公开(公告)号：US11854762B1

公开(公告)日：2023-12-26

申请号：US18170526

申请日：2023-02-16

Applicant: BORRIES PTE. LTD.

Inventor： Wei Fang ,  Xiaoming Chen ,  Daniel Tang ,  Liang-Fu Fan ,  Zhongwei Chen

IPC: H01J37/20

CPC classification number: H01J37/20

Abstract: The present invention provides a MEMS sample holder comprising an observation section. The observation section includes a first layer, a second layer, and a sample compartment between the first layer and the second layer. The sample compartment is configured for filling a liquid sample and observing the liquid sample filled therewithin. The sample compartment has one, two or more windows through which an electron beam can pass. Each of the windows is formed on two cavities including a first cavity on the first layer and a second cavity on the second layer that is opposite to the first cavity across the sample compartment.

公开(公告)号：US11854763B1

公开(公告)日：2023-12-26

申请号：US18046508

申请日：2022-10-14

Applicant: BORRIES PTE. LTD.

Inventor： Wei Fang ,  Xiaoming Chen ,  Daniel Tang ,  Liang-Fu Fan ,  Zhongwei Chen

IPC: H01J37/244 ,  G01N23/203

CPC classification number: H01J37/244 ,  G01N23/203 ,  G01N2223/053 ,  G01N2223/3302 ,  G01N2223/418 ,  G01N2223/646 ,  H01J2237/24475

Abstract: The present invention provides a backscattered electron (BSE) detector comprising two or more detection components that are electrically isolated from each other. Each of the detection components includes a single continuous top metal layer configured for directly receiving incident backscattered electrons and for backscattered electron to penetrate therethrough. The thickness of one of the top metal layers is different from the thickness of another one of the top metal layers. The BSE detector can be used in an apparatus of charged-particle beam for imaging a sample material. Signals from the detection components having top metal layers of different thicknesses can be inputted into different signal amplifier circuits to get different energy bands of BSE image.

公开(公告)号：US11664186B1

公开(公告)日：2023-05-30

申请号：US17817989

申请日：2022-08-07

Applicant: BORRIES PTE. LTD.

Inventor： Zhongwei Chen ,  Wei Fang ,  Xiaoming Chen ,  Daniel Tang ,  Liang-Fu Fan

IPC: H01J37/09 ,  H01J37/073 ,  H01J37/317 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/09 ,  H01J37/073 ,  H01J37/28 ,  H01J37/3174 ,  H01J37/244 ,  H01J2237/0455 ,  H01J2237/0473

Abstract: The present invention provides an apparatus of electron beam comprising an electron gun with a pinnacle limiting plate having at least one current-limiting aperture. The pinnacle limiting plate is located between a bottom (or lowest) anode and a top (or highest) condenser within the electron gun. A current (ampere) of the electron beam that has passed through the current-limiting aperture remains the same (unchanged) after the electron beam travels through the top condenser and an electron optical column and arrives at a sample space. Electron-electron interaction of the electron beam is thus reduced.