公开(公告)号：US20170229284A1

公开(公告)日：2017-08-10

申请号：US15514656

申请日：2014-09-29

Applicant: HITACHI, LTD.

Inventor： Shinichi MATSUBARA ,  Hiroyasu SHICHI ,  Takashi OHSHIMA

IPC: H01J37/26 ,  H01J37/08 ,  H01J37/16

CPC classification number: H01J37/26 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0807 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2608 ,  H01J2237/31749

Abstract: Since a diffraction phenomenon occurs in the electron beam passing through a differential evacuation hole, an electron beam whose probe diameter is narrowed cannot pass through a hole having an aspect ratio of a predetermined value or more, and accordingly, a degree in vacuum on the electron beam side cannot be improved. By providing a differential evacuation hole with a high aspect ratio in an ion beam device, it becomes possible to obtain an observed image on a sample surface, with the sample being placed under the atmospheric pressure or a pressure similar thereto, in a state where the degree of vacuum on the ion beam side is stabilized. Moreover, by processing the differential evacuation hole by using an ion beam each time it is applied, both a normal image observation with high resolution and an image observation under atmospheric pressure or a pressure similar thereto can be carried out.

公开(公告)号：US20240346818A1

公开(公告)日：2024-10-17

申请号：US18292978

申请日：2022-09-21

Applicant: HITACHI, LTD.

Inventor： Takafumi MIWA ,  Sayaka KURATA ,  Shinichi MATSUBARA ,  Yuta IMAI

IPC: G06V10/98 ,  G06T7/00 ,  G06V10/25 ,  G06V10/88

CPC classification number: G06V10/993 ,  G06T7/0014 ,  G06V10/25 ,  G06V10/88 ,  G06T2207/10061

Abstract: The purpose of the present invention is to provide an inspection device that can determine the reliability of an image feature value in a target region of an observation image of a sample. This inspection device extracts a first feature value from a target region including an inspection target in an observation image of a sample, extracts a second feature value from a reference region other than the target region in the observation image, and compares the first feature value and the second feature value, thereby calculating the reliability of the first feature value (see FIG. 1).

公开(公告)号：US20180025888A1

公开(公告)日：2018-01-25

申请号：US15548531

申请日：2015-02-09

Applicant: Hitachi, Ltd.

Inventor： Hiroyasu SHICHI ,  Masaki HASEGAWA ,  Teruo KOHASHI ,  Shinichi MATSUBARA

IPC: H01J37/29 ,  H01J37/22 ,  H01J37/08 ,  H01J37/26

CPC classification number: H01J37/29 ,  H01J37/08 ,  H01J37/22 ,  H01J37/265 ,  H01J37/28 ,  H01J37/317

Abstract: To provide a device particularly including an imaging-type or a projection-type ion detection system, not a scanning type such as in a scanning ion microscope, and capable of performing observation or inspection at high speed with an ultrahigh resolution in a sample observation device using an ion beam. To further provide a device capable of performing observation after surface cleaning, which has been difficult in an electron beam device, or a device capable of observing structures and defects in a depth direction. The device includes a gas field ion source that generates an ion beam, an irradiation optical system that irradiates a sample with the generated ion beam, a potential controller that controls an accelerating voltage of the ion beam and a positive potential to be applied to the sample and an ion detection unit that images or projects ions reflected from the sample as a microscope image, in which the potential controller includes a storage unit storing a first positive potential allowing the ion beam to collide with the sample and a second positive potential for reflecting the ion beam before allowing the ion beam to collide with the sample. Then, the potential controller includes a sputter controller for removing part of a sample surface by setting the first positive potential and an image acquisition controller for obtaining a microscope image by setting the second positive potential.