公开(公告)号：US20120225529A1

公开(公告)日：2012-09-06

申请号：US13465551

申请日：2012-05-07

Applicant: Chieh-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yu Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Liang Chen ,  Chung-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang

Inventor： Chieh-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yu Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Liang Chen ,  Chung-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang

IPC: H01L21/336 ,  H01L21/425

CPC classification number: H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

Abstract: The present disclosure provides a semiconductor device that includes a semiconductor substrate and a transistor formed in the substrate. The transistor includes a gate stack having a high-k dielectric and metal gate, a sealing layer formed on sidewalls of the gate stack, the sealing layer having an inner edge and an outer edge, the inner edge interfacing with the sidewall of the gate stack, a spacer formed on the outer edge of the sealing layer, and a source/drain region formed on each side of the gate stack, the source/drain region including a lightly doped source/drain (LDD) region that is aligned with the outer edge of the sealing layer.

Abstract translation: 本公开提供一种半导体器件，其包括半导体衬底和形成在衬底中的晶体管。 晶体管包括具有高k电介质和金属栅极的栅极堆叠，形成在栅极叠层的侧壁上的密封层，密封层具有内边缘和外边缘，内边缘与栅叠层的侧壁相接合 ，形成在密封层的外边缘上的隔离物和形成在栅极堆叠的每一侧上的源极/漏极区域，源极/漏极区域包括与外部电极对准的轻掺杂源极/漏极（LDD）区域 密封层的边缘。

公开(公告)号：US08952276B2

公开(公告)日：2015-02-10

申请号：US13659784

申请日：2012-10-24

Applicant: Chun Ming Lin

Inventor： Chun Ming Lin

IPC: G01G19/00 ,  G01G19/52 ,  G01G19/58 ,  G01G21/28

CPC classification number: A45C13/30 ,  A45C5/14 ,  A45C13/20 ,  A45C15/00 ,  G01G19/58

Abstract: A suitcase scale is bundled a suitcase for providing functions of scaling and anti-theft. The suitcase scale comprises a housing, a processing unit disposed in the housing, a weight sensor secured in the housing and electrically connected to the processing unit, a combination lock mounted into the housing, a buckle detachably engaged to the housing and a strap having two opposite ends respectively connected to the buckle and the housing. Consequently, the strap, the buckle and the housing form an endless ring for bundling the suitcase when the combination lock is in a locked condition. The suitcase scale immediately shows the total weight value of the suitcase to prevent the user from paying and excessive baggage charge and provides a function of anti-theft due to the combination lock such that a thief or a pickpocket can not steal the belongings in the locked suitcase.

Abstract translation: 手提箱秤捆绑了一个手提箱，用于提供缩放和防盗功能。 手提箱秤包括壳体，设置在壳体中的处理单元，固定在壳体中并电连接到处理单元的重量传感器，安装到壳体中的组合锁，可拆卸地接合到壳体的带扣和具有两个 相对端分别连接到带扣和外壳。 因此，当组合锁处于锁定状态时，带，带扣和壳体形成用于捆扎手提箱的环形环。 行李箱秤立即显示手提箱的总重量值，以防止用户支付和超重的行李费用，并提供由于组合锁定的防盗功能，使得小偷或扒手不能窃取锁定的物品 手提箱。

公开(公告)号：US08193586B2

公开(公告)日：2012-06-05

申请号：US12389535

申请日：2009-02-20

Applicant: Chien-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yi Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang ,  Chien-Liang Chen

Inventor： Chien-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yi Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang ,  Chien-Liang Chen

IPC: H01L21/02 ,  H01L21/8238

CPC classification number: H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

Abstract: The present disclosure provides a semiconductor device that includes a semiconductor substrate and a transistor formed in the substrate. The transistor includes a gate stack having a high-k dielectric and metal gate, a sealing layer formed on sidewalls of the gate stack, the sealing layer having an inner edge and an outer edge, the inner edge interfacing with the sidewall of the gate stack, a spacer formed on the outer edge of the sealing layer, and a source/drain region formed on each side of the gate stack, the source/drain region including a lightly doped source/drain (LDD) region that is aligned with the outer edge of the sealing layer.

Abstract translation: 本公开提供一种半导体器件，其包括半导体衬底和形成在衬底中的晶体管。 晶体管包括具有高k电介质和金属栅极的栅极堆叠，形成在栅极叠层的侧壁上的密封层，密封层具有内边缘和外边缘，内边缘与栅叠层的侧壁相接合 ，形成在密封层的外边缘上的隔离物和形成在栅极堆叠的每一侧上的源极/漏极区域，源极/漏极区域包括与外部电极对准的轻掺杂源极/漏极（LDD）区域 密封层的边缘。

公开(公告)号：US08450161B2

公开(公告)日：2013-05-28

申请号：US13465551

申请日：2012-05-07

Applicant: Chien-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yu Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Liang Chen ,  Chung-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang

Inventor： Chien-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yu Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Liang Chen ,  Chung-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang

IPC: H01L21/00 ,  H01L21/02

CPC classification number: H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

Abstract: The present disclosure provides a semiconductor device that includes a semiconductor substrate and a transistor formed in the substrate. The transistor includes a gate stack having a high-k dielectric and metal gate, a sealing layer formed on sidewalls of the gate stack, the sealing layer having an inner edge and an outer edge, the inner edge interfacing with the sidewall of the gate stack, a spacer formed on the outer edge of the sealing layer, and a source/drain region formed on each side of the gate stack, the source/drain region including a lightly doped source/drain (LDD) region that is aligned with the outer edge of the sealing layer.

Abstract translation: 本公开提供一种半导体器件，其包括半导体衬底和形成在衬底中的晶体管。 晶体管包括具有高k电介质和金属栅极的栅极堆叠，形成在栅极叠层的侧壁上的密封层，密封层具有内边缘和外边缘，内边缘与栅叠层的侧壁相接合 ，形成在密封层的外边缘上的隔离物和形成在栅极堆叠的每一侧上的源极/漏极区域，源极/漏极区域包括与外部电极对准的轻掺杂源极/漏极（LDD）区域 密封层的边缘。

公开(公告)号：US20100044803A1

公开(公告)日：2010-02-25

申请号：US12389535

申请日：2009-02-20

Applicant: Chien-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yi Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Liang Chen ,  Chung-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang

Inventor： Chien-Hao Chen ,  Hao-Ming Lien ,  Ssu-Yi Li ,  Jun-Lin Yeh ,  Kang-Cheng Lin ,  Kuo-Tai Huang ,  Chii-Horng Li ,  Chien-Liang Chen ,  Chung-Hau Fei ,  Wen-Chih Yang ,  Jin-Aun Ng ,  Chi Hsin Chang ,  Chun Ming Lin ,  Harry Chuang

IPC: H01L29/78 ,  H01L21/336

CPC classification number: H01L21/28088 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

Abstract: The present disclosure provides a semiconductor device that includes a semiconductor substrate and a transistor formed in the substrate. The transistor includes a gate stack having a high-k dielectric and metal gate, a sealing layer formed on sidewalls of the gate stack, the sealing layer having an inner edge and an outer edge, the inner edge interfacing with the sidewall of the gate stack, a spacer formed on the outer edge of the sealing layer, and a source/drain region formed on each side of the gate stack, the source/drain region including a lightly doped source/drain (LDD) region that is aligned with the outer edge of the sealing layer.

Abstract translation: 本公开提供一种半导体器件，其包括半导体衬底和形成在衬底中的晶体管。 晶体管包括具有高k电介质和金属栅极的栅极堆叠，形成在栅极叠层的侧壁上的密封层，密封层具有内边缘和外边缘，内边缘与栅叠层的侧壁相接合 ，形成在密封层的外边缘上的隔离物和形成在栅极堆叠的每一侧上的源极/漏极区域，源极/漏极区域包括与外部电极对准的轻掺杂源极/漏极（LDD）区域 密封层的边缘。