公开(公告)号：US20230230798A1

公开(公告)日：2023-07-20

申请号：US18007588

申请日：2020-06-08

Applicant: Hitachi High-Tech Corporation

Inventor： Keisuke IGARASHI ,  Wei Chean TAN ,  Mai YOSHIHARA ,  Hiroyuki CHIBA

IPC: H01J37/21 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/21 ,  H01J37/20 ,  H01J37/222

Abstract: A technique that enables automatic focus adjustment even for a sample having regions with different heights is proposed. A charged particle beam device according to the disclosure includes: a sample holder configured to hold a sample; a sample stage configured to move the sample; a charged particle gun and a charged particle beam column configured to irradiate the sample with a charged particle beam; an objective lens configured to perform focus adjustment by changing an intensity of a focusing effect on the charged particle beam; a detector configured to detect electrons from the sample and output a signal forming an electron image; an optical imaging device configured to capture an optical image of the sample; and a control device configured to calculate height information of the sample based on the optical image obtained by imaging the sample by the optical imaging device, and automatically set a focus adjustment value of an observation site based on the height information (see FIG. 5).

公开(公告)号：US20220244201A1

公开(公告)日：2022-08-04

申请号：US17594658

申请日：2019-04-26

Applicant: Hitachi High-Tech Corporation

Inventor： Toshie YAGUCHI ,  Keiji TAMURA ,  Hiromi MISE ,  Yasuyuki NODERA ,  Akiko WAKUI ,  Keisuke IGARASHI

IPC: G01N23/2251 ,  H01J37/26 ,  H01J37/28 ,  H01J37/04

Abstract: Provided is a transmission electron microscope capable of obtaining a hollow-cone dark-field image and visually displaying irradiation conditions thereof. The transmission electron microscope is provided with an irradiation unit for irradiating a specimen with an electron beam, an objective lens for causing the electron beam transmitted through the specimen to form an image, beam deflectors for deflecting the electron beam, said beam deflectors being positioned higher than a position where the specimen is to be placed, an objective movable aperture for passing only a portion of the electron beam transmitted through the specimen, and a deflection coil control unit. The deflection coil control unit controls a deflection angle of the electron beam using the beam deflectors such that the specimen is irradiated with the electron beam at a predetermined angle with respect to an optical axis while the electron beam is moving in a precessional manner and such that only a diffracted wave and/or a scattered wave having a desired angle among diffracted waves and/or scattered waves generated when the electron beam is transmitted through the specimen passes through the objective movable aperture.