公开(公告)号：US20210035840A1

公开(公告)日：2021-02-04

申请号：US16935275

申请日：2020-07-22

Applicant: ASM IP Holding B.V.

Inventor： Chris G.M. de Ridder ,  Theodorus G.M. Oosterlaken

IPC: H01L21/677 ,  F27B17/00 ,  B65G1/04 ,  F27D3/12 ,  F27D3/00 ,  H01L21/67 ,  H01L21/673

Abstract: A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and a first wall separating the cassette handling space from the wafer handling space. The wall having a wafer transfer opening. The wafer transfer opening is associated with a cassette carrousel comprising a carrousel stage having a plurality of cassette support surfaces each configured for supporting a wafer cassette. The carrousel stage is rotatable by an actuator around a substantially vertical axis to transfer each cassette support surface to a wafer transfer position in front of the wafer transfer opening and to at least one cassette load/retrieve position, wherein the vertical batch furnace assembly is configured to load or retrieve a wafer cassette on or from a cassette support surface of the carousel stage which is in the at least one load/retrieve position.

公开(公告)号：US20240384411A1

公开(公告)日：2024-11-21

申请号：US18788528

申请日：2024-07-30

Applicant: ASM IP Holding B.V.

Inventor： Kornelius Haanstra ,  Lucian C. Jdira ,  Chris G.M. de Ridder ,  Robin Roelofs ,  Werner Knaepen ,  Herbert Terhorst

IPC: C23C16/455 ,  C23C16/458 ,  H01L21/673 ,  H01L21/687

Abstract: A substrate processing apparatus having a tube, a closed liner lining the interior surface of the tube, a plurality of gas injectors to provide a gas to an inner space of the liner, and, a gas exhaust duct to remove gas from the inner space is disclosed. The liner may have a substantially cylindrical wall delimited by a liner opening at a lower end and being substantially closed for gases above the liner opening. The apparatus may have a boat constructed and arranged moveable into the inner space via the liner opening and provided with a plurality of substrate holders for holding a plurality of substrates over a substrate support length in the inner space. Each of the gas injectors may have a single exit opening at the top and the exit openings of the plurality of injectors are substantially equally divided over the substrate support length.

公开(公告)号：US20190316255A1

公开(公告)日：2019-10-17

申请号：US16304526

申请日：2016-05-27

Applicant: ASM IP Holding B.V.

Inventor： John Shugrue ,  Lucian C. Jdira ,  Chris G.M. de Ridder

IPC: C23C16/455 ,  C23C16/44

Abstract: A spatial atomic layer deposition apparatus (10), including a showerhead (16) with a showerhead side (18) having a center, a central area and a circumferential area. The apparatus also includes a susceptor (12) having a substrate support side that extends parallel to and of opposite the showerhead side forming a gap. The susceptor and the showerhead are rotatable relative to each other around an axis of rotation. The apparatus has a plurality of switchable showerhead sections. The apparatus also includes a plurality of multi-way valve assemblies. Each switchable showerhead section is fluidly connected with one of the plurality of multi-way valve assemblies, so as to fluidly connect a selected one of a plurality of different gas sources with that switchable showerhead section.

公开(公告)号：US20160071750A1

公开(公告)日：2016-03-10

申请号：US14481131

申请日：2014-09-09

Applicant: ASM IP Holding B.V.

Inventor： Chris G.M. de Ridder ,  Theodorus G.M. Oosterlaken ,  Klaas P. Boonstra

IPC: H01L21/67 ,  H01L21/683 ,  H01L21/673

CPC classification number: H01L21/67109 ,  H01L21/67017

Abstract: An assembly of a liner and a support flange for a vertical furnace for processing wafers, wherein the support flange is configured for supporting the liner, at least two support members that are connected to the cylindrical wall, each having a downwardly directed supporting surface, wherein each downwardly directed supporting surface is positioned radially outwardly from the inner cylindrical surface, wherein the support flange and/or the liner are configured such that, when the liner is placed on the support flange, the downwardly directed supporting surfaces are in contact with an upper surface of the support flange and support the liner, and wherein at least the part of the lower end surface of the liner that bounds the inner cylindrical surface is spaced apart from the upper surface of the support flange.

Abstract translation: 用于处理晶片的垂直炉的衬套和支撑凸缘的组件，其中所述支撑凸缘被构造成用于支撑衬套，连接到所述圆柱形壁的至少两个支撑构件，每个支撑构件具有向下指向的支撑表面，其中 每个向下指向的支撑表面从内圆柱形表面径向向外定位，其中支撑凸缘和/或衬套被构造成使得当衬垫放置在支撑凸缘上时，向下指向的支撑表面与上部 支撑凸缘的表面并支撑衬套，并且其中限定内圆柱形表面的衬套的下端表面的至少部分与支撑凸缘的上表面间隔开。

公开(公告)号：US20210207270A1

公开(公告)日：2021-07-08

申请号：US17142790

申请日：2021-01-06

Applicant: ASM IP Holding B.V.

Inventor： Chris G.M. de Ridder ,  Klaas P. Boonstra ,  Theodorus G.M. Oosterlaken

IPC: C23C16/455

Abstract: An injector configured to be placed in a process chamber of a batch furnace assembly for injecting a gas into said process chamber. The injector has an elongated, tubular housing enclosing an injection chamber. The housing has a gas inlet opening for supplying a gas from a gas source to the injection chamber, at least one gas supply opening for supplying the gas from the injection chamber into the process chamber, and a circumferential wall extending in a longitudinal direction of the housing. The circumferential wall comprises a first lateral wall half and a second lateral wall half. Both lateral wall halves substantially span a length of the housing in the longitudinal direction. The first and second lateral wall halves are fastened to each other by means of mechanical fastening.

公开(公告)号：US20210035842A1

公开(公告)日：2021-02-04

申请号：US16935297

申请日：2020-07-22

Applicant: ASM IP Holding B.V.

Inventor： Chris G.M. de Ridder

IPC: H01L21/677 ,  H01L21/673 ,  B65D85/30

Abstract: A cassette lid opening device for use in a clean room apparatus configured for cooperation with a wafer cassette. The cassette lid opening device comprises a wall structure having a separation wall having a wall opening for transferring wafers therethrough, a cassette docking port, and a lid handler provided to the wall structure. The cassette docking port is arranged at a first side of the wall structure for docking a wafer cassette. The lid handler is movable relative to the wall opening and configured to engage a cassette lid of the wafer cassette docked in the cassette docking port. The cassette lid opening device further comprises a blower having an elongated, slit-like nozzle substantially spanning a height or a width of the wall opening and configured to blow a curtain-shaped jet stream of a purge gas into a cassette interior of the wafer cassette.

公开(公告)号：US20210035839A1

公开(公告)日：2021-02-04

申请号：US16935269

申请日：2020-07-22

Applicant: ASM IP Holding B.V.

Inventor： Chris G.M. de Ridder

IPC: H01L21/677 ,  F27B17/00 ,  F27D3/12 ,  F27D3/00 ,  B65G1/04 ,  B65G1/06 ,  H01L21/67 ,  H01L21/673

Abstract: A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes provided with a plurality of wafers. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat in a wafer boat transfer position. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises two cassette storage carousels.

公开(公告)号：US20190032998A1

公开(公告)日：2019-01-31

申请号：US15660805

申请日：2017-07-26

Applicant: ASM IP Holding B.V.

Inventor： Lucian C. Jdira ,  Chris G.M. de Ridder ,  Theodorus G.M. Oosterlaken ,  Klaas P. Boonstra ,  Herbert Terhorst ,  Juul Keijser

IPC: F27B5/04 ,  F27B1/14 ,  F27B1/28 ,  F27B5/08 ,  F27B5/12 ,  F27B5/16 ,  F27D3/00 ,  F27D11/00

Abstract: An assembly of a liner and a flange for a vertical furnace for processing substrates is provided. The liner being configured to extend in the interior of a process tube of the vertical furnace, and the flange is configured to at least partially close a liner opening. The liner comprising a substantially cylindrical wall delimited by the liner opening at a lower end and closed at a higher end and being substantially closed for gases above the liner opening and defining an inner space. The flange comprising:an inlet opening configured to insert and remove a boat configured to carry substrates in the inner space of the liner;a gas inlet to provide a gas to the inner space. The assembly is constructed and arranged with a gas exhaust opening to remove gas from the inner space and a space between the liner and the low pressure tube.

公开(公告)号：US20240167158A1

公开(公告)日：2024-05-23

申请号：US18425643

申请日：2024-01-29

Applicant: ASM IP Holding B.V.

Inventor： Lucian C. Jdira ,  Chris G.M. de Ridder

IPC: C23C16/455

CPC classification number: C23C16/45578

Abstract: The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with at least one gas entrance opening and at least one gas exit opening. The injector may have a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis. The wall of the injector may have a varying thickness.

公开(公告)号：US20220162751A1

公开(公告)日：2022-05-26

申请号：US17530161

申请日：2021-11-18

Applicant: ASM IP Holding B.V.

Inventor： Kornelius Haanstra ,  Lucian C. Jdira ,  Chris G.M. de Ridder ,  Robin Roelofs ,  Werner Knaepen ,  Herbert Terhorst

IPC: C23C16/455 ,  H01L21/673 ,  H01L21/687 ,  C23C16/458

Abstract: A substrate processing apparatus having a tube, a closed liner lining the interior surface of the tube, a plurality of gas injectors to provide a gas to an inner space of the liner, and, a gas exhaust duct to remove gas from the inner space is disclosed. The liner may have a substantially cylindrical wall delimited by a liner opening at a lower end and being substantially closed for gases above the liner opening. The apparatus may have a boat constructed and arranged moveable into the inner space via the liner opening and provided with a plurality of substrate holders for holding a plurality of substrates over a substrate support length in the inner space. Each of the gas injectors may have a single exit opening at the top and the exit openings of the plurality of injectors are substantially equally divided over the substrate support length.