公开(公告)号：US20220415676A1

公开(公告)日：2022-12-29

申请号：US17362760

申请日：2021-06-29

Applicant: Applied Materials, Inc.

Inventor： Chaitanya Anjaneyalu PRASAD ,  Christopher Sean OLSEN ,  Lara HAWRYLCHAK ,  Erika Gabrielle HANSEN ,  Daniel C. GLOVER ,  Naman APURVA ,  Tsung-Han YANG

IPC: H01L21/67 ,  H01L21/02

Abstract: Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.

公开(公告)号：US20250161858A1

公开(公告)日：2025-05-22

申请号：US18953898

申请日：2024-11-20

Applicant: Applied Materials, Inc.

Inventor： Chaitanya Anjaneyalu PRASAD ,  Wenfei ZHANG ,  Maryam SARKARAT ,  Naman APURVA ,  Christopher S. OLSEN

IPC: B01D46/54 ,  B01D39/20 ,  B01D46/42 ,  C23C8/04 ,  C23C8/16 ,  H01L21/02

Abstract: A method for selective oxidation of a substrate. The substrate is disposed in a chamber. A hydrogen containing gas is introduced to the chamber. The hydrogen containing gas is directed through a filter to the chamber. The filter is configured to filter particles greater than about 1 nm. The chamber is pressurized to a pressure of about 250 Torr to about 800 Torr while maintaining the hydrogen containing gas in the chamber. The chamber is heated to a predetermined temperature for a predetermined period of time while maintaining the hydrogen containing gas in the chamber. The substrate is selectively oxidized.

公开(公告)号：US20210249239A1

公开(公告)日：2021-08-12

申请号：US17167469

申请日：2021-02-04

Applicant: APPLIED MATERIALS, INC.

Inventor： Naman APURVA ,  Lara A. HAWRYLCHAK ,  Mahesh RAMAKRISHNA ,  Sriharish SRINIVASAN ,  Prashant AGARWAL

IPC: H01J37/32 ,  H01L21/67

Abstract: Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of exhaust holes from the central opening to the first plenum; and at least one cutout in the central flange to provide a flow path from the first plenum to the second plenum, wherein the lower exhaust liner defines a gas flow path from the central opening to the first plenum via the plurality of exhaust holes and from the first plenum to the second plenum via the least one cutout.

公开(公告)号：US20210249284A1

公开(公告)日：2021-08-12

申请号：US16789206

申请日：2020-02-12

Applicant: Applied Materials, Inc.

Inventor： Chaitanya A. PRASAD ,  Daniel C. GLOVER ,  Naman APURVA

IPC: H01L21/67 ,  H01L21/687 ,  F27D5/00 ,  B23K1/00

Abstract: A substrate support pedestal connectable to a shaft includes a thermally conductive body, a first fluid channel disposed within an outer zone of the thermally conductive body, and a second fluid channel disposed within an inner zone of the thermally conductive body. The first fluid channel and the second fluid channel are not in fluid communication with each other and are thermally isolated from each other by a thermal barrier within the substrate support channel.

公开(公告)号：US20170343424A1

公开(公告)日：2017-11-30

申请号：US15604317

申请日：2017-05-24

Applicant: Applied Materials, Inc.

Inventor： Theodore P. MOFFITT ,  Naman APURVA

IPC: G01K11/12

CPC classification number: G01K11/125

Abstract: Embodiments disclosed herein relate to a thermal processing chamber having a substrate monitoring system. In one embodiment, a temperature monitoring system is disclosed herein. The temperature monitoring system includes a housing and a window defining an interior volume. The temperature monitoring system further includes two or more light sources, a camera, and a polarizer. The two or more light sources are disposed in the interior volume, beneath the window. A first light source of the two or more light sources has a first wavelength. A second light source of the two or more light sources has a second wavelength. A camera is disposed opposite the two or more light sources. The camera to captures a plurality of frames of two or more light beams received from the two or more light sources. The polarizer disposed in an optical path of the two or more light beams.