公开(公告)号：US20130275098A1

公开(公告)日：2013-10-17

申请号：US13861284

申请日：2013-04-11

Applicant: ASELTA NANOGRAPHICS

Inventor： Jean-Herve TORTAI ,  Patrick SCHIAVONE ,  Thiago FIGUEIRO ,  Nader JEDIDI

IPC: G06F17/50

CPC classification number: G06F17/5009 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  H01J37/222 ,  H01J37/3174 ,  H01J2237/226 ,  H01J2237/31769

Abstract: A method for projecting an electron beam used notably in lithography by direct or indirect writing as well as in electron microscopy, is provided. Notably for critical dimensions or resolutions of less than 50 nm, the proximity effects created by the forward and backward scattering of the electrons of the beam in interaction with the target must be corrected. This is traditionally done using the convolution of a point spread function with the geometry of the target. In the prior art, said point spread function uses Gaussian distribution laws. At least one of the components of the point spread function is a linear combination of Voigt functions and/or of functions approximating Voigt functions, such as the Pearson VII functions. In certain embodiments, some of the functions are centered on the backward scattering peaks of the radiation.

Abstract translation: 提供了一种用于通过直接或间接书写以及电子显微镜投射用于光刻中的电子束的方法。 值得注意的是，对于小于50nm的关键尺寸或分辨率，必须校正与目标相互作用的光束的电子的向前和向后散射产生的邻近效应。 传统上使用点扩散函数与目标几何的卷积完成。 在现有技术中，所述点扩散函数使用高斯分布规律。 点扩散函数的分量中的至少一个是Voigt函数和/或接近Voigt函数的函数的线性组合，例如Pearson VII函数。 在某些实施例中，一些功能以辐射的向后散射峰为中心。

公开(公告)号：US20160211115A1

公开(公告)日：2016-07-21

申请号：US14915288

申请日：2014-08-28

Applicant: ASELTA NANOGRAPHICS

Inventor： Nader JEDIDI ,  Patrick SCHIAVONE ,  Jean-Hervé TORTAI ,  Thiago FIGUEIRO

IPC: H01J37/304 ,  H01J37/317 ,  H01J37/285

CPC classification number: H01J37/304 ,  G03F7/70441 ,  G03F7/705 ,  H01J37/285 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/2487

Abstract: A method for projecting an electron beam onto a target includes correction of the scattering effects of the electrons in the target. This correction is made possible by a calculation step of a point spread function having a radial variation according to a piecewise polynomial function.

Abstract translation: 用于将电子束投射到目标上的方法包括校正目标中的电子的散射效应。 通过具有根据分段多项式函数的径向变化的点扩展函数的计算步骤，可以进行该校正。