公开(公告)号：US20220157643A1

公开(公告)日：2022-05-19

申请号：US16952979

申请日：2020-11-19

Applicant: Applied Materials, Inc.

Inventor： Giridhar KAMESH ,  Vinodh RAMACHANDRAN ,  Chaitanya A. PRASAD ,  Mohammad AAMIR ,  Daniel C. GLOVER

IPC: H01L21/687 ,  H01L21/02 ,  H01L21/311

Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.

公开(公告)号：US20230086640A1

公开(公告)日：2023-03-23

申请号：US17992995

申请日：2022-11-23

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Chaitanya A. PRASAD

IPC: H01J37/32 ,  B08B7/00 ,  H01L21/687 ,  H01L21/67 ,  H01L21/02

Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.

公开(公告)号：US20150329966A1

公开(公告)日：2015-11-19

申请号：US14691496

申请日：2015-04-20

Applicant: Applied Materials, Inc.

Inventor： Kartik SHAH ,  Chaitanya A. PRASAD ,  Kevin Joseph BAUTISTA ,  Jeffrey TOBIN ,  Umesh M. KELKAR ,  Lara HAWRYLCHAK

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/458 ,  C23C16/4584 ,  H01L21/67115

Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.

Abstract translation: 本文所述的实施例涉及一种具有反射板的喷头，其具有用于径向分布气体的气体注射插入件。 在一个实施例中，喷头组件包括反射板和气体注射插入件。 反射板包括至少一个气体注入口。 气体注射插入件设置在反射板中，并且包括多个孔。 气体注射插入件还包括设置在气体注射插入件中的挡板，其中挡板还包括多个孔。 在挡板的第一部分和反射板之间形成第一增压室，并且在挡板的第二部分和反射板之间形成第二增压室。 气体注射插入物的多个孔和挡板的多个孔不轴向对齐。

公开(公告)号：US20210249284A1

公开(公告)日：2021-08-12

申请号：US16789206

申请日：2020-02-12

Applicant: Applied Materials, Inc.

Inventor： Chaitanya A. PRASAD ,  Daniel C. GLOVER ,  Naman APURVA

IPC: H01L21/67 ,  H01L21/687 ,  F27D5/00 ,  B23K1/00

Abstract: A substrate support pedestal connectable to a shaft includes a thermally conductive body, a first fluid channel disposed within an outer zone of the thermally conductive body, and a second fluid channel disposed within an inner zone of the thermally conductive body. The first fluid channel and the second fluid channel are not in fluid communication with each other and are thermally isolated from each other by a thermal barrier within the substrate support channel.

公开(公告)号：US20190272982A1

公开(公告)日：2019-09-05

申请号：US15934415

申请日：2018-03-23

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Chaitanya A. PRASAD

IPC: H01J37/32 ,  B08B7/00 ,  H01L21/687 ,  H01L21/67 ,  H01L21/02

Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.

公开(公告)号：US20180347045A1

公开(公告)日：2018-12-06

申请号：US15937076

申请日：2018-03-27

Applicant: Applied Materials, Inc.

Inventor： Christopher S. OLSEN ,  Eric Kihara SHONO ,  Lara HAWRYLCHAK ,  Agus Sofian TJANDRA ,  Chaitanya A. PRASAD

IPC: C23C16/455 ,  C23C16/50 ,  H01L21/67 ,  H01J37/32

Abstract: Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.

公开(公告)号：US20240282556A1

公开(公告)日：2024-08-22

申请号：US18653097

申请日：2024-05-02

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Chaitanya A. PRASAD

IPC: H01J37/32 ,  B08B7/00 ,  H01L21/02 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01J37/32724 ,  B08B7/00 ,  H01J37/3244 ,  H01L21/02046 ,  H01L21/67028 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/68757 ,  H01L21/68792 ,  H01J2237/002 ,  H01J2237/334 ,  H01J2237/335

Abstract: Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises substrate support plate coated on a top surface with a ceramic material.

公开(公告)号：US20190194810A1

公开(公告)日：2019-06-27

申请号：US16292078

申请日：2019-03-04

Applicant: Applied Materials, Inc.

Inventor： Kartik SHAH ,  Chaitanya A. PRASAD ,  Kevin Joseph BAUTISTA ,  Jeffrey TOBIN ,  Umesh M. KELKAR ,  Lara HAWRYLCHAK

IPC: C23C16/455 ,  H01L21/67 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/458 ,  C23C16/4584 ,  H01L21/67115

Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.

公开(公告)号：US20180269083A1

公开(公告)日：2018-09-20

申请号：US15921819

申请日：2018-03-15

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Chaitanya A. PRASAD ,  Emre CUVALCI

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/324

CPC classification number: H01L21/67098 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/67248 ,  H01L21/68735 ,  H01L21/68792

Abstract: Embodiments described herein generally relate to a processing apparatus having a cover piece that participates in preheating a process gas. In one implementation, the cover piece includes an annulus. The annulus has an inner wall with a first height, an outer wall with a second height, and a top surface. The second height is greater than the first height. The cover piece also includes an inner lip disposed adjacent the inner wall, and a plurality of fins disposed on the top surface of the annulus. The cover piece and the plurality of fins are an opaque quartz material. The cover piece provides for more efficient heating of process gases, is composed of a material capable of withstanding process conditions while providing for more efficient and uniform processing, and has a low CTE reducing particle contamination due to excessive expansion during processing.