Abstract:
This disclosure is directed to techniques for fabricating CMOS devices for SRAM cells with resistors formed along transistor well sidewall edges by self-aligned, angled implantation, which may enable more compact SRAM architecture with SEU mitigation, such as for space-based or other radiation-hardened applications. An example method includes implanting a dopant into a doped semiconductor well covered by a barrier, wherein the doped semiconductor well is disposed on a buried insulator and wherein the dopant is of opposite doping type to the doped semiconductor well, thereby forming a resistor on an edge of the doped semiconductor well, wherein the resistor has the opposite doping type. The method further includes forming a second insulator adjacent to the resistor, removing the barrier, and forming agate layer on the doped semiconductor well, thereby forming a gate adjacent to the doped semiconductor well and the resistor.
Abstract:
Embodiments described herein provide for a pH sensor that is configured for use over a pressure and temperature range. The ISFET die of the pH sensor is bonded to the substrate of the pH sensor with a bonding layer that is disposed between the substrate and the ISFET die. The pressure and temperature change across the pressure and temperature range generates an environmental force in the pH sensor. Further, the substrate or the bonding layer or both change volume over the pressure and temperature range, and the substrate or the bonding layer or both are configured such that the volume change induces a counteracting force that opposes at least a portion of the environmental force. The counteracting force is configured to maintain the change in piezoresistance of the ISFET die from the drain to the source to less than 0.5% over the pressure and temperature range.
Abstract:
Embodiments described herein provide for a pH sensor that is configured for use over a pressure and temperature range. The ISFET die of the pH sensor is bonded to the substrate of the pH sensor with a bonding layer that is disposed between the substrate and the ISFET die. The pressure and temperature change across the pressure and temperature range generates an environmental force in the pH sensor. Further, the substrate or the bonding layer or both change volume over the pressure and temperature range, and the substrate or the bonding layer or both are configured such that the volume change induces a counteracting force that opposes at least a portion of the environmental force. The counteracting force is configured to maintain the change in piezoresistance of the ISFET die from the drain to the source to less than 0.5% over the pressure and temperature range.
Abstract:
Embodiments described herein provide for a pH sensor that comprises a substrate and an ion sensitive field effect transistor (ISFET) die. The ISFET die includes an ion sensing part that is configured to be exposed to a medium such that it outputs a signal related to the pH level of the medium. The ISFET die is bonded to the substrate with at least one composition of bonding agent material disposed between the ISFET die and the substrate. One or more strips of the at least one composition of bonding agent material is disposed between the substrate and the ISFET die in a first pattern.
Abstract:
Embodiments described herein provide for a pH sensor that comprises a substrate and an ion sensitive field effect transistor (ISFET) die. The ISFET die includes an ion sensing part that is configured to be exposed to a medium such that it outputs a signal related to the pH level of the medium. The ISFET die is bonded to the substrate with at least one composition of bonding agent material disposed between the ISFET die and the substrate. One or more strips of the at least one composition of bonding agent material is disposed between the substrate and the ISFET die in a first pattern.
Abstract:
A device having a first oscillator circuit configured to generate a first signal with a first frequency based on an analog input and external characteristics, and a second oscillator circuit configured to generate a second signal with a second frequency based on a constant voltage and the external characteristics. The device also having one or more discrete logic gates configured to generate a digital composite signal based on the first signal and the second signal, such that a number of transitions in the digital composite signal over a period of time, based on the first frequency of the first signal, are indicative of the analog input.
Abstract:
A device having a first oscillator circuit configured to generate a first signal with a first frequency based on an analog input and external characteristics, and a second oscillator circuit configured to generate a second signal with a second frequency based on a constant voltage and the external characteristics. The device also having one or more discrete logic gates configured to generate a digital composite signal based on the first signal and the second signal, such that a number of transitions in the digital composite signal over a period of time, based on the first frequency of the first signal, are indicative of the analog input.
Abstract:
This disclosure is directed to devices, integrated circuits, systems, and methods for implementing an internal body tie bias circuit in a CMOS logic circuit. In one example, a CMOS logic circuit is formed in an integrated circuit. The CMOS logic circuit includes a PMOS transistor, an NMOS transistor; and a body tie bias circuit formed in the integrated circuit. The body tie bias circuit is coupled between a body tie connection terminal of the PMOS transistor and a body tie connection terminal of the NMOS transistor.
Abstract:
In some examples, a programmable electrical fuse includes at least one structural feature that increases a thermal gradient between an anode and a cathode of the programmable electrical fuse. For example, a device may include a semiconductor substrate, an electrically insulating layer overlying the semiconductor substrate, and a programmable electrical fuse overlying a portion of the electrically insulating layer. The programmable electrical fuse may include a cathode, an anode, and a conductor link connecting the cathode and the anode. The electrically insulating layer may define a first thickness between the semiconductor substrate and the cathode and a second thickness between the semiconductor substrate and the anode, and the first thickness being less than the second thickness.
Abstract:
A stabilized integrated optical circuit is presented. The stabilized integrated optical circuit includes at least one integrated optical chip formed from at least one inorganic material, a stabilizing-polarizable-fill gas, and an enclosure enclosing the at least one integrated optical chip and the stabilizing-polarizable-fill gas. At least one surface of the at least one integrated optical chip is modified by a treatment with at least one treatment gas selected to stabilize defects on the at least one surface. The stabilizing-polarizable-fill gas includes N2O and at least one polarizable material.