Abstract:
Thin film photovoltaic devices are provided that include a transparent substrate defining an inner surface and an outer surface; a thin film stack on the inner surface of the transparent substrate; an encapsulation substrate on the thin film stack; and a color reflection film on the outer surface of the transparent substrate. The thin film stack has a photovoltaic heterojunction (e.g., formed from a n-type window thin film layer and an absorber thin film layer). Generally, the color reflection film comprises a colorant, such as a refractive material (e.g., a nitride material, an oxide material, or mixtures thereof). Methods are also provided for forming such a photovoltaic device, and for forming an array of photovoltaic devices to define an image.
Abstract:
Methods for treating a semiconductor layer including a semiconductor material are presented. A method includes contacting at least a portion of the semiconductor material with a passivating agent. The method further includes forming a first region in the semiconductor layer by introducing a dopant into the semiconductor material; and forming a chalcogen-rich region. The method further includes forming a second region in the semiconductor layer, the second region including a dopant, wherein an average atomic concentration of the dopant in the second region is greater than an average atomic concentration of the dopant in the first region. Photovoltaic devices are also presented.