公开(公告)号：US20240063120A1

公开(公告)日：2024-02-22

申请号：US17820961

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Shawna M. Liff ,  Debendra Mallik ,  Christopher M. Pelto ,  Kimin Jun ,  Johanna M. Swan ,  Lei Jiang ,  Feras Eid ,  Krishna Vasanth Valavala ,  Henning Braunisch ,  Patrick Morrow ,  William J. Lambert

IPC: H01L23/528 ,  H01L23/00 ,  H01L25/065 ,  H01L23/48 ,  H01L23/498 ,  H01L23/522 ,  H01L21/48

CPC classification number: H01L23/5286 ,  H01L24/08 ,  H01L24/05 ,  H01L24/16 ,  H01L25/0652 ,  H01L23/481 ,  H01L23/49811 ,  H01L23/49822 ,  H01L23/49833 ,  H01L23/49838 ,  H01L23/5283 ,  H01L23/5226 ,  H01L24/80 ,  H01L21/4853 ,  H01L21/4857 ,  H01L2924/37001 ,  H01L2924/3841 ,  H01L2924/3512 ,  H01L2224/80895 ,  H01L2224/80896 ,  H01L2224/05647 ,  H01L2224/05687 ,  H01L2224/08121 ,  H01L2224/08145 ,  H01L2224/08225 ,  H01L2224/16225

Abstract: Embodiments of a microelectronic assembly comprise: a plurality of layers of integrated circuit (IC) dies, each layer coupled to adjacent layers by first interconnects having a pitch of less than 10 micrometers between adjacent first interconnects; an end layer in the plurality of layers proximate to a first side of the plurality of layers comprises a dielectric material around IC dies in the end layer and a through-dielectric via (TDV) in the dielectric material of the end layer; a support structure coupled to the first side of the plurality of layers, the support structure comprising a structurally stiff base with conductive traces proximate to the end layer, the conductive traces coupled to the end layer by second interconnects; and a package substrate coupled to a second side of the plurality of layers, the second side being opposite to the first side.

公开(公告)号：US20220415807A1

公开(公告)日：2022-12-29

申请号：US17358971

申请日：2021-06-25

Applicant: Intel Corporation

Inventor： Chytra Pawashe ,  Lei Jiang ,  Colin Landon ,  Daniel Pantuso ,  Edwin Ramayya ,  Jeffrey Hicks ,  Mehmet Koker Aykol

IPC: H01L23/538 ,  H01L23/36

Abstract: A device structure includes a first interconnect layer, a second interconnect layer, a device layer including a comprising a plurality of devices, where the device layer is between the first interconnect layer and the second interconnect layer. The device structure further includes a dielectric layer adjacent the second interconnect layer, where the dielectric layer includes one or more of metallic dopants or a plurality of metal structures, wherein the plurality of metal structures is electrically isolated from interconnect structures but in contact with a dielectric material of the second interconnect layer, and where the individual ones of the plurality of metal structures is above a region including at least some of the plurality of devices. The device structure further includes a substrate adjacent to the dielectric layer and a heat sink coupled with the substrate.

公开(公告)号：US10333379B2

公开(公告)日：2019-06-25

申请号：US15382076

申请日：2016-12-16

Applicant: Intel Corporation

Inventor： Suphachai Chai Sutanthavibul ,  Iqbal Rajwani ,  Anupama A Thaploo ,  Surya Sasi Kiran Tallapragada ,  Daivik H Bhatt ,  Lei Jiang ,  Stephen Kim ,  Pascal A. Meinerzhagen ,  Muhammad M. Khellah

IPC: H02M1/08 ,  H03K17/0812 ,  H03K17/687 ,  H02M3/158 ,  H02M1/088 ,  H03K19/00 ,  H02M1/00 ,  H03K17/08

Abstract: Some embodiments include apparatuses and methods using the apparatuses. One of the apparatuses includes a first power supply node, a second power supply node, transistors coupled in parallel between the first and second power supply nodes, and a controller to provide a first voltage, a second voltage, and a third voltage to gates of the transistors based on digital information. The first, second, and third voltages have different values based on values of the digital information.

公开(公告)号：US20240370615A1

公开(公告)日：2024-11-07

申请号：US18345972

申请日：2023-06-30

Applicant: Intel Corporation

Inventor： Lei Jiang ,  Daniel Pantuso ,  Satish Sethuraman ,  Kambiz Komeyli ,  Jeffrey Hicks

IPC: G06F30/327

Abstract: Systems, apparatus, articles of manufacture, and methods are disclosed An apparatus comprising: programmable circuitry; interface circuitry; and instructions to program the programmable circuitry to: map one or more circuit layouts to a hardware description language model of a circuit to generate a power density map for the circuit; estimate a temperature gradient between a first area of the circuit and a second area of the circuit based on the power density map; identify the first area as a hotspot based on the temperature gradient exceeding a threshold value; and compensate for a predicted timing change due to the temperature gradient.

公开(公告)号：US20240063091A1

公开(公告)日：2024-02-22

申请号：US17891735

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Feras Eid ,  Scot Kellar ,  Yoshihiro Tomita ,  Rajiv Mongia ,  Kimin Jun ,  Shawna Liff ,  Wenhao Li ,  Johanna Swan ,  Bhaskar Jyoti Krishnatreya ,  Debendra Mallik ,  Krishna Vasanth Valavala ,  Lei Jiang ,  Xavier Brun ,  Mohammad Enamul Kabir ,  Haris Khan Niazi ,  Jiraporn Seangatith ,  Thomas Sounart

IPC: H01L23/473 ,  H01L23/00 ,  H01L25/065 ,  H01L23/367 ,  H01L23/373

CPC classification number: H01L23/473 ,  H01L24/08 ,  H01L25/0652 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L23/3677 ,  H01L23/3675 ,  H01L23/3732 ,  H01L23/3738 ,  H01L2924/3511 ,  H01L2224/08145 ,  H01L2224/08121 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2924/182 ,  H01L2924/186

Abstract: Microelectronic devices, assemblies, and systems include a multichip composite device having one or more chiplets bonded to a base die and an inorganic dielectric material adjacent the chiplets and over the base die. The multichip composite device is coupled to a structural member that is made of or includes a heat conducting material, or has integrated fluidic cooling channels to conduct heat from the chiplets and the base die.

公开(公告)号：US10825752B2

公开(公告)日：2020-11-03

申请号：US14775487

申请日：2013-06-18

Applicant: Intel Corporation

Inventor： Lei Jiang ,  Edwin B. Ramayya ,  Daniel Pantuso ,  Rafael Rios ,  Kelin J. Kuhn ,  Seiyon Kim

IPC: H01L23/38 ,  H01L21/8238 ,  H01L27/092 ,  H05K1/18

Abstract: Embodiments of the present disclosure describe techniques and configurations for integrated thermoelectric cooling. In one embodiment, a cooling assembly includes a semiconductor substrate, first circuitry disposed on the semiconductor substrate and configured to generate heat when in operation and second circuitry disposed on the semiconductor substrate and configured to remove the heat by thermoelectric cooling. Other embodiments may be described and/or claimed.

公开(公告)号：US20240063089A1

公开(公告)日：2024-02-22

申请号：US17891738

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Wenhao Li ,  Bhaskar Jyoti Krishnatreya ,  Debendra Mallik ,  Krishna Vasanth Valavala ,  Lei Jiang ,  Yoshihiro Tomita ,  Omkar Karhade ,  Haris Khan Niazi ,  Tushar Talukdar ,  Mohammad Enamul Kabir ,  Xavier Brun ,  Feras Eid

IPC: H01L23/46

CPC classification number: H01L23/46 ,  G02B6/4268

Abstract: Microelectronic devices, assemblies, and systems include a multichip composite device having one or more integrated circuit dies bonded to a base die and an inorganic dielectric material adjacent the integrated circuit dies and over the base die. The multichip composite device includes a dummy die, dummy vias, or integrated fluidic cooling channels laterally adjacent the integrated circuit dies to conduct heat from the base die.