Fabrication of single crystal diamond tips and their arrays
    84.
    发明授权
    Fabrication of single crystal diamond tips and their arrays 有权
    制造单晶金刚石尖端及其阵列

    公开(公告)号:US06902716B2

    公开(公告)日:2005-06-07

    申请号:US10282779

    申请日:2002-10-29

    CPC classification number: C30B33/00 C30B25/105 C30B29/04 C30B29/605

    Abstract: The present invention deals with the generation of sharp single crystal diamond tips and the arrays of these tips, and their fabrication technology. The invention combines the deposition of synthetic diamond films with reactive etching processes. Upon the diamond orientation prepared and reactive etching environment with considerable directivity of ions, single crystal diamond tips with different apical angles can be fabricated. Very sharp diamond tips with an apical angle of no more than about 28° and a tip radius smaller than 50 nm are fabricated on pyramidal-shaped [001]-textured diamond films by subsequent reactive etching., The technology is based on selective etching of sp2- and sp3- hybridized carbons by the activated constituents of an etching environment, in particular based on atomic hydrogen, in a way similar to ion bombardment, which contributes to overall etching and local conversion of diamond to graphitic phase promoting further etching with chemically activated species. This novel method is capable of forming diamond tip arrays over large areas with great uniformity and high reproducibility. The diamond tips prepared are single diamond crystals with their [001] axes parallel each other and normal to the substrate surface. The invented technology enables the control of the apical angle, radius and density of the diamond tips.

    Abstract translation: 本发明涉及产生尖锐的单晶金刚石尖端和这些尖端的阵列及其制造技术。 本发明将合成金刚石膜的沉积与反应性蚀刻工艺相结合。 在制备菱形取向和具有相当方向性离子的反应性蚀刻环境的情况下,可以制造具有不同顶角的单晶金刚石尖端。 通过随后的反应蚀刻,在金字塔形的[001]纹理金刚石膜上制造顶尖角不超过约28°,尖端半径小于50nm的非常锋利的金刚石尖端。该技术基于选择性蚀刻 通过蚀刻环境的活化组分,特别是基于原子氢,以类似于离子轰击的方式,杂交碳和杂原子的碳,这有助于 整体蚀刻和金刚石局部转化为石墨相,促进用化学活化物质进一步蚀刻。 这种新方法能够在大面积上形成金刚石尖端阵列,具有很好的均匀性和高重现性。 制备的金刚石尖端是单晶金刚石晶体,其[001]轴线彼此平行并垂直于基板表面。 本发明的技术能够控制金刚石尖端的顶角,半径和密度。

    Diamond polishing particles and method of producing same
    86.
    发明申请
    Diamond polishing particles and method of producing same 审中-公开
    金刚石抛光颗粒及其制造方法

    公开(公告)号:US20050086870A1

    公开(公告)日:2005-04-28

    申请号:US10974867

    申请日:2004-10-26

    CPC classification number: B01J3/08 C01B32/28 C09K3/1409

    Abstract: Polishing particles are made of artificial diamond produced by a shock method, having density of 3.0-3.35 g/cm3 and including secondary particles with average particle diameter of 30 nm-500 nm. Such polishing particles are produced by firstly obtaining a product containing artificial diamond by a shock method, then subjecting this product to an acid treatment by using one or more strong acids such as concentrated sulfuric acid, concentrated nitric acid and concentrated hydrochloric acid to thereby remove impurities from and wash the product, thereafter subjecting the product to a classification process to thereby separate artificial diamond of a first kind having secondary particles with particle diameters of 30 nm-500 nm and artificial diamond of a second kind having secondary particles with particle diameters in excess of 500 nm and selecting artificial diamond of a third kind having density of 3.0-3.35 g/cm3 out of the artificial diamond of the first kind. It is the artificial diamond of the third kind that is to be used as the diamond polishing particles.

    Abstract translation: 抛光颗粒由人造金刚石制造,其通过冲击法制备,密度为3.0-3.35g / cm 3,并且包括平均粒径为30nm-500nm的二次颗粒。 通过首先通过冲击法获得含有人造金刚石的产品,然后通过使用一种或多种强酸例如浓硫酸,浓硝酸和浓盐酸对该产物进行酸处理,从而除去杂质, 然后对产品进行洗涤,然后对产品进行分级处理,从而分离具有粒径为30nm-500nm的二次粒子的第一种人造金刚石和具有粒径超过二次粒子的第二种人造金刚石 并选择第三类人造金刚石,其中第三种人造金刚石具有3.0-3.35g / cm 3的密度,出自第一类人造金刚石。 是用作金刚石抛光颗粒的第三种人造金刚石。

    Differential pressure HIP forging in a controlled gaseous environment
    89.
    发明授权
    Differential pressure HIP forging in a controlled gaseous environment 失效
    在受控气体环境下的差压HIP锻造

    公开(公告)号:US5997273A

    公开(公告)日:1999-12-07

    申请号:US521389

    申请日:1995-08-01

    Abstract: Apparatus and procedures are presented for forging, or hot working bulk ceramics, including high temperature superconductors and other sensitive materials, under precisely controlled conditions of pressure, temperature, atmospheric composition, and strain rate. A capsule with massive end plates and an independent gas supply is located in a modified hot isostatic press (HIP). Essentially uniaxial deformation of a pre-compacted disc with forces of up to 500,000 Newtons (50 tons) and at temperatures of up to 1000 C. can be achieved. The separate gas supply to the capsule can maintain a specified gaseous atmosphere around the disc, up to the operating pressure of the HIP. The apparatus is designed to tolerate partial oxygen pressures of up to 20%.

    Abstract translation: 在压力,温度,大气成分和应变率的精确控制条件下,提供锻造或热加工散装陶瓷(包括高温超导体和其他敏感材料)的设备和程序。 具有大量端板和独立气体供应的胶囊位于改进的热等静压机(HIP)中。 可以实现具有高达500,000牛顿(50吨)和高达1000℃的温度的预压实盘的基本单轴变形。 到胶囊的单独的气体供应可以在盘周围保持特定的气体气氛,直到HIP的操作压力。 该设备被设计为容忍高达20%的部分氧气压力。

    RF/VHF plasma diamond growth method and apparatus and materials produced
therein
    90.
    发明授权
    RF/VHF plasma diamond growth method and apparatus and materials produced therein 失效
    RF / VHF等离子体金刚石生长方法及其中生产的设备和材料

    公开(公告)号:US5902563A

    公开(公告)日:1999-05-11

    申请号:US960929

    申请日:1997-10-30

    Applicant: John M. Pinneo

    Inventor: John M. Pinneo

    Abstract: Processes are disclosed for performing non-microwave, non-arcjet plasma-assisted chemical vapor deposition of diamond in which substantially no particles impact the growing diamond surface with energies sufficient to prevent the growth of diamond. The energies of the particles are limited by selecting frequency, pressure, magnetic fields, electrical bias, or a combination thereof to the deposition region of the chamber. Diamond materials formed by these processes are also disclosed.

    Abstract translation: 公开了用于执行非微波,非电弧喷射等离子体辅助化学气相沉积金刚石的方法,其中基本上没有颗粒以足以防止金刚石生长的能量撞击生长的金刚石表面。 颗粒的能量通过选择频率,压力,磁场,电偏压或其组合来限制室的沉积区域。 还公开了由这些方法形成的金刚石材料。

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