公开(公告)号：US20170062710A1

公开(公告)日：2017-03-02

申请号：US15197847

申请日：2016-06-30

Applicant: HGST Netherlands B.V.

Inventor： Luiz M. Franca-Neto ,  Ricardo Ruiz

IPC: H01L43/12 ,  G11C11/16 ,  H01L43/10 ,  H01L27/22 ,  H01L43/08 ,  H01L43/02

CPC classification number: H01L43/12 ,  G11C11/161 ,  G11C11/1659 ,  G11C11/1675 ,  G11C11/18 ,  H01L27/222 ,  H01L27/228 ,  H01L43/02 ,  H01L43/08 ,  H01L43/10

Abstract: A magnetic memory array and a method for implementing the magnetic memory array for use in Solid-State Drives (SSDs) are provided. A plurality of magnetic pillar memory cells is formed using a deposition and/or growth process to produce a magnetic memory array substantially avoiding milling of magnetic materials.

Abstract translation: 提供了一种磁存储器阵列和用于实现在固态硬盘（SSD）中使用的磁存储器阵列的方法。 使用沉积和/或生长工艺形成多个磁柱存储单元，以产生基本上避免研磨磁性材料的磁存储器阵列。

公开(公告)号：US20160342089A1

公开(公告)日：2016-11-24

申请号：US14718236

申请日：2015-05-21

Applicant: HGST Netherlands B.V.

Inventor： Ricardo Ruiz ,  Lei Wan

IPC: G03F7/16 ,  B05D1/38 ,  B05D3/10 ,  B05D1/32

CPC classification number: G03F7/0002

Abstract: A method uses a topographic pattern for directed self-assembly (DSA) of block copolymers (BCPs). Conventional lithography generates a topographic pattern of guiding stripes that have sidewalls that preferentially wet one of the blocks. A BCP blend with functional homopolymers, called “inks”, is deposited and annealed on the topographic pattern. After annealing, the BCP blend is guided to self-assemble by the topographic pattern. The inks selectively distribute into blocks, and part of the inks graft in the trenches between the topographic features. The BCP blend layer is rinsed away, leaving the grafted inks that form a chemical pattern. A second layer of BCP is deposited on this chemical pattern and annealed, resulting in DSA of the second BCP. After removal of one of the BCP blocks of the second BCP, the remaining blocks can serve as an etch mask.

Abstract translation: 一种方法使用嵌体共聚物（BCP）的定向自组装（DSA）的地形图案。 常规光刻产生具有优先湿润其中一个块的侧壁的引导条纹的形状图案。 与功能性均聚物（称为“油墨”）的BCP共混物在地形图案上沉积并退火。 退火后，BCP混合物通过地形图进行自组装。 油墨选择性地分配到块中，并且部分油墨在地形特征之间的沟槽中移植。 BCP混合层被冲洗掉，留下形成化学图案的接枝油墨。 第二层BCP沉积在该化学图案上并退火，得到第二BCP的DSA。 在移除第二BCP的BCP块之一之后，剩余的块可以用作蚀刻掩模。

公开(公告)号：US20160133292A1

公开(公告)日：2016-05-12

申请号：US14935914

申请日：2015-11-09

Applicant: Wisconsin Alumni Research Foundation ,  HGST Netherlands B.V.

Inventor： Paul F. Nealey ,  Huiman Kang ,  Francois Detcheverry ,  Juan J. de Pablo ,  Ricardo Ruiz ,  Thomas Albrecht

IPC: G11B5/84

CPC classification number: G11B5/84 ,  B05D5/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/743 ,  G11B5/746 ,  G11B5/82 ,  G11B5/855

Abstract: Methods to pattern substrates with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block copolymer film on the chemically patterned imaging layer, and allowing the block copolymer to self-assemble in the presence of the chemically patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern. In certain embodiments, the density and total number of pattern features in the block copolymer film is also increased. High density and quality nanoimprint templates and other nanopatterned structures are also provided.

公开(公告)号：US09224412B2

公开(公告)日：2015-12-29

申请号：US14169255

申请日：2014-01-31

Applicant: HGST Netherlands B.V.

Inventor： Bruce Alvin Gurney ,  Ricardo Ruiz ,  Shi-Ling Chang Wang ,  Qing Zhu ,  Han Zou

IPC: G11B5/66 ,  G11B5/73

CPC classification number: G11B5/7325

Abstract: A continuous-media perpendicular magnetic recording disk has a granular recording layer (RL) with controlled grain pitch distribution and controlled long range ordering of the grains. The disk includes a substrate with a template layer for the RL that comprises a blend of at least two different sized nanoparticles. The nanoparticles have a nanoparticle core with attached polymer ligands. The nanoparticle cores protrude above the surface of the template layer to provide a nonplanar surface topology. The blend of two sizes of nanoparticles causes the RL to have low grain pitch distribution and a disruption of long range ordering so that there are no large magnetic rafts. One of the nanoparticles types has a diameter greater than 105% of the diameter of the other nanoparticle type and is present in the total blend of nanoparticles of between about 5% and 35% or between about 55% and 90%.

Abstract translation: 连续介质垂直磁记录盘具有粒度记录层（RL），其具有受控的颗粒间距分布和受控的颗粒长距离排序。 盘包括具有用于RL的模板层的衬底，其包含至少两种不同尺寸的纳米颗粒的共混物。 纳米颗粒具有附着的聚合物配体的纳米颗粒核心。 纳米颗粒芯突出在模板层的表面上方以提供非平面表面拓扑结构。 两种尺寸的纳米颗粒的混合使得RL具有低的晶间距分布和长距离排序的中断，使得没有大的磁筏。 纳米颗粒之一具有大于其他纳米颗粒类型直径的105％的直径，并且存在于约5％至35％之间或约55％至90％之间的纳米颗粒的总共混物中。

公开(公告)号：US08900467B1

公开(公告)日：2014-12-02

申请号：US13902795

申请日：2013-05-25

Applicant: HGST Netherlands B.V.

Inventor： Yves-Andre Chapuis ,  Ricardo Ruiz ,  Lei Wan

IPC: C03C15/00 ,  C08J7/02

CPC classification number: C08J7/02 ,  G03F7/0002

Abstract: A method for making a chemical contrast pattern uses directed self-assembly of block copolymers (BCPs) and sequential infiltration synthesis (SIS) of an inorganic material. For an example with poly(styrene-block-methyl methacrylate) (PS-b-PMMA) as the BCP and alumina as the inorganic material, the PS and PMMA self-assemble on a suitable substrate. The PMMA is removed and the PS is oxidized. A surface modification polymer (SMP) is deposited on the oxidized PS and the exposed substrate and the SMP not bound to the substrate is removed. The structure is placed in an atomic layer deposition chamber. Alumina precursors reactive with the oxidized PS are introduced and infuse by SIS into the oxidized PS, thereby forming on the substrate a chemical contrast pattern of SMP and alumina. The resulting chemical contrast pattern can be used for lithographic masks, for example to etch the underlying substrate to make an imprint template.

Abstract translation: 用于制造化学对比图案的方法使用无定形嵌段共聚物（BCP）和顺序渗透合成（SIS）的无定形自组装。 对于作为BCP的聚（苯乙烯 - 嵌段 - 甲基丙烯酸甲酯）（PS-b-PMMA）和作为无机材料的氧化铝的实例，PS和PMMA自组装在合适的基材上。 去除PMMA并且PS被氧化。 将表面改性聚合物（SMP）沉积在氧化的PS和暴露的基底上，并且除去未结合到基底的SMP。 将该结构放置在原子层沉积室中。 与氧化的PS反应的氧化铝前体被引入并通过SIS注入到氧化的PS中，从而在衬底上形成SMP和氧化铝的化学对比图。 所得到的化学对比度图案可以用于光刻掩模，例如蚀刻下面的衬底以形成压印模板。

公开(公告)号：US09431457B1

公开(公告)日：2016-08-30

申请号：US14835271

申请日：2015-08-25

Applicant: HGST Netherlands B.V.

Inventor： Luiz M. Franca-Neto ,  Ricardo Ruiz

IPC: H01L29/82 ,  H01L27/22 ,  G11C11/16 ,  H01L43/12 ,  H01L43/08 ,  H01L43/02 ,  H01L43/10

CPC classification number: H01L43/12 ,  G11C11/161 ,  G11C11/1659 ,  G11C11/1675 ,  G11C11/18 ,  H01L27/222 ,  H01L27/228 ,  H01L43/02 ,  H01L43/08 ,  H01L43/10

Abstract: A magnetic memory array and a method for implementing the magnetic memory array for use in Solid-State Drives (SSDs) are provided. A plurality of magnetic pillar memory cells is formed using a deposition and/or growth process to produce a magnetic memory array substantially avoiding milling of magnetic materials.

Abstract translation: 提供了一种磁存储器阵列和用于实现在固态硬盘（SSD）中使用的磁存储器阵列的方法。 使用沉积和/或生长工艺形成多个磁柱存储单元，以产生基本上避免研磨磁性材料的磁存储器阵列。

公开(公告)号：US09336809B2

公开(公告)日：2016-05-10

申请号：US14471103

申请日：2014-08-28

Applicant: HGST Netherlands B.V.

Inventor： Hitesh Arora ,  Sripathi Vangipuram Canchi ,  Franck Dreyfus Rose ,  Ricardo Ruiz ,  Vipin Ayanoor-Vitikkate

IPC: B44C1/22 ,  B23P15/00 ,  C03C25/00 ,  C23F1/00 ,  C03C25/68 ,  H01L21/00 ,  G11B5/84

CPC classification number: G11B5/84 ,  G11B5/855

Abstract: A method to fabricate an imprint template for bit-patterned magnetic recording media using block copolymers (BCPs) integrates data region patterning and servo region patterning. A heat sink layer is formed on the imprint substrate only in the data regions. A sublayer for the BCP is deposited over both the data regions and the servo regions and patterned to form stripes in the data regions and servo features in the servo regions. A BCP is then deposited in both the data and servo regions. Only the BCP in the data regions is heated, which causes phase separation of the BCP in the data regions into the two BCP components. The selective heating may be accomplished by directed controlled laser radiation to only the data regions. The heat sink layer below the data regions absorbs the heat from the laser radiation, confining it to the data regions.

Abstract translation: 使用嵌段共聚物（BCP）制造位图案磁记录介质的压印模板的方法集成了数据区域图案化和伺服区域图案化。 在压印基板上仅在数据区域中形成散热层。 用于BCP的子层沉积在数据区域和伺服区域上，并被图案化以在伺服区域中的数据区域和伺服特征中形成条纹。 然后将BCP沉积在数据和伺服区域中。 只有数据区域中的BCP被加热，这导致数据区域中的BCP相分离成两个BCP组件。 可以通过定向控制的激光辐射仅对数据区域实现选择性加热。 数据区域之下的散热层吸收激光辐射的热量，将其限制在数据区域。

公开(公告)号：US20150243514A1

公开(公告)日：2015-08-27

申请号：US14707315

申请日：2015-05-08

Applicant: HGST Netherlands B.V.

Inventor： Ricardo Ruiz ,  Lei Wan

IPC: H01L21/308 ,  H01L21/027

CPC classification number: H01L21/3086 ,  B81C1/00031 ,  B81C2201/0149 ,  C09D153/00 ,  G03F7/0002 ,  H01L21/02118 ,  H01L21/0271 ,  H01L21/0272 ,  H01L21/0273 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3081 ,  H01L21/31058 ,  H01L21/31138

Abstract: A method for directed self-assembly (DSA) of block copolymers (BCPs) uses a BCP blend with a small portion of functional homopolymers, called “inks”, before deposition and annealing of the BCP. A substrate has a patterned sublayer formed on it. The BCP blend is deposited on the patterned sublayer and annealed. The BCP blend is guided by the sublayer pattern. The inks selectively distribute into blocks, and part of the inks graft on the substrate underneath the blocks. The BCP blend layer is rinsed away, leaving the grafted inks. The grafted inks form a chemical contrast pattern that has the same geometry with the BCP bulk morphology. This process is repeated, which results in the grafted inks forming a thicker and denser chemical contrast pattern. This chemical contrast pattern of grafted inks is used for the DSA of a BCP that self-assembles as lamellae perpendicular to the substrate.

Abstract translation: 嵌段共聚物（BCP）的定向自组装（DSA）的方法在BCP的沉积和退火之前使用具有少量功能均聚物的BCP共混物，称为“油墨”。 衬底上形成有图案化的子层。 将BCP共混物沉积在图案化的子层上并退火。 BCP混合物由子层图案引导。 油墨选择性地分配到块中，并且部分油墨移植到块下面的基底上。 将BCP混合层冲洗掉，留下接枝的油墨。 接枝油墨形成与BCP体积形态具有相同几何形状的化学对比图案。 重复该过程，这导致接枝的油墨形成更厚和更致密的化学对比度图案。 接枝油墨的这种化学对比图案用于自组装成垂直于衬底的薄片的BCP的DSA。

公开(公告)号：US20150225850A1

公开(公告)日：2015-08-13

申请号：US14174939

申请日：2014-02-07

Applicant: HGST Netherlands B.V.

Inventor： Hitesh Arora ,  Ricardo Ruiz

IPC: C23C16/455 ,  C23C16/40 ,  C23C16/22

CPC classification number: C23C16/45525 ,  C23C16/401 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  C23C16/407 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/0335 ,  H01L21/3083

Abstract: Block copolymers (BCPs) and synthetic infiltration synthesis (SIS) are used to double the line density on a substrate. The BCP comprises first and second interconnected BCP components with a functional group at the junction or interface of the components. After deposition of the BCP on the substrate and annealing, a pattern of parallel stripes of first and second BCP components is formed with a pattern of functional group interfaces between the components. Each of the BCP components is non-reactive with atomic layer deposition (ALD) precursors, while the functional group is reactive with the ALD precursors. The ALD results in the infiltration of inorganic material into the interfaces where the reactive functional groups are located but without affecting the BCP components. After removal of the organic material, a pattern of parallel lines of inorganic material remains with a pitch half that of the stripes of BCP components.

Abstract translation: 嵌段共聚物（BCP）和合成渗透合成（SIS）用于使底物上的线密度加倍。 BCP包括在组件的接合或界面处具有功能组的第一和第二互连的BCP组件。 在将BCP沉积在基板上并进行退火之后，形成第一和第二BCP部件的平行条纹图案，其中部件之间具有功能性界面的图案。 每个BCP组分与原子层沉积（ALD）前体无反应，而官能团与ALD前体反应。 ALD导致无机材料渗透到反应性官能团所在界面但不影响BCP组分。 在去除有机材料之后，平行的无机材料线的图案以BCP组分条纹的一半的间距保留。

公开(公告)号：US20150118851A1

公开(公告)日：2015-04-30

申请号：US14067769

申请日：2013-10-30

Applicant: HGST Netherlands B.V.

Inventor： He Gao ,  Ricardo Ruiz ,  Lei Wan

IPC: H01L21/308

CPC classification number: H01L21/0272 ,  C09D153/00 ,  G03F7/0002 ,  H01L21/02118 ,  H01L21/0337 ,  H01L21/3081 ,  H01L21/31058 ,  H01L21/31138

Abstract: In directed self-assembly (DSA) of a block copolymer (BCP), a patterned sublayer on a substrate serves as a guiding chemical prepattern on which BCPs form more uniform and/or denser patterns. A layer of a blend of a BCP and functional homopolymers, referred to as inks, is deposited on the patterned sublayer and annealed to change the initial chemical prepattern to a 1:1-like chemical pattern that is more favorable to DSA. After annealing, the inks selectively distribute into blocks by DSA, and part of the inks graft on the substrate underneath the blocks. The BCP blend layer is then rinsed away, leaving the grafted inks A second layer of BCP is then deposited and annealed as a second DSA step to form alternating lines of the BCP components. One of the BCP components is removed, leaving lines of the other BCP component as a mask for patterning the substrate.

Abstract translation: 在嵌段共聚物（BCP）的定向自组装（DSA）中，衬底上的图案化子层用作引导化学制剂图案，其中BCP形成更均匀和/或更密集的图案。 将BCP和功能性均聚物（称为油墨）的共混物层沉积在图案化的子层上并进行退火，以将初始化学预制图改变为更有利于DSA的1:1类化学图案。 退火后，油墨通过DSA选择性地分散到块中，并且部分油墨移植到块下面的基底上。 然后将BCP共混物层冲洗掉，留下接枝的墨水然后沉积第二层BCP并作为第二DSA步骤退火以形成BCP组分的交替线。 BCP组件中的一个被去除，留下另一个BCP组件的线作为用于图案化衬底的掩模。