公开(公告)号：US20240319617A1

公开(公告)日：2024-09-26

申请号：US18578168

申请日：2022-06-28

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Wei GUO ,  Stephen ROUX

IPC: G03F7/00 ,  G01N21/956 ,  G02F1/295

CPC classification number: G03F7/706849 ,  G01N21/956 ,  G02F1/2955 ,  G03F7/7065 ,  G03F7/706837 ,  G03F7/706845 ,  G03F7/706847 ,  G03F7/70925 ,  G01N2201/068

Abstract: A metrology system includes a radiation source (708), a phased array (722a,b;724a,b;726;734), a detector, and a comparator. The phased array includes optical elements (706), waveguides (704), and phase modulators (702). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves combine to form the beam. The detector receives radiation scattered from the surface and generates a detection signal based on the received radiation. The comparator analyzes the detection signal and determines a location of a defect on the surface based on the analyzing.