SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
    3.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE 审中-公开
    半导体器件及制造半导体器件的方法

    公开(公告)号:US20140167043A1

    公开(公告)日:2014-06-19

    申请号:US13719599

    申请日:2012-12-19

    Abstract: A semiconductor device includes a semiconductor substrate including a main surface with a polygonal geometry and a main electric circuit manufactured within a main region on the semiconductor substrate. The main electric circuit is operable to perform an electric main function. The main region extends over the main surface of the semiconductor substrate leaving open at least one corner area at a corner of the polygonal geometry of the main surface of the semiconductor substrate. The corner area extends at least 300 μm along the edges of the semiconductor substrate beginning at the corner.

    Abstract translation: 半导体器件包括半导体衬底,该半导体衬底包括具有多边形几何形状的主表面和在半导体衬底上的主区域内制造的主电路。 主电路可操作以执行电主功能。 主区域在半导体衬底的主表面上延伸,在半导体衬底的主表面的多边形几何形状的拐角处打开至少一个拐角区域。 拐角区域从角部开始沿着半导体衬底的边缘延伸至少300μm。

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