公开(公告)号：US6024249A

公开(公告)日：2000-02-15

申请号：US883649

申请日：1997-06-27

Applicant: Ching Tu On

Inventor： Ching Tu On

IPC: B05C11/08 ,  B05C11/10 ,  B05C5/00

CPC classification number: B05C11/1007 ,  B05C11/08

Abstract: The present invention provides a fluid delivery system for delivering fluid for a semiconductor manufacturing operation using a sensor to monitor fluid flow and stop fluid flow when gas bubbles or uneven fluid flow occurs. The system comprises: a fluid container 10 connected to a pressurized gas supply 18 by a gas supply tube 17; the fluid container 10 connected to a fluid feed tube 16; the fluid container 10 partially filled with a fluid 12; the fluid feed tube 16 having an inlet end 16A and an outlet end 40; a stop valve 20 connected in the fluid feed tube 16 between the fluid container 10 and the outlet end 40; an optical sensor 30 connected to the fluid feed tube 16; a control computer 39 for actuating the stop valve based on the analysis of the fluid by the optical sensor. The fluid flows from the fluid container 10 onto the wafer 50. The optical sensor 30 monitors the flow of the fluid and stops the flow of fluid when the fluid flowing past the optical sensor 30 contains gas bubbles or flows unevenly.

Abstract translation: 本发明提供了一种流体输送系统，用于使用传感器输送用于半导体制造操作的流体，以在发生气泡或不均匀流体流动时监测流体流动并停止流体流动。 该系统包括：通过气体供应管17连接到加压气体供应源18的流体容器10; 连接到流体供给管16的流体容器10; 流体容器10部分地填充有流体12; 流体供给管16具有入口端16A和出口端40; 连接在流体供给管16中的在流体容器10和出口端40之间的截止阀20; 连接到流体供给管16的光学传感器30; 控制计算机39，用于基于光学传感器对流体的分析来致动截止阀。 流体从流体容器10流到晶片50上。当流过光学传感器30的流体包含气泡或不均匀流动时，光学传感器30监测流体的流动并停止流体的流动。

公开(公告)号：US6138054A

公开(公告)日：2000-10-24

申请号：US971895

申请日：1997-11-17

Applicant: Ching Tu On

Inventor： Ching Tu On

IPC: H01J37/248 ,  H01L21/00 ,  G06F19/00

CPC classification number: H01L21/67276 ,  H01J37/248 ,  H01L21/67253 ,  G05B2219/2214 ,  G05B2219/25197 ,  G05B2219/2602 ,  H01J2237/2482 ,  H01J2237/31701

Abstract: A semiconductor processing system, such as an ion implantation machine, includes a pair of controllers respectively disposed in high and low voltage areas of the machine, and interconnected by a fiber optic communication link. The controller located in the high voltage area employs a pair of computer processor units for respectively collecting the status of process parameters and control elements in the high voltage area, and for delivering control signals to controllable elements such as flow control valves. The controller in the low voltage area likewise employs a pair of computer processor units for generating control signals that are delivered via the fiber optic link to the first controller, and for receiving status signal information from the first controller. The fiber optic link provides high voltage isolation between the two controllers and reduces noise affecting signal accuracy.

Abstract translation: 诸如离子注入机的半导体处理系统包括分别设置在机器的高低压区域中的一对控制器，并且通过光纤通信链路互连。 位于高电压区域中的控制器采用一对计算机处理器单元，用于分别收集高压区域中的工艺参数和控制元件的状态，并将控制信号传送到诸如流量控制阀的可控元件。 低电压区域中的控制器同样采用一对计算机处理器单元，用于产生通过光纤链路传递到第一控制器的控制信号，并且用于从第一控制器接收状态信号信息。 光纤链路在两个控制器之间提供高电压隔离，并减少影响信号精度的噪声。