QUANTITATIVE ANALYSIS METHOD FOR MEASURING TARGET ELEMENT IN SPECIMEN USING LASER-INDUCED PLASMA SPECTRUM
    1.
    发明申请
    QUANTITATIVE ANALYSIS METHOD FOR MEASURING TARGET ELEMENT IN SPECIMEN USING LASER-INDUCED PLASMA SPECTRUM 有权
    使用激光等离子体光谱测量样品中目标元素的量化分析方法

    公开(公告)号:US20140168645A1

    公开(公告)日:2014-06-19

    申请号:US14104888

    申请日:2013-12-12

    CPC classification number: G01N21/718 G01J3/28 G01J3/443

    Abstract: Disclosed herein is a quantitative analysis method for measuring a target element in a specimen using laser-induced plasma spectrum. More particularly, the present invention relates to a method for analyzing a composition ratio of a target element by calculating peak intensities when peaks overlap each other in a spectrum, and a method for selecting a peak of a wavelength at which the highest precision and reproducibility are secured through linearity of a correlation plot of the peak intensities and a value by dividing a standard deviation value of calibration curve data (peak intensity ratios) by a slope when an internal standard method is used for quantitative analysis of a target element.

    Abstract translation: 本文公开了一种使用激光诱导等离子体光谱测量样品中的目标元素的定量分析方法。 更具体地说,本发明涉及一种用于通过计算峰中在峰上彼此重叠的峰强度来分析目标元素的组成比的方法,以及用于选择具有最高精度和重现性的波长的峰值的方法 通过使用内标法进行目标元素的定量分析时,通过将峰强度的相关图的线性度和通过将校准曲线数据(峰强度比)的标准偏差值除以斜率的值来确保。

Patent Agency Ranking