公开(公告)号：US20240363306A1

公开(公告)日：2024-10-31

申请号：US18771126

申请日：2024-07-12

Applicant: Hitachi High-Tech Corporation

Inventor： Minami SHOUJI ,  Natsuki TSUNO ,  Hiroya OHTA ,  Daisuke BIZEN ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/226 ,  H01J37/244

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of acquiring an observation image having a high contrast in a sample whose light absorption characteristic depends on a light wavelength. The charged particle beam apparatus according to the invention irradiates the sample with light, generates an observation image of the sample, changes an irradiation intensity per unit time of the light, and then generates a plurality of the observation images having different contrasts.

公开(公告)号：US20250060678A1

公开(公告)日：2025-02-20

申请号：US18937471

申请日：2024-11-05

Applicant: Hitachi High-Tech Corporation

Inventor： Takuma YAMAMOTO ,  Hiroya OHTA ,  Kenji TANIMOTO ,  Yusuke ABE ,  Tomohiro TAMORI ,  Masaaki NOJIRI

IPC: G03F7/00 ,  G01B15/04 ,  G01N23/225 ,  G03F7/20

Abstract: A computation device is provided for measuring the dimensions of patterns formed on a sample based on a signal obtained from a charged particle beam device. The computation device includes a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights based on an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.

公开(公告)号：US20230274909A1

公开(公告)日：2023-08-31

申请号：US18019347

申请日：2020-09-28

Applicant: Hitachi High-Tech Corporation

Inventor： Minami SHOUJI ,  Yasuhiro SHIRASAKI ,  Natsuki TSUNO ,  Hirohiko KITSUKI ,  Hiroya OHTA

IPC: H01J37/28 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/226

Abstract: An object of the invention is to obtain an observation image in which a plurality of pieces of feature data of a sample are emphasized in a charged particle beam device that acquires an observation image of the sample by irradiating the sample with a charged particle beam and light. The charged particle beam device according to the invention calculates a sequence for modulating a light irradiation condition according to an irradiation condition of a charged particle beam, and controls the light irradiation condition according to the sequence (see FIG. 2).

公开(公告)号：US20230170182A1

公开(公告)日：2023-06-01

申请号：US17921737

申请日：2020-04-28

Applicant: Hitachi High-Tech Corporation

Inventor： Kazufumi YACHI ,  Muneyuki FUKUDA ,  Ichiro TACHIBANA ,  Hiroya OHTA

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/145

CPC classification number: H01J37/28 ,  H01J37/145 ,  H01J37/244 ,  H01J2237/057 ,  H01J2237/2806

Abstract: Proposed is a charged particle beam apparatus for the purpose of detecting a charged particle emitted from a sample in a specific direction by discriminating between the charged particle and a charged particle emitted in another direction. As one aspect of achieving the above purpose, proposed is a charged particle beam apparatus including an objective lens configured to focus a beam emitted from a charged particle source, a detector (8) configured to detect at least one of a first charged particle (23) emitted from a sample by irradiating the sample with the beam and a second charged particle emitted from a charged particle collided member by causing the first charged particle to collide with the charged particle collision member disposed on a trajectory of the first charged particle, and an electrostatic lens (12) including a plurality of electrodes disposed between the objective lens and the detector, in which the electrostatic lens is a Butler type.

公开(公告)号：US20220216032A1

公开(公告)日：2022-07-07

申请号：US17610908

申请日：2019-05-21

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Minami SHOUJI ,  Natsuki TSUNO ,  Hiroya OHTA ,  Daisuke BIZEN ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of acquiring an observation image having a high contrast in a sample whose light absorption characteristic depends on a light wavelength. The charged particle beam apparatus according to the invention irradiates the sample with light, generates an observation image of the sample, changes an irradiation intensity per unit time of the light, and then generates a plurality of the observation images having different contrasts (see FIG. 4).

公开(公告)号：US20240144560A1

公开(公告)日：2024-05-02

申请号：US18279921

申请日：2022-03-03

Applicant: Hitachi High-Tech Corporation

Inventor： Zhaohui CHENG ,  Yasutaka TOYODA ,  Hideto DOHI ,  Hiroya OHTA ,  Hideyuki KAZUMI

IPC: G06T11/60 ,  G06T5/80 ,  G06T7/13

CPC classification number: G06T11/60 ,  G06T5/80 ,  G06T7/13 ,  G06T2207/20081

Abstract: A training method that performs learning using appropriate low-quality image and high-quality image is provided. The invention is directed to a training method including executing learning by inputting a first image generated under a first image generation condition and a second image generated under a second image generation condition different from the first image generation condition to a learning apparatus that adjusts parameters so as to suppress an error between an input image and a converted image, in which the second image is selected such that an index value extracted from the second image is the same as or has a predetermined relationship with an index value extracted from the first image, or the second image is output from a second image generation tool different from a first image generation tool for generating the first image.