公开(公告)号：US20230102821A1

公开(公告)日：2023-03-30

申请号：US17487993

申请日：2021-09-28

Applicant: Applied Materials, Inc.

Inventor： Bruce E. ADAMS ,  Samuel C. HOWELLS ,  Alvaro GARCIA ,  Barry P. CRAVER ,  Tony Jefferson GNANAPRAKASA ,  Lei LIAN

IPC: G01J5/58 ,  H01J37/32 ,  H01L21/66

Abstract: A method and apparatus for determining the temperature of a substrate within a processing chamber are described herein. The methods and apparatus described herein utilize an etalon assembly and a heterodyning effect to determine a first temperature of a substrate. The first temperature of the substrate is determined without physically contacting the substrate. A separate temperature sensor also measures a second temperature of the substrate and/or the substrate support at a similar location. The first temperature and the second temperature are utilized to calibrate one of the temperature sensors disposed within the substrate support, a model of the processes performed within the processing chamber, or to adjust a process parameter of the process performed within the processing chamber.

公开(公告)号：US20180340835A1

公开(公告)日：2018-11-29

申请号：US15656662

申请日：2017-07-21

Applicant: Applied Materials, Inc.

Inventor： Samuel C. HOWELLS

IPC: G01J5/20 ,  G01J5/08 ,  H05B3/00 ,  H01L21/67

CPC classification number: G01J5/20 ,  G01J5/0821 ,  G01J5/0896 ,  H01L21/67115 ,  H01L21/67248 ,  H01L33/0045 ,  H05B3/0047

Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. The present disclosure discloses pulsed radiation sources, used to measure a broad range of low to high temperatures in the RTP chamber. In one example, two or more lasers, one of which emits pulses of radiation at 1,030 nm and one of which emits pulses of radiation at 1,080 nm, which measures temperatures below about 200° C., are used. In another example, two or more LEDs, one of which emits pulses of radiation at 1,030 nm and one of which emits pulses of radiation at 1,080 nm, are used. In yet another example, a broadband radiation source is used to emit pulses of radiation at least at 1,030 nm and 1,080 nm. These radiation sources are useful for detection of a broad range of low to high temperatures in the RTP chamber.

公开(公告)号：US20140009829A1

公开(公告)日：2014-01-09

申请号：US14026681

申请日：2013-09-13

Applicant: Applied Materials, Inc.

Inventor： Dean JENNINGS ,  Timothy N. THOMAS ,  Stephen MOFFATT ,  Jiping LI ,  Bruce E. ADAMS ,  Samuel C. HOWELLS

IPC: G02B27/28 ,  G02B27/10 ,  H01L21/67

CPC classification number: G02B27/283 ,  B23K26/0604 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  G02B27/10 ,  G02B27/144 ,  G02B27/145 ,  G02B27/48 ,  H01L21/268 ,  H01L21/67115

Abstract: A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. For some embodiments employing a pulsed light source, the output pulse may be stretched relative to the input pulse width. The methods and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.

Abstract translation: 提供了一种用于在时间和空间上从光源（例如脉冲激光）去除相干光的方法和装置，以提供强烈和均匀的照明。 对于采用脉冲光源的一些实施例，可以相对于输入脉冲宽度拉伸输出脉冲。 本文描述的方法和装置可以结合到需要强烈均匀照明的任何应用中，例如脉冲激光退火，焊接，烧蚀和晶片步进照明。

公开(公告)号：US20220353956A1

公开(公告)日：2022-11-03

申请号：US17729715

申请日：2022-04-26

Applicant: Applied Materials, Inc.

Inventor： Christopher S. OLSEN ,  Tobin KAUFMAN-OSBORN ,  Samuel C. HOWELLS

IPC: H05B3/02 ,  H05B3/00

Abstract: A window assembly for a thermal processing chamber applicable for thermal processing of a semiconductor substrate is provided. The window assembly includes an upper window, a lower window, and a plurality of linear reflectors disposed between the upper window and the lower window. The plurality of linear reflectors extend lengthwise parallel to each other and parallel to a plane of the window assembly. The window assembly includes a pressure control region defined between the upper window, the lower window, and side surfaces of each linear reflector.

公开(公告)号：US20180340834A1

公开(公告)日：2018-11-29

申请号：US15990377

申请日：2018-05-25

Applicant: Applied Materials, Inc.

Inventor： Samuel C. HOWELLS

IPC: G01J5/10

Abstract: An apparatus for processing substrates includes a continuum radiation source, a source manifold optically coupled to the continuum radiation source and comprising: a plurality of beam guides, each having a first end that optically couples the beam guide to the continuum radiation source; and a second end. The apparatus also includes a detector manifold to detect radiation originating from the source manifold and transmitted through a processing area, and one or more transmission pyrometers configured to analyze the source radiation and the transmitted radiation to determine an inferred temperature proximate the processing area.

公开(公告)号：US20150165551A1

公开(公告)日：2015-06-18

申请号：US14172422

申请日：2014-02-04

Applicant: Applied Materials, Inc.

Inventor： Douglas E. HOLMGREN ,  Samuel C. HOWELLS ,  Aaron Muir HUNTER ,  Theodore P. MOFFITT ,  Diwakar N. KEDLAYA

IPC: B23K26/06 ,  H01L21/67

Abstract: Embodiments described herein relate to the rapid thermal processing of substrates. A fiber coupled laser diode array is provided in an optical system configured to generate a uniform irradiance pattern on the surface of a substrate. A plurality of individually controllable laser diodes are optically coupled via a plurality of fibers to one or more lenses. The fiber coupled laser diode array generates a Gaussian radiation profile which is defocused by the lenses to generate a uniform intensity image. In one embodiment, a field stop is disposed within the optical system.

Abstract translation: 本文所述的实施例涉及衬底的快速热处理。 在配置成在衬底的表面上产生均匀辐照度图案的光学系统中提供光纤耦合激光二极管阵列。 多个可单独控制的激光二极管通过多个光纤光耦合到一个或多个透镜。 光纤耦合的激光二极管阵列产生高斯辐射分布，其由透镜散焦以产生均匀的强度图像。 在一个实施例中，场停止件设置在光学系统内。

公开(公告)号：US20150136755A1

公开(公告)日：2015-05-21

申请号：US14610893

申请日：2015-01-30

Applicant: Applied Materials, Inc.

Inventor： Douglas E. HOLMGREN ,  Samuel C. HOWELLS

IPC: B23K26/06 ,  B23K26/08 ,  H01L21/67

CPC classification number: B23K26/0648 ,  B23K26/00 ,  B23K26/0006 ,  B23K26/034 ,  B23K26/06 ,  B23K26/0626 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/0876 ,  B23K2101/40 ,  B23K2103/56 ,  G02B27/09 ,  G02B27/0911 ,  G02B27/0961 ,  G02B27/0966 ,  G02B27/10 ,  H01L21/268 ,  H01L21/67115 ,  H01L24/80

Abstract: Embodiments of the present disclosure relate to an apparatus for thermally processing a semiconductor substrate. In one embodiment, the apparatus includes a substrate support, a beam source having a fast axis for emitting a beam along an optical path intersecting the substrate support, and a homogenizer disposed along the optical path between the beam source and the substrate support. The homogenizer comprises a first lens array, and a second lens array, wherein lenses of the second lens array have a larger lenslet array spacing than lenses of the first lens array.

Abstract translation: 本公开的实施例涉及一种用于热处理半导体衬底的装置。 在一个实施例中，该装置包括基板支撑件，具有用于沿着与基板支撑件相交的光路发射光束的快轴的光束源，以及沿着光束源和基板支撑件之间的光路布置的均质器。 均化器包括第一透镜阵列和第二透镜阵列，其中第二透镜阵列的透镜具有比第一透镜阵列的透镜更大的小透镜阵列间隔。

公开(公告)号：US20200149968A1

公开(公告)日：2020-05-14

申请号：US16741907

申请日：2020-01-14

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Samuel C. HOWELLS ,  Wolfgang R. ADERHOLD ,  Leonid M. TERTITSKI ,  Michael LIU ,  Dongming IU ,  Norman L. TAM ,  Ji-Dih HU

IPC: G01J5/00 ,  H05B1/02 ,  H01L21/66 ,  G05D23/19 ,  H01L21/324 ,  H01L21/67 ,  H05B3/00 ,  H01L21/687 ,  G01J5/60

Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.

公开(公告)号：US20170040194A1

公开(公告)日：2017-02-09

申请号：US15207226

申请日：2016-07-11

Applicant: Applied Materials, Inc.

Inventor： Jiping LI ,  Aaron Muir HUNTER ,  Bruce E. ADAMS ,  Kim VELLORE ,  Samuel C. HOWELLS ,  Stephen MOFFATT

IPC: H01L21/67 ,  B23K26/0622 ,  B23K26/00 ,  B23K26/03 ,  H01L21/268 ,  H01L21/324

CPC classification number: H01L21/67115 ,  B23K26/009 ,  B23K26/034 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/352 ,  B23K2101/40 ,  H01L21/268 ,  H01L21/324

Abstract: Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate.

Abstract translation: 本文所述的实施例涉及热处理的装置和方法。 更具体地，本文所述的装置和方法涉及通过增加基板表面上的图像中的能量分布的均匀性来对半导体基板进行激光热处理。

公开(公告)号：US20150053658A1

公开(公告)日：2015-02-26

申请号：US14480415

申请日：2014-09-08

Applicant: Applied Materials, Inc.

Inventor： Bruce E. ADAMS ,  Samuel C. HOWELLS ,  Dean JENNINGS ,  Jiping LI ,  Timothy N. THOMAS ,  Stephen MOFFATT

IPC: B23K26/06 ,  G02B27/09 ,  B23K26/073

CPC classification number: B23K26/073 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/0732 ,  B23K2103/56 ,  G02B27/0961

Abstract: The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

Abstract translation: 本发明一般涉及一种光学系统，其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常，退火区域可以是正方形或矩形形状。 通常，本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。