公开(公告)号：US20130196080A1

公开(公告)日：2013-08-01

申请号：US13751282

申请日：2013-01-28

Applicant: ASM IP Holding B.V.

Inventor： Hyun-Kyu CHO

IPC: C23C16/52

CPC classification number: C23C16/513 ,  C23C16/45536 ,  C23C16/52 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32899

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reactors; a plurality of gas supply units connected to the plurality of reactors; and a plurality of plasma supply units connected to the plurality of reactors. Each of the plasma supply units includes: a plasma power supplier; a plurality of diodes connected to the plasma power supplier; and a reverse voltage driver connected to the plurality of diodes through respectively corresponding switches.

Abstract translation: 根据本发明的示例性实施例的沉积设备包括多个反应器; 连接到所述多个反应器的多个气体供给单元; 以及与多个反应器连接的多个等离子体供给单元。 每个等离子体供应单元包括：等离子体供电器; 连接到等离子体电源的多个二极管; 以及通过分别对应的开关连接到所述多个二极管的反向电压驱动器。

公开(公告)号：US20160298238A1

公开(公告)日：2016-10-13

申请号：US15187879

申请日：2016-06-21

Applicant: ASM IP Holding B.V.

Inventor： Hyun-Kyu CHO

IPC: C23C16/513

CPC classification number: C23C16/513 ,  C23C16/45536 ,  C23C16/52 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32899

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reactors; a plurality of gas supply units connected to the plurality of reactors; and a plurality of plasma supply units connected to the plurality of reactors. Each of the plasma supply units includes: a plasma power supplier; a plurality of diodes connected to the plasma power supplier; and a reverse voltage driver connected to the plurality of diodes through respectively corresponding switches.

公开(公告)号：US20130247822A1

公开(公告)日：2013-09-26

申请号：US13803486

申请日：2013-03-14

Applicant: ASM IP HOLDING B.V.

Inventor： Hyun-Kyu CHO ,  Dong Rak JUNG ,  Dae-Youn KIM

IPC: C23C16/458

CPC classification number: C23C16/458 ,  H01J37/32 ,  H01J37/32715 ,  H01J37/32733 ,  H01L21/68742

Abstract: In a deposition apparatus, a protecting member made of an elastic body is inserted into a pin hole where a fixed substrate supporting pin is inserted and the substrate supporting pin is fixed through the protecting member to prevent damages to the substrate and a decrease in yield due to damages to the substrate supporting pin by preventing the substrate supporting pin from being damaged by loading or unloading of the substrate or static electricity. Further, the deposition apparatus includes a substrate supporting pin guide member capable of preventing misalignment of an unfixed substrate supporting pin to prevent damages to the substrate and a decrease in the yield due to damages to the substrate supporting pin by preventing the substrate supporting pin from being damaged by loading or unloading of the substrate or static electricity.

Abstract translation: 在沉积装置中，将由弹性体制成的保护构件插入到插入固定基板支撑销的销孔中，并且基板支撑销通过保护构件固定，以防止对基板的损坏和产量的降低 通过防止基板支撑销被基板的加载或卸载或静电损坏而损坏基板支撑销。 此外，沉积装置包括：基板支撑销引导构件，其能够防止未固定的基板支撑销的未对准，以防止对基板的损坏;以及由于通过防止基板支撑销而损坏基板支撑销而导致的产量降低 通过装载或卸载基板或静电而损坏。