Reduced striae low expansion glass and elements, and a method for making same
    1.
    发明申请
    Reduced striae low expansion glass and elements, and a method for making same 审中-公开
    减少条纹低膨胀玻璃和元素,以及制造它的方法

    公开(公告)号:US20070137252A1

    公开(公告)日:2007-06-21

    申请号:US11445048

    申请日:2006-05-31

    Abstract: The invention is directed to a low expansion glass with reduced striae, the glass have a point-to-point variation in titania content is 0.1 wt % or less through its thickness and a CTE of 0±3 ppb/° C. in the temperature range 5-35° C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat-treating the glass at temperatures above 1600° C. for a time in the range of 48-160 hours.

    Abstract translation: 本发明涉及一种具有减少条纹的低膨胀玻璃,玻璃的二氧化钛含量的点对点变化通过其厚度为0.1重量%或更小,并且在温度下为0±3ppb /℃的CTE 范围5-35℃。本发明还涉及通过使用在该方法中使用的振荡图案的重复时间为10分钟以下的方法来制造低膨胀玻璃的方法。 此外,本发明的低膨胀玻璃可以通过在高于1600℃的温度下将玻璃热处理48至160小时的时间来进一步降低条纹。

    Reduced striae low expansion glass and elements, and a method for making same
    3.
    发明申请
    Reduced striae low expansion glass and elements, and a method for making same 审中-公开
    减少条纹低膨胀玻璃和元素,以及制造它的方法

    公开(公告)号:US20070263281A1

    公开(公告)日:2007-11-15

    申请号:US11809092

    申请日:2007-05-31

    Abstract: The invention is directed to a low expansion glass with reduced striae, the glass have a point-to-point variation in titania content is 0.1 wt % or less through its thickness and a CTE of 0±3 ppb/° C. throughout the temperature range 5-35° C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat-treating the glass at temperatures above 1600° C. for a time in the range of 48-160 hours. The invention is also directed to optical elements suitable for extreme ultraviolet lithography, which elements are made of a titania-containing silica glass having a titania content in the range of 5-10 wt. %, a polished and shaped surface have a peak-to-valley roughness of less than 10 nm, an average variation in titania content of less than ±0.1 wt. % as measured through the vertical thickness of the glass and a coefficient of thermal expansion of 0±3 ppb/° C. throughout the temperature range 5-35° C.

    Abstract translation: 本发明涉及一种具有减少条纹的低膨胀玻璃,玻璃在整个温度下通过其厚度和0±3ppb /℃的CTE具有0.1重量%以下的二氧化钛含量的点对点变化 范围5-35℃。本发明还涉及通过使用在该方法中使用的振荡图案的重复时间为10分钟以下的方法来制造低膨胀玻璃的方法。 此外,本发明的低膨胀玻璃可以通过在高于1600℃的温度下将玻璃热处理48至160小时的时间来进一步降低条纹。 本发明还涉及适用于极紫外光刻的光学元件,该元件由二氧化钛含量在5-10重量%范围内的含二氧化钛的二氧化硅玻璃制成。 %,抛光和成形表面的峰谷粗糙度小于10nm,二氧化钛含量的平均变化小于±0.1wt。 %,通过玻璃的垂直厚度测量,并且在整个5-35℃的温度范围内热膨胀系数为0±3ppb /℃。

    Reduced striae low expansion glass and elements, and a method for making same
    5.
    发明申请
    Reduced striae low expansion glass and elements, and a method for making same 审中-公开
    减少条纹低膨胀玻璃和元素,以及制造它的方法

    公开(公告)号:US20070137253A1

    公开(公告)日:2007-06-21

    申请号:US11445071

    申请日:2006-05-31

    CPC classification number: C03B19/1453 C03B2201/42 C03C3/06

    Abstract: The invention is directed to a method for reducing striae in ultra-low expansion glass by heat-treating the glass at temperatures above 1600° C. for a time in the range of 72-288 hours. In one embodiment of the invention the glass is heat treated without forcing the glass to flow or “move”. The invention was found to reduce the magnitude of striae in an ultra-low expansion glass by 500%, and particularly reduces most of the “higher frequency” striae.

    Abstract translation: 本发明涉及一种通过在高于1600℃的温度下将玻璃热处理72-88小时的时间来减少超低膨胀玻璃中的条纹的方法。 在本发明的一个实施例中,玻璃被热处理而不强迫玻璃流动或“移动”。 发现本发明将超低膨胀玻璃中的条纹幅度减小了500%,特别是减少了大部分“较高频率”的条纹。

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