公开(公告)号：US11784453B2

公开(公告)日：2023-10-10

申请号：US17517982

申请日：2021-11-03

Applicant: Gigaphoton Inc.

Inventor： Yuki Tamaru ,  Taisuke Miura

IPC: H01S3/23 ,  H01S3/225

CPC classification number: H01S3/2325 ,  H01S3/225

Abstract: A laser system includes a beam shaping unit, a random phase plate, and a collimating optical system in an optical path between a solid-state laser device and an excimer amplifier. When a traveling direction of a laser beam entering the excimer amplifier is a Z direction, a discharge direction of a pair of discharge electrodes is a V direction, a direction orthogonal to the V and Z directions is an H direction, a shaping direction of the beam shaping unit corresponding to the V direction is a first direction, a shaping direction of the beam shaping unit corresponding to the H direction is a second direction, an expansion rate in the first direction is E1, and an expansion rate in the second direction is E2, the beam shaping unit expands a beam section of the laser beam such that an expansion ratio defined by E2/E1 is higher than 1.

公开(公告)号：US11870209B2

公开(公告)日：2024-01-09

申请号：US17517982

申请日：2021-11-03

Applicant: Gigaphoton Inc.

Inventor： Yuki Tamaru ,  Taisuke Miura

IPC: H01S3/23 ,  H01S3/225

CPC classification number: H01S3/2325 ,  H01S3/225

Abstract: A laser system includes a beam shaping unit, a random phase plate, and a collimating optical system in an optical path between a solid-state laser device and an excimer amplifier. When a traveling direction of a laser beam entering the excimer amplifier is a Z direction, a discharge direction of a pair of discharge electrodes is a V direction, a direction orthogonal to the V and Z directions is an H direction, a shaping direction of the beam shaping unit corresponding to the V direction is a first direction, a shaping direction of the beam shaping unit corresponding to the H direction is a second direction, an expansion rate in the first direction is E1, and an expansion rate in the second direction is E2, the beam shaping unit expands a beam section of the laser beam such that an expansion ratio defined by E2/E1 is lower than 1.