Nano-sized Bagasse Fiber
    2.
    发明申请
    Nano-sized Bagasse Fiber 审中-公开
    纳米级甘蔗渣纤维

    公开(公告)号:US20080227753A1

    公开(公告)日:2008-09-18

    申请号:US12037436

    申请日:2008-02-26

    Abstract: A new composition of nanosized bagasse fibers has been made by a method which reduces the sugarcane bagasse fibers to nano-sized particles while retaining the natural components of the bagasse. The resulting bagasse particles were shown to be effective as a nutritional supplement in a mouse model to aid in glucose control and body weight. Using the bagasse nanofibers, the addition of 5 to 10% fiber did not change the color or texture of food products. Moreover, the bagasse powder has a natural color and absorbs color evenly so that it could be used as a natural foundation material for cosmetic products.

    Abstract translation: 已经通过将甘蔗渣渣纤维还原成纳米尺寸颗粒同时保留甘蔗渣的天然成分的方法制备了纳米级甘蔗渣纤维的新组合物。 所显示的甘蔗渣颗粒在小鼠模型中作为营养补充剂是有效的,以帮助葡萄糖控制和体重。 使用蔗渣纳米纤维时,加入5〜10%的纤维不会改变食品的颜色或质感。 此外,甘蔗渣粉末具有天然的颜色,并且均匀地吸收颜色,使其可以用作化妆品的天然粉底料。

    Nano-sized Bagasse Fiber
    3.
    发明申请
    Nano-sized Bagasse Fiber 审中-公开
    纳米级甘蔗渣纤维

    公开(公告)号:US20150299954A1

    公开(公告)日:2015-10-22

    申请号:US14754881

    申请日:2015-06-30

    Abstract: A new composition of nanosized bagasse fibers has been made by a method which reduces the sugarcane bagasse fibers to nano-sized particles while retaining the natural components of the bagasse. The resulting bagasse particles were shown to be effective as a nutritional supplement in a mouse model to aid in glucose control and body weight. Using the bagasse nanofibers, the addition of 5 to 10% fiber did not change the color or texture of food products. Moreover, the bagasse powder has a natural color and absorbs color evenly so that it could be used as a natural foundation material for cosmetic products.

    Abstract translation: 已经通过将甘蔗渣渣纤维还原成纳米尺寸颗粒同时保留甘蔗渣的天然成分的方法制备了纳米级甘蔗渣纤维的新组合物。 所显示的甘蔗渣颗粒在小鼠模型中作为营养补充剂是有效的,以帮助葡萄糖控制和体重。 使用蔗渣纳米纤维时,加入5〜10%的纤维不会改变食品的颜色或质感。 此外,甘蔗渣粉末具有天然的颜色,并且均匀地吸收颜色,使其可以用作化妆品的天然粉底料。

    Post-exposure heat treatment to reduce surface roughness of PMMA surfaces formed by radiation lithography
    5.
    发明授权
    Post-exposure heat treatment to reduce surface roughness of PMMA surfaces formed by radiation lithography 失效
    曝光后热处理以减少通过辐射光刻形成的PMMA表面的表面粗糙度

    公开(公告)号:US06387578B1

    公开(公告)日:2002-05-14

    申请号:US09566261

    申请日:2000-05-05

    CPC classification number: G03F7/38 Y10S430/167 Y10S430/168

    Abstract: A method to decrease the surface roughness of exposed PMMA surfaces has been discovered. PMMA surface roughness was decreased by a post-exposure heat treatment of less than 70° C. The optimum post-exposure heat treatment to produce a PMMA microstructures with a smooth surface was found to be about 60° C. for about 30 min. The structural features of post-exposure heat-treated PMMA patterns were not statistically different from otherwise identical features of untreated PMMA patterns. This method produces a smoother PMMA structure that may then optionally be glued on a substrate or that may be assembled with other PMMA structures into a three-dimensional or multilayer microstructure.

    Abstract translation: 已经发现了降低暴露的PMMA表面的表面粗糙度的方法。 PMMA表面粗糙度通过低于70℃的曝光后热处理降低。发现用于产生具有光滑表面的PMMA微结构的最佳曝光后热处理约为60℃约30分钟。 后曝光热处理的PMMA图案的结构特征与未处理的PMMA图案的其他相同特征没有统计学差异。 该方法产生更平滑的PMMA结构,然后PMMA结构可以任选地胶合在基底上,或者可以与其它PMMA结构组装成三维或多层微结构。

Patent Agency Ranking