公开(公告)号：US20050170544A1

公开(公告)日：2005-08-04

申请号：US10769346

申请日：2004-01-30

Applicant: M.C. Chang ,  H.S. Wu ,  Tsang-Mu Lai

Inventor： M.C. Chang ,  H.S. Wu ,  Tsang-Mu Lai

IPC: B81B3/00 ,  H01L21/00

CPC classification number: B81C99/0085 ,  B81C2201/0108 ,  B81C2201/0133 ,  B81C2201/0152

Abstract: A method for forming a free standing micro-structural member including providing a substrate; blanket depositing a first sacrificial resist layer over the substrate; exposing and developing the first sacrificial resist layer to form a first resist portion; subjecting the first resist portion to at least a hard bake process to form the first resist portion having a predetermined first smaller volume compared to a desired final resist portion volume; blanket depositing at least a second sacrificial resist layer followed by exposure, development and the at least a hard bake process to form the final resist portion volume; and, depositing at least one structural material layer over the final resist portion.

Abstract translation: 一种形成独立式微结构构件的方法，包括提供基底; 在衬底上铺设第一牺牲抗蚀剂层; 曝光和显影第一牺牲抗蚀剂层以形成第一抗蚀剂部分; 使所述第一抗蚀剂部分至少进行硬烘烤处理，以形成具有预定的第一较小体积的第一抗蚀剂部分，与期望的最终抗蚀剂部分体积相比; 毯毯沉积至少第二牺牲抗蚀剂层，随后曝光，显影和至少硬烘烤工艺以形成最终的抗蚀剂部分体积; 并且在最终抗蚀剂部分上沉积至少一个结构材料层。