公开(公告)号：US20220065804A1

公开(公告)日：2022-03-03

申请号：US17462933

申请日：2021-08-31

Applicant: FEI Company

Inventor： Oleksii Kaplenko ,  Ondrej Machek ,  Tomás Vystavel ,  Jan Klusácek ,  Kristýna Bukvisová ,  Mykola Kaplenko

IPC: G01N23/2206 ,  G01N23/203 ,  G01N23/2204

Abstract: The invention relates to a method of, and apparatus for, examining a sample using a charged particle beam apparatus. The method as defined herein comprises the step of detecting, using a first detector, emissions of a first type from the sample in response to the charged particle beam illuminating the sample. The method further comprises the step of acquiring spectral information on emissions of a second type from the sample in response to the charged particle beam illuminating the sample. As defined herein, said step of acquiring spectral information comprises the steps of providing a spectral information prediction algorithm and using said algorithm for predicting said spectral information based on detected emissions of the first type as an input parameter of said algorithm. With this it is possible to gather EDS data using only a BSE detector.

公开(公告)号：US20160054240A1

公开(公告)日：2016-02-25

申请号：US14834069

申请日：2015-08-24

Applicant: FEI Company

Inventor： Marek Uncovský ,  Pavel Stejskal ,  Tomás Vystavel

IPC: G01N23/203 ,  H01J37/244

CPC classification number: G01N23/203 ,  H01J37/244 ,  H01J37/252 ,  H01J2237/2442 ,  H01J2237/2446 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/2555 ,  H01J2237/31745

Abstract: The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary, in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.

Abstract translation: 本发明涉及一种获取带电粒子装置中的样品的能量反向散射图案图像的方法，该样品显示平坦表面，装有电子柱的带电粒子装置用于产生精细聚焦的电子束，位置敏感检测器 用于检测EBSP图案的样本保持器和用于保持和定位样本的样本保持器，该方法包括以下步骤：相对于电子束定位样本，将电子束定向到样品上的冲击点，从而使反向散射的电子 照射检测器，并在光束保持静止的同时从检测器获取信号，其中检测器被配备为以高于预定阈值的能量选择性地检测电子，并且使用具有高于所述阈值的能量的电子的信号 形成EBSP图像。

公开(公告)号：US20210404978A1

公开(公告)日：2021-12-30

申请号：US16917114

申请日：2020-06-30

Applicant: FEI Company

Inventor： Tomás Vystavel ,  Zuzana Hlavenková

IPC: G01N23/207 ,  G01N23/2251 ,  G01N23/046

Abstract: Methods and systems for conducting tomographic imaging microscopy of a sample with a high energy charged particle beam include irradiating a first region of the sample in a first angular position with a high energy charged particle beam and detecting emissions resultant from the charged particle beam irradiating the first region. The sample is repositioned into a second angular position such that the second region to be different than the first region, and a second region of the sample is irradiated. Example repositioning may include one or more of a translation of the sample, a helical rotation of the sample, the sample being positioned in a non-eucentric position, or a combination thereof. Emissions resultant from irradiation of the second region are then detected, and a 3D model of a portion of the sample is generated based at least in part on the detected first emissions and detected second emissions.

公开(公告)号：US20190198287A1

公开(公告)日：2019-06-27

申请号：US15851632

申请日：2017-12-21

Applicant: FEI Company

Inventor： Tomás Vystavel ,  Libor Strakos ,  Anna Prokhodtseva ,  Jaromír Vanhara ,  Jaroslav Stárek

IPC: H01J37/20 ,  H01J37/244 ,  H01J37/147 ,  H01J37/28 ,  H01J37/305

CPC classification number: H01J37/20 ,  H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3045 ,  H01J37/305 ,  H01J2237/1501 ,  H01J2237/20207 ,  H01J2237/24475 ,  H01J2237/2802 ,  H01J2237/30455 ,  H01J2237/3174 ,  H01J2237/31747

Abstract: A substrate is alignable for ion beam milling or other inspection or processing by obtaining an electron channeling pattern (ECP) or other electron beam backscatter pattern from the substrate based on electron beam backscatter from the substrate. The ECP is a function of substrate crystal orientation and tilt angles associated with ECP pattern values at or near a maximum, minimum, or midpoint are used to determine substrate tilt. Such tilt is then compensated or eliminated using a tilt stage coupled the substrate, or by adjusting an ion beam axis. In typical examples, circuit substrate “chunks” are aligned for ion beam milling to reveal circuit features for evaluation of circuit processing.

公开(公告)号：US20180100815A1

公开(公告)日：2018-04-12

申请号：US15728252

申请日：2017-10-09

Applicant: FEI Company

Inventor： Pavel Stejskal ,  Marek Uncovský ,  Tomás Vystavel ,  Alan Frank de Jong ,  Bart Buijsse ,  Pierre Bleuet

IPC: G01N23/04

CPC classification number: G01N23/046 ,  G01N23/2251 ,  G01N2223/1016 ,  G01N2223/204 ,  G01N2223/309 ,  G01N2223/3306 ,  G01N2223/401 ,  G01N2223/417 ,  G01N2223/419 ,  G21K7/00 ,  H01J37/28 ,  H01J2237/2807

Abstract: A method of investigating a specimen using X-ray tomography, comprising (a) mounting the specimen to a specimen holder, (b) irradiating the specimen with a beam of X-rays along a first line of sight through the specimen, and (c) detecting a flux of X-rays transmitted through the specimen and forming a first image. Then (d) repeating the steps (b) and (c) for a series of different lines of sight through the specimen, thereby producing a corresponding series of images. The method further comprises (e) performing a mathematical reconstruction on said series of images, so as produce a tomogram of at least part of the specimen, wherein the specimen is disposed within a substantially cylindrical metallic shell with an associated cylindrical axis, the beam of X-rays is produced by directing a beam of charged particles onto a zone of said metallic shell, so as to produce a confined X-ray source at said zone, and the series of different lines of sight is achieved by rotating said shell about said cylindrical axis, thereby causing relative motion of said zone relative to the specimen.

公开(公告)号：US20160307727A1

公开(公告)日：2016-10-20

申请号：US15099453

申请日：2016-04-14

Applicant: FEI Company

Inventor： Tomás Vystavel ,  Petronella Catharina Maria Baken ,  Ernst Jan Ruben Vesseur ,  Pavel Poloucek

IPC: H01J37/20 ,  H01J37/317 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/2007 ,  H01J2237/208 ,  H01J2237/26 ,  H01J2237/31745

Abstract: The invention relates to a method of manipulating a sample in an evacuated chamber of a charged particle apparatus, the method performed in said evacuated chamber, the method including: providing a sample on a first substrate; bringing an extremal end of a manipulator in contact with the sample; attaching the sample to said extremal end, the attaching being a removable attaching; lifting the sample attached to the extremal end of the manipulator from the first substrate and transport the sample to a second substrate; attaching the sample to the second substrate; and detaching the sample from the extremal end of the manipulator. At least one of the steps of attaching the sample being performed solely by bringing the sample into contact with a bundle of carbon nanotubes.

Abstract translation: 本发明涉及一种在带电粒子装置的抽真空室中操作样品的方法，该方法在所述真空室中进行，所述方法包括：在第一基底上提供样品; 使机械手的极端结束与样品接触; 将样品附接到所述极端，所述附件是可移除的附接; 将附着到操纵器的极端的样品从第一基底提起并将样品输送到第二基底; 将样品附接到第二基底; 并将样品从操纵器的极端分离。 仅通过使样品与一束碳纳米管接触来附接样品的步骤中的至少一个。