scanning deflector (13) for scanning the beam over a sample (S), an objective lens (14) for focusing the beam, an imager (22) placed at a back focal plane of the objective lens (14) or at a plane conjugate with the back focal plane, and a scanned image generator (40) for generating scanned images on the basis of images captured by the imager. The scanned image generator (40) operates to form electron diffraction patterns from the electron beam passing through positions on the sample by the scanning of the electron beam, to capture the electron diffraction patterns by the imager so that plural images are produced, to integrate the intensity of each pixel over an integration region that is set based on the size of an image of a transmitted wave in a respective one of the produced images for each of the produced images such that the signal intensity at each position on the sample is found, and to generate the scanned images on the basis of the signal intensities at the positions on the sample.

    MEASUREMENT SYSTEM AND MEASUREMENT METHOD
    5.
    发明申请
    MEASUREMENT SYSTEM AND MEASUREMENT METHOD 有权
    测量系统和测量方法

    公开(公告)号：US20170047197A1

    公开(公告)日：2017-02-16

    申请号：US15305740

    申请日：2015-04-21

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Shoji HOTTA ,  Hiroki KAWADA ,  Osamu INOUE

    IPC: H01J37/28 ,  G03F9/00

    CPC classification number: H01J37/28 ,  G01B15/04 ,  G03F7/70633 ,  G03F9/7061 ,  H01J37/22 ,  H01J2237/2803

    Abstract: For scanning electron beams and measuring overlay misalignment between an upper layer pattern and a lower layer pattern with high precision, electron beams are scanned over a region including a first pattern and a second pattern of a sample, the sample having the lower layer pattern (the first pattern) and the upper layer pattern (the second pattern) formed in a step after a step of forming the first pattern. The electron beams are scanned such that scan directions and scan sequences of the electron beams become axial symmetrical or point-symmetrical in a plurality of pattern position measurement regions defined within the scan region for the electron beams, thereby reducing measurement errors resulting from the asymmetry of electric charge.

    Abstract translation: 对于扫描电子束和以高精度测量上层图案和下层图案之间的重叠不对准，在包括样品的第一图案和第二图案的区域上扫描电子束，具有较低层图案的样品（ 第一图案）和在形成第一图案的步骤之后的步骤中形成的上层图案（第二图案）。 扫描电子束，使得电子束的扫描方向和扫描顺序在限定在电子束的扫描区域内的多个图形位置测量区域中成为轴对称或点对称，从而减少由于不对称而导致的测量误差 电荷。

    Focused ion beam system
    7.
    发明授权
    Focused ion beam system 有权
    聚焦离子束系统

    公开(公告)号：US09245712B2

    公开(公告)日：2016-01-26

    申请号：US14221514

    申请日：2014-03-21

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

    IPC: H01J37/28 ,  H01J37/22 ,  H01J37/08

    CPC classification number: H01J37/28 ,  H01J37/08 ,  H01J37/222 ,  H01J2237/0807 ,  H01J2237/221 ,  H01J2237/2803 ,  H01J2237/31749

    Abstract: A focused ion beam system includes a gas field ion source which generates gas ions, an ion gun unit which accelerates the gas ions and radiates the gas ions as an ion beam, a beam optical system which includes at least a focusing lens electrode and radiates the ion beam onto a sample, and an image acquiring mechanism which acquires an FIM image of a tip of an emitter based on the ion beam. The image acquiring mechanism includes an alignment electrode which is disposed between the ion gun unit and the focusing lens electrode and adjusts a radiation direction of the ion beam, an alignment control unit which applies an alignment voltage to the alignment electrode, and an image processing unit which combines a plurality of FIM images acquired when applying different alignment voltages to generate one composite FIM image.

    Abstract translation: 聚焦离子束系统包括产生气体离子的气体离子源，加速气体离子并将气体离子作为离子束辐射的离子枪单元，包括至少聚焦透镜电极的射束光学系统， 离子束到样品，以及图像获取机构，其基于离子束获取发射器的尖端的FIM图像。 图像获取机构包括配置在离子枪单元和聚焦透镜电极之间并调整离子束的辐射方向的取向电极，向对准电极施加取向电压的取向控制单元和图像处理单元 其组合当应用不同对准电压时获得的多个FIM图像以生成一个复合FIM图像。

    System and Method for Controlling Charge-up in an Electron Beam Apparatus
    8.
    发明申请
    System and Method for Controlling Charge-up in an Electron Beam Apparatus 有权
    用于控制电子束装置中电荷的系统和方法

    公开(公告)号：US20150060665A1

    公开(公告)日：2015-03-05

    申请号：US14512672

    申请日：2014-10-13

    Applicant: Hermes Microvision Inc.

    Inventor： Weiming Ren ,  Zhongwei Chen

    IPC: H01J37/02 ,  H01J37/28

    CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

    Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

    System and method for controlling charge-up in an electron beam apparatus
    9.
    发明授权
    System and method for controlling charge-up in an electron beam apparatus 有权
    用于控制电子束装置中的电荷的系统和方法

    公开(公告)号：US08907281B2

    公开(公告)日：2014-12-09

    申请号：US14081465

    申请日：2013-11-15

    Applicant: Hermes Microvision, Inc.

    Inventor： Weiming Ren ,  Zhongwei Chen

    IPC: H01J37/26 ,  H01J37/14 ,  H01J37/29

    CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

    Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

    SYSTEM AND METHOD FOR SIMULTANEOUS DETECTION OF SECONDARY ELECTRONS AND LIGHT IN A CHARGED PARTICLE BEAM SYSTEM
    10.
    发明申请
    SYSTEM AND METHOD FOR SIMULTANEOUS DETECTION OF SECONDARY ELECTRONS AND LIGHT IN A CHARGED PARTICLE BEAM SYSTEM 审中-公开
    用于同时检测充电颗粒束系统中二次电子和光的系统和方法

    公开(公告)号：US20140131573A1

    公开(公告)日：2014-05-15

    申请号：US13681746

    申请日：2012-11-20

    Applicant: FEI COMPANY

    Inventor： N. William Parker ,  Mark W. Utlaut

    IPC: G01N23/225

    CPC classification number: G01N21/6428 ,  G01N21/6458 ,  G01N21/6486 ,  G01N23/225 ,  H01J37/228 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/206 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2448 ,  H01J2237/2803 ,  H01J2237/2857

    Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert “reporter” genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (GoIs), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (PoIs) coded for by the GoIs. One goal of biologists is more precise localization of PoIs within cells. The invention is a method and system for enabling more rapid and precise PoI localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels.

    Abstract translation: 公开了用于生物样品中荧光标记如荧光蛋白或量子点的成像和定位的方法和系统。 使用重组遗传学技术将“记者”基因插入许多物种已经很成熟。 特别地，绿色荧光蛋白（GFP）及其从蓝色到黄色的遗传修饰的变体易于在感兴趣的基因（GoI）的位点处接合到许多基因组中，其中GFP表达对功能没有明显的影响 的由GoI编码的感兴趣的蛋白质（PoI）。 生物学家的一个目标是更精确地定位细胞内的PoI。 本发明是一种方法和系统，用于使得能够使用带电粒子束对GFP的损伤进行更快速和精确的PoI定位。 提出了用于实现该方法的系统的多个实施例，以及相对不受高统计噪声水平影响的图像处理方法。

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