System of electron irradiation
    1.
    发明授权

    公开(公告)号:US11483919B2

    公开(公告)日:2022-10-25

    申请号:US16667909

    申请日:2019-10-30

    Abstract: A system of electron irradiation includes an electron accelerator and an electron beam focusing device. The electron accelerator emits and accelerates a beam of electrons. The electron beam focusing device is located at a rear end of the electron irradiation and includes a beam restraining rail and 2n+1 sets of magnetic poles. The beam restraining rail forms a beam restraining channel through which the beam of electrons are to pass. The 2n+1 sets of magnetic poles are installed on the beam restraining rail and distributed at different locations of the beam restraining channel. An nth set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a first direction. An (n+1)th set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a second direction. The second direction is perpendicular to the first direction. The n is a positive integer.

    Device and method for optimizing diffusion section of electron beam

    公开(公告)号:US09767985B2

    公开(公告)日:2017-09-19

    申请号:US14895708

    申请日:2014-10-17

    Abstract: Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window.

    FREE-FORM CURVED SURFACE SLICING METHOD AND DEVICE BASED ON IMPLICIT MODEL

    公开(公告)号:US20250014284A1

    公开(公告)日:2025-01-09

    申请号:US18740495

    申请日:2024-06-11

    Abstract: Disclosed are free-form curved surface slicing method and device based on implicit model, includes following: (1) Using mesh model of layered curved surface to intersect with implicit model of a part to be manufactured to obtain contour lines; (2) Comparing rules for intersecting contour lines and meshes within mesh, mesh coordinates are substituted into implicit model, obtaining a position of an intersection point of contour lines in corresponding mesh; (3) Using interpolation method to calculate intersection coordinates of contour lines and mesh boundary, specifying storing sequence of interpolation points, storing intersection points of discrete line segments in mesh; (4) Merging unordered point sets obtained to establish topological relationship between point sets and discrete line segments, each line segment corresponds to two endpoints, each endpoint corresponds to two line segments, based on above, all points traversed will be connected into complete and ordered profile, that is sliced profile.

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