Abstract:
Provided is a pressure-sensitive adhesive sheet for semiconductor processing having excellent solvent resistance. The pressure-sensitive adhesive sheet for semiconductor processing includes a pressure-sensitive adhesive layer formed of a pressure-sensitive adhesive composition containing a base polymer, and a base material. The pressure-sensitive adhesive composition has a swelling degree SA of 2.1 times or less when immersed in an N,N-dimethylpropionamide solution at 23° C. for 1 hour.
Abstract:
A photo-reactive composition layer is formed on a support with transparency while the support is moved in one direction. Then the support is reversed in a first irradiating chamber as to be moved in a direction opposite to the one direction to generate a serpentine transport path. The support prior to reverse and the support subsequent to reverse face to each other serpentinely, and the support is irradiated with light from lamps for ultraviolet-ray emission. The entire photo-reactive composition layer on the serpentine support is photo-polymerized while the light transmits through the support and the photo-reactive composition layer formed on the support. Then photo-polymerization reaction of the photo-reactive composition layer is facilitated in a second irradiating chamber, adjacent to the first irradiating chamber, using lamps for ultraviolet-ray emission different from those used in the first irradiating chamber in property.
Abstract:
An acrylic pressure-sensitive adhesive composition contains 100 parts by mass of an acrylic polymer (A), 1 to 70 parts by mass of a (meth)acrylic polymer (B) having a weight average molecular weight (Mw) of 1000≦Mw
Abstract:
Provided is a pressure-sensitive adhesive sheet for semiconductor processing having excellent followability to unevenness of an adherend, and an excellent anchoring property. The pressure-sensitive adhesive sheet for semiconductor processing includes a pressure-sensitive adhesive layer formed of an ultra-violet (UV)-curable pressure-sensitive adhesive, and a base material. The UV-curable pressure-sensitive adhesive contains a base polymer, a photopolymerization initiator, and a phosphoric acid ester-based surfactant.
Abstract:
Provided is a method for producing an pressure-sensitive adhesive sheet having an ultraviolet-ray curing-type acrylic pressure-sensitive adhesive layer that can undergo, about one or more monomers therefor, high rate-polymerization to be excellent in productivity, and is also excellent in balance between pressure-sensitive adhesive performances. The method includes: applying, onto a substrate, an ultraviolet-ray curing-type acrylic pressure-sensitive adhesive composition including a photopolymerization initiator, and a monomer-component set that is/includes an alkyl (meth)acrylate; and radiating ultraviolet rays to the composition, thereby curing the composition to form a pressure-sensitive adhesive layer. In the method, the irradiance of the rays radiated in the pressure-sensitive adhesive layer forming step is 25 mW/cm2 or more. When the radiation dose of the radiated ultraviolet rays is 600 mJ/cm2 and is 2400 mJ/cm2, the polymerization rate of the monomer-component set is 30% or less, and 70% or more, respectively.
Abstract translation:提供一种具有紫外线固化型丙烯酸类压敏粘合剂层的粘合片的制造方法,该粘合剂层可以经受大约一种或多种单体的高速聚合,生产率优异,并且也是 压敏粘合剂性能之间的平衡优异。 该方法包括:在基材上涂布含有光聚合引发剂的紫外线固化型丙烯酸类压敏粘合剂组合物和(甲基)丙烯酸烷基酯的单体组分组合物, 并将紫外线照射到组合物上,从而固化组合物以形成压敏粘合剂层。 在该方法中,在粘合剂层形成步骤中照射的射线的辐照度为25mW / cm 2以上。 当辐射紫外线的辐射剂量为600mJ / cm 2且为2400mJ / cm 2时,单体组分的聚合速率分别为30%以下,70%以上。
Abstract:
Provided is a pressure-sensitive adhesive sheet for processing a semiconductor element, which is capable of protecting a semiconductor element from electrostatic breakdown caused by peeling electrification and frictional electrification even under a high-humidity environment and/or under the application of a high voltage. The pressure-sensitive adhesive sheet includes a pressure-sensitive adhesive layer and a base material. A surface resistivity ρsBM of the base material and a surface resistivity ρsPA of the pressure-sensitive adhesive layer are each 1.0×1013Ω/□ or less. In one embodiment, a surface resistivity ρs10VBM of the base material at a time of application of 10 V and a surface resistivity ρs10VPA of the pressure-sensitive adhesive layer at a time of application of 10 V, and a surface resistivity ρs1000VBM 1,000 V and a surface resistivity ρs1000VPA 1,000 V satisfy the following expression (1) and expression (2).
Abstract:
Provided is a pressure-sensitive adhesive sheet capable of maintaining a desired pressure-sensitive adhesive characteristic even in a production method for a semiconductor including, for example, a step of peeling off a support material. The pressure-sensitive adhesive sheet includes a backing layer and a pressure-sensitive adhesive layer, in which the pressure-sensitive adhesive layer has a water contact angle of from 80° to 105°. The pressure-sensitive adhesive sheet is used in a production method for a semiconductor including a step in which the pressure-sensitive adhesive layer is brought into contact with a solvent having a solubility in water at 20° C. of 1 g/100 mL or less.
Abstract:
Provided is a method for producing a pressure-sensitive adhesive sheet having an ultraviolet-ray curing-type acrylic pressure-sensitive adhesive layer that has a high conversion per unit amount of light, is excellent in productivity, and is also excellent in balance between pressure-sensitive adhesive performances. The method includes: a pressure-sensitive adhesive layer forming step in which the composition is irradiated with and cured by ultraviolet rays to form a pressure-sensitive adhesive layer; wherein an ultraviolet lamp that radiates the ultraviolet rays in the pressure-sensitive adhesive layer forming step is an LED lamp; the ultraviolet rays are radiated intermittently; and the time of bright periods when the ultraviolet rays are radiated is from 1 second to 30 seconds, and the time of dark periods when the rays are not radiated is from 0.1 timed to 20 times the time of the bright periods.
Abstract:
The present invention relates to a method in which: a photoreactive composition layer is formed on a support while conveying the support in one direction, the support is turned around at least once so that the support before turnaround faces the support after turnaround by conveying the support in the direction opposite the foregoing one direction to make a conveying route of the support multistage traveling, and in the course of multistage traveling, the support is turned around while keeping contact with three or more conveying rollers at least during the first turnaround, and light is emitted toward the support from a light irradiator to cause photopolymerization of the photoreactive composition layer formed on the support.
Abstract:
An acrylic pressure-sensitive adhesive composition contains: an acrylic polymer (A); and a (meth)acrylic polymer (B) that includes, as a monomer unit, a (meth)acrylic monomer having a tricyclic or higher alicyclic structure and that has a weight average molecular weight of 1000 or more and less than 30000.