公开(公告)号：US20250161858A1

公开(公告)日：2025-05-22

申请号：US18953898

申请日：2024-11-20

Applicant: Applied Materials, Inc.

Inventor： Chaitanya Anjaneyalu PRASAD ,  Wenfei ZHANG ,  Maryam SARKARAT ,  Naman APURVA ,  Christopher S. OLSEN

IPC: B01D46/54 ,  B01D39/20 ,  B01D46/42 ,  C23C8/04 ,  C23C8/16 ,  H01L21/02

Abstract: A method for selective oxidation of a substrate. The substrate is disposed in a chamber. A hydrogen containing gas is introduced to the chamber. The hydrogen containing gas is directed through a filter to the chamber. The filter is configured to filter particles greater than about 1 nm. The chamber is pressurized to a pressure of about 250 Torr to about 800 Torr while maintaining the hydrogen containing gas in the chamber. The chamber is heated to a predetermined temperature for a predetermined period of time while maintaining the hydrogen containing gas in the chamber. The substrate is selectively oxidized.

公开(公告)号：US20220301904A1

公开(公告)日：2022-09-22

申请号：US17582912

申请日：2022-01-24

Applicant: Applied Materials, Inc.

Inventor： Ji-Dih HU ,  Chaitanya Anjaneyalu PRASAD ,  Dongming IU ,  Samuel C. HOWELLS ,  Vilen K. NESTOROV

IPC: H01L21/67 ,  H05B47/105

Abstract: Methods, systems, and apparatus provide for optically monitoring individual lamps of substrate processing chambers. In one aspect, the individual lamps are monitored to determine if one or more lamps are in need of replacement. A method includes using one or more camera coupled to a borescope to capture a plurality of images of one or more lamps in a substrate processing chamber. The plurality of images is analyzed to identify a change of mean light pixel intensity in an image reference region associated with each lamp. The method includes generating an alert based on the detection of the mean light pixel intensity change.

公开(公告)号：US20220415676A1

公开(公告)日：2022-12-29

申请号：US17362760

申请日：2021-06-29

Applicant: Applied Materials, Inc.

Inventor： Chaitanya Anjaneyalu PRASAD ,  Christopher Sean OLSEN ,  Lara HAWRYLCHAK ,  Erika Gabrielle HANSEN ,  Daniel C. GLOVER ,  Naman APURVA ,  Tsung-Han YANG

IPC: H01L21/67 ,  H01L21/02

Abstract: Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.

公开(公告)号：US20230133402A1

公开(公告)日：2023-05-04

申请号：US17968561

申请日：2022-10-18

Applicant: Applied Materials, Inc.

Inventor： Christopher S. OLSEN ,  Kartik Bhupendra SHAH ,  Chaitanya Anjaneyalu PRASAD ,  Vishwas Kumar PANDEY ,  AnilKumar BODEPUDI ,  Erika HANSEN

IPC: C23C16/455 ,  C23C16/52 ,  C23C16/458

Abstract: The present disclosure relates to a gas injection module for a process chamber. The process chamber includes a chamber body, a rotatable substrate support disposed inside a process volume of the chamber body, the substrate support configured to have a rotational spin rate; an inlet port formed in the chamber body, and an injection module coupled to the inlet port. The injection module includes a body, one or more gas inlets coupled to the body, and a plurality of nozzles formed in a supply face of the body, the supply face configured to face inside the chamber body, and gas exiting from the injection module is configured to have a flow rate; the process chamber also includes a controller configured to operate the process chamber such that the ratio of the flow rate to the rotational spin rate is between about 1/3 and 3.

公开(公告)号：US20220262657A1

公开(公告)日：2022-08-18

申请号：US17630492

申请日：2020-06-30

Applicant: Applied Materials, Inc.

Inventor： Rohit MAHAKALI ,  Wenfei ZHANG ,  Chaitanya Anjaneyalu PRASAD

IPC: H01L21/67 ,  H01L21/687

Abstract: A method and apparatus for improved temperature control of a substrate is disclosed. In one embodiment, a pedestal is disclosed that includes a top plate, and a base plate coupled to the top plate, wherein the top plate comprises a multi-zone heater and the base plate comprises a plurality of grooves formed in a bottom surface thereof.