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    MASKING SUBSTRATES FOR APPLICATION OF PROTECTIVE COATINGS
    4.
    发明申请
    MASKING SUBSTRATES FOR APPLICATION OF PROTECTIVE COATINGS 审中-公开
    用于保护涂层的掩模基材

    公开(公告)号：US20140192464A1

    公开(公告)日：2014-07-10

    申请号：US14157684

    申请日：2014-01-17

    Applicant: HzO, Inc.

    Inventor： David James Astle ,  Tyler Christensen Child ,  Vimal Kumar Kasagani ,  Cameron LaMar Loose ,  Blake LeRoy Stevens ,  Max Ernest Sorenson

    IPC: H01L21/64 ,  H05K7/02 ,  H01L21/67

    CPC classification number: B05D1/322 ,  C09J9/00 ,  C09J2201/61 ,  H01L21/56 ,  H01L21/561 ,  H01L21/67011 ,  H01L21/6715 ,  H01L23/3121 ,  H01L2924/0002 ,  H05K1/181 ,  H05K3/0073 ,  H05K3/0079 ,  H05K3/284 ,  H05K2201/0145 ,  H05K2201/09872 ,  H01L2924/00

    Abstract: A method for applying a protective coating to selected portions of a substrate is disclosed. The method includes applying a mask to or forming a mask on at least one portion of the substrate that is not to be covered with the protective coating. The mask may be selectively formed by applying a flowable material to the substrate. Alternatively, the mask may be formed from a preformed film. With the mask in place, the protective coating may be applied to the substrate and the mask. A portion of the protective coating that overlies the mask may be delineated from other portions of the protective coating; for example, by cutting, weakening or removing material from the protective coating at locations at or adjacent to the perimeter of the mask. The portion of the protective coating that overlies the mask, and the mask, may then be removed from the substrate.

    Abstract translation: 公开了一种将保护涂层施加到衬底的选定部分的方法。 该方法包括在不被保护涂层覆盖的基底的至少一部分上施加掩模或形成掩模。 可以通过将可流动材料施加到基底来选择性地形成掩模。 或者，掩模可以由预成型膜形成。 在掩模就位的情况下，可以将保护涂层施加到基底和掩模上。 覆盖在掩模上的保护涂层的一部分可以从保护涂层的其它部分描绘出来; 例如，通过在掩模的周边或附近的位置处切割，削弱或从保护涂层去除材料。 然后可以将覆盖在掩模上的保护涂层和掩模的部分从基材上除去。

    MATERIALS FOR MASKING SUBSTRATES AND ASSOCIATED METHODS
    6.
    发明申请
    MATERIALS FOR MASKING SUBSTRATES AND ASSOCIATED METHODS 审中-公开
    用于掩蔽基材和相关方法的材料

    公开(公告)号：US20150375260A1

    公开(公告)日：2015-12-31

    申请号：US14842802

    申请日：2015-09-01

    Applicant: HZO, Inc.

    Inventor： David James Astle ,  Tyler Christensen Child ,  Vimal Kumar Kasagani ,  Cameron LaMar Loose ,  Blake LeRoy Stevens ,  Max Ernest Sorenson

    IPC: B05D1/32 ,  C09J9/00

    Abstract: A mask material is readily discernible from a substrate to which the mask material is applied. The mask material may have a discernible characteristic, such as its color, luminescence or the like, which may render it visibly distinct from the substrate or detectable using automated inspection equipment. The discernible characteristic of the mask material may render it detectable through a protective coating.

    Abstract translation: 从施加掩模材料的基材容易地辨别出掩模材料。 掩模材料可以具有可辨别的特性，例如其颜色，发光等，其可使其与基底明显不同或使用自动检查设备可检测。 掩模材料的明显特征可以使其通过保护涂层检测。

    MASKING SUBSTRATES FOR APPLICATION OF PROTECTIVE COATINGS
    7.
    发明申请
    MASKING SUBSTRATES FOR APPLICATION OF PROTECTIVE COATINGS 审中-公开
    用于保护涂层的掩模基材

    公开(公告)号：US20150092370A1

    公开(公告)日：2015-04-02

    申请号：US14566043

    申请日：2014-12-10

    Applicant: HZO, Inc.

    Inventor： David James Astle ,  Tyler Christensen Child ,  Vimal Kumar Kasagani ,  Cameron LaMar Loose ,  Blake LeRoy Stevens ,  Max Ernest Sorenson

    IPC: H05K1/18 ,  H01L21/67

    CPC classification number: B05D1/322 ,  C09J9/00 ,  C09J2201/61 ,  H01L21/56 ,  H01L21/561 ,  H01L21/67011 ,  H01L21/6715 ,  H01L23/3121 ,  H01L2924/0002 ,  H05K1/181 ,  H05K3/0073 ,  H05K3/0079 ,  H05K3/284 ,  H05K2201/0145 ,  H05K2201/09872 ,  H01L2924/00

    Abstract: A method for applying a protective coating to selected portions of a substrate is disclosed. The method includes applying a mask to or forming a mask on at least one portion of the substrate that is not to be covered with the protective coating. The mask may be selectively formed by applying a flowable material to the substrate. Alternatively, the mask may be formed from a preformed film. With the mask in place, the protective coating may be applied to the substrate and the mask. A portion of the protective coating that overlies the mask may be delineated from other portions of the protective coating; for example, by cutting, weakening or removing material from the protective coating at locations at or adjacent to the perimeter of the mask. The portion of the protective coating that overlies the mask, and the mask, may then be removed from the substrate.

    Abstract translation: 公开了一种将保护涂层施加到衬底的选定部分的方法。 该方法包括在不被保护涂层覆盖的基底的至少一部分上施加掩模或形成掩模。 可以通过将可流动材料施加到基底来选择性地形成掩模。 或者，掩模可以由预成型膜形成。 在掩模就位的情况下，可以将保护涂层施加到基底和掩模上。 覆盖在掩模上的保护涂层的一部分可以从保护涂层的其它部分描绘出来; 例如，通过在掩模的周边或附近的位置处切割，削弱或从保护涂层去除材料。 然后可以将覆盖在掩模上的保护涂层和掩模的部分从基材上除去。

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