公开(公告)号：US20240177964A1

公开(公告)日：2024-05-30

申请号：US18283499

申请日：2021-03-26

Applicant: Hitachi High-Tech Corporation

Inventor： Heita KIMIZUKA ,  Natsuki TSUNO ,  Yasuhiro SHIRASAKI ,  Minami UCHIHO

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/228 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/2809

Abstract: An object of the present disclosure is to provide a charged particle beam system capable of obtaining information about a sample by using a feature amount on an observed image caused by light interference, light diffraction, light standing waves, and the like caused by irradiating a sample with light, and the like. In the charged particle beam system according to the present disclosure, a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample, and a second feature amount of the sample is obtained by using the first feature amount (see FIG. 6).

公开(公告)号：US20250046569A1

公开(公告)日：2025-02-06

申请号：US18722800

申请日：2022-01-28

Applicant: Hitachi High-Tech Corporation

Inventor： Yasuhiro SHIRASAKI ,  Minami UCHIHO ,  Kazufumi YACHI

IPC: H01J37/22 ,  G01N23/225 ,  H01J37/10

Abstract: Film quality of a deposited semiconductor film, insulating film, or the like is inspected in a non-contact manner. An inspection device 1 for inspecting film quality of a film formed on a sample 16 includes a charged particle source 12 configured to irradiate the sample with a charged particle beam 13, a first light source 21 configured to irradiate the sample with first light 26, a photodetection system configured to detect signal light 28 generated when the sample is irradiated with the first light, a charge control electrode 17 configured to control an electric field on the sample or a second light source 22 configured to irradiate the sample with second light 27, a control device 30 configured to modulate an electronic state of the sample using the charged particle source and the charge control electrode or the second light source, and a computer 31 configured to estimate the film quality of the film formed on the sample based on a detection signal of the signal light modulated according to the modulated electronic state of the sample, the detection signal being output from the photodetection system.