公开(公告)号：US20160312351A1

公开(公告)日：2016-10-27

申请号：US14697454

申请日：2015-04-27

Applicant: Lam Research Corporation

Inventor： Chin-Yi LIU ,  Russell ORMOND ,  Nash W. ANDERSON ,  David M. SCHAEFER

IPC: C23C4/134 ,  C23C4/06 ,  C23C4/11 ,  H01L21/66 ,  H01L21/67

CPC classification number: C23C4/134 ,  C23C4/06 ,  C23C4/11 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32972 ,  H01J37/3299 ,  H01L21/67069 ,  H01L21/67253 ,  H01L22/10

Abstract: In accordance with this disclosure, there are provided several inventions, including a substrate processing apparatus with multi-layer surfaces configured to face the plasma and resist against corrosion. These multi-layer surfaces may in one example include a base layer of aluminum, anodized aluminum, or quartz, a second layer of stabilized zirconia, and a second layer of a yttrium-aluminum composite such as yttrium aluminum garnet (YAG).

Abstract translation: 根据本公开，提供了若干发明，包括具有多层表面的基板处理装置，其被配置为面对等离子体并抵抗腐蚀。 这些多层表面可以在一个实例中包括铝的基底层，阳极氧化的铝或石英，第二层稳定的氧化锆，以及第二层钇 - 铝复合物如钇铝石榴石（YAG）。

公开(公告)号：US20180065274A1

公开(公告)日：2018-03-08

申请号：US15255854

申请日：2016-09-02

Applicant: Lam Research Corporation

Inventor： William CHARLES ,  Thomas STEVENSON ,  Nash ANDERSON ,  Russell ORMOND ,  Michael LOPEZ

IPC: B28B11/24 ,  C04B35/10 ,  C04B35/645

CPC classification number: B28B11/243 ,  B01J3/062 ,  B01J2219/0894 ,  C04B35/111 ,  C04B35/6455 ,  C04B2235/3217 ,  C04B2235/5436 ,  C04B2235/612 ,  C04B2235/656 ,  C04B2235/661 ,  C04B2235/667

Abstract: A method for forming a ceramic object from a ceramic powder is provided. The ceramic powder is placed in a press. Pressure is applied to the ceramic powder with a pressure to cause consolidation of the ceramic powder. Ultrasonic energy is applied to the ceramic powder for at least a period of time during the applying pressure to the ceramic powder, forming the ceramic powder into a ceramic object. The applying pressure to the ceramic powder is ended.

公开(公告)号：US20150337450A1

公开(公告)日：2015-11-26

申请号：US14817742

申请日：2015-08-04

Applicant: LAM RESEARCH CORPORATION

Inventor： Hong SHIH ,  Lin XU ,  John Michael KERNS ,  William CHARLES ,  John DAUGHERTY ,  Sivakami RAMANATHAN ,  Russell ORMOND ,  Robert G. O'NEILL ,  Tom STEVENSON

IPC: C25D11/02 ,  H01L21/67 ,  C23C28/00 ,  C23C24/00 ,  C25D11/16 ,  C25D11/12

CPC classification number: C25D11/026 ,  C23C16/4404 ,  C23C24/00 ,  C23C28/322 ,  C23C28/345 ,  C25D11/04 ,  C25D11/12 ,  C25D11/16 ,  H01L21/02274 ,  H01L21/3065 ,  H01L21/67017 ,  H01L21/67069 ,  H01L21/78 ,  Y10T428/12479 ,  Y10T428/12549 ,  Y10T428/1259

Abstract: A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.

Abstract translation: 在半导体加工设备的铝部件上形成致密氧化物涂层的方法包括在铝部件的表面上冷却一层纯铝至预定厚度。 然后使用等离子体电解氧化工艺在纯铝层上形成致密的氧化物涂层，其中等离子体电解氧化工艺使纯铝层发生微量放电，从而在纯铝层上形成致密的氧化物涂层 铝部件的表面。