公开(公告)号：US20220270844A1

公开(公告)日：2022-08-25

申请号：US17576156

申请日：2022-01-14

Applicant: Hitachi High-Tech Corporation

Inventor： Masanori MITA ,  Yoshinobu OOTAKA ,  Hideto DOHI ,  Zhaohui CHENG

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/147

Abstract: An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.

公开(公告)号：US20230113759A1

公开(公告)日：2023-04-13

申请号：US17914488

申请日：2020-05-13

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Shingo HAYASHI ,  Hideyuki KAZUMI ,  Zhaohui CHENG ,  Hideto DOHI

IPC: H01J37/141 ,  H01J37/28 ,  H01J37/153

Abstract: The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device according to the present invention generates an excitation current of a magnetic field lens by combining a direct current with an alternating current (see FIG. 6A).

公开(公告)号：US20220415605A1

公开(公告)日：2022-12-29

申请号：US17778526

申请日：2019-11-21

Applicant: Hitachi High-Tech Corporation

Inventor： Shingo HAYASHI ,  Hideto DOHI ,  Zhaohui CHENG ,  Hideyuki KAZUMI

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/28

Abstract: A charged particle optical system includes an aberration corrector 209 that corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged particle beam. In order to reduce the influence of a parasitic field due to distortion of the multipole, for a first multipole field to be generated in a multipole of any stage among the plurality of stages, a value of a predetermined correction voltage or correction current to be applied to a plurality of poles for generating the first multipole field is corrected so as to eliminate movement of an observation image obtained based on electrons detected from a detector 215 by irradiating a sample with the charged particle beam before and after the first multipole field is generated.

公开(公告)号：US20240144560A1

公开(公告)日：2024-05-02

申请号：US18279921

申请日：2022-03-03

Applicant: Hitachi High-Tech Corporation

Inventor： Zhaohui CHENG ,  Yasutaka TOYODA ,  Hideto DOHI ,  Hiroya OHTA ,  Hideyuki KAZUMI

IPC: G06T11/60 ,  G06T5/80 ,  G06T7/13

CPC classification number: G06T11/60 ,  G06T5/80 ,  G06T7/13 ,  G06T2207/20081

Abstract: A training method that performs learning using appropriate low-quality image and high-quality image is provided. The invention is directed to a training method including executing learning by inputting a first image generated under a first image generation condition and a second image generated under a second image generation condition different from the first image generation condition to a learning apparatus that adjusts parameters so as to suppress an error between an input image and a converted image, in which the second image is selected such that an index value extracted from the second image is the same as or has a predetermined relationship with an index value extracted from the first image, or the second image is output from a second image generation tool different from a first image generation tool for generating the first image.