ILLUMINATION APPARATUS AND INSPECTION APPARATUS
    1.
    发明申请
    ILLUMINATION APPARATUS AND INSPECTION APPARATUS 有权
    照明装置和检查装置

    公开(公告)号:US20140300893A1

    公开(公告)日:2014-10-09

    申请号:US14228747

    申请日:2014-03-28

    Abstract: An illumination apparatus comprising, a light source that emits a laser beam, a lens array on which the laser beam is illuminated, a plurality of element lenses having a diameter greater than or equal to the laser beam are arranged in the lens array, the lens array being rotatable around an optical axis of the laser beam, wherein the two lens arrays are arrayed in an optical axis direction of the laser beam, andthe element lenses in each lens array are arranged such that a boundary between the element lenses adjacent to each other radiates from a rotation center of the lens array and a direction in which the element lens of one of the lens arrays traverses the optical axis of the laser beam is orthogonal to a direction in which the element lens of the other lens array traverses the optical axis of the laser beam.

    Abstract translation: 一种照明装置,包括发射激光的光源,激光束被照射的透镜阵列,具有大于或等于激光束直径的多个元件透镜布置在透镜阵列中,透镜 阵列可以围绕激光束的光轴旋转,其中两个透镜阵列沿激光束的光轴方向排列,并且每个透镜阵列中的元件透镜被布置成使得与每个透镜阵列相邻的元件透镜之间的边界 其他从透镜阵列的旋转中心辐射的方向和透镜阵列之一的元件透镜穿过激光束的光轴的方向与另一透镜阵列的元件透镜横穿光学的方向正交 激光束的轴线。

    FOCAL POSITION ADJUSTMENT METHOD AND INSPECTION METHOD
    2.
    发明申请
    FOCAL POSITION ADJUSTMENT METHOD AND INSPECTION METHOD 有权
    焦点位置调整方法和检查方法

    公开(公告)号:US20150204796A1

    公开(公告)日:2015-07-23

    申请号:US14566002

    申请日:2014-12-10

    CPC classification number: G01N21/8806 G01N21/93 G01N21/956 G01N2201/06113

    Abstract: In a focal position adjusting method for an inspection apparatus, the inspection apparatus includes an illumination optical system and an imaging optical system configured to perform a defect inspection of a pattern formed in a sample using an image imaged on a first sensor. The focal position adjusting method includes illuminating the light from the first light source on the sample after transmitting the light through a first slit disposed in the illumination optical system. The light from the first light source is condensed into a second sensor disposed in the imaging optical system. A light intensity distribution of a pupil of the illumination optical system is observed. The focal position of the illumination optical system is adjusted by obtaining each light quantity of the front focus and the rear focus of the image of the first slit projected on the sample based on the light intensity distribution.

    Abstract translation: 在用于检查装置的焦点位置调整方法中,检查装置包括照明光学系统和成像光学系统,其被配置为使用在第一传感器上成像的图像来对形成在样本中的图案进行缺陷检查。 焦点位置调整方法包括:在通过设置在照明光学系统中的第一狭缝透射光之后照射来自第一光源的光。 来自第一光源的光被冷凝成设置在成像光学系统中的第二传感器。 观察照明光学系统的光瞳的光强分布。 基于光强度分布,通过获得投射在样品上的第一狭缝的图像的前焦点和后焦点的每个光量来调整照明光学系统的焦点位置。

    LUMINOUS FLUX BRANCHING ELEMENT AND MASK DEFECT INSPECTION APPARATUS
    4.
    发明申请
    LUMINOUS FLUX BRANCHING ELEMENT AND MASK DEFECT INSPECTION APPARATUS 有权
    LUMINOUS FLUX分支元件和掩模缺陷检测设备

    公开(公告)号:US20130176559A1

    公开(公告)日:2013-07-11

    申请号:US13737106

    申请日:2013-01-09

    Abstract: A luminous flux branching element includes a transparent base member arranged diagonally to an optical axis and having an incidence plane and an emission plane parallel to each other. Incident light from the incidence plane is split into a main luminous flux emitted from an emission position on the emission plane and a branched luminous flux emitted from a branch position apart from the emission position and having a smaller light quantity than of the main luminous flux. A reflecting member is arranged on the incidence plane to cause the incidence plane to reflect reflected light from the emission plane. A non-coat region in which antireflection-treatment is not performed is formed in a region of the emission plane where the incident light from the incidence plane is reached, and antireflection-treatment is performed in the emission plane excluding the non-coat region and the incidence plane.

    Abstract translation: 光通量分支元件包括与光轴对角布置并具有彼此平行的入射平面和发射平面的透明基底部件。 来自入射平面的入射光被分为从发射平面上的发射位置发射的主光束和从离发射位置分支位置发射的分支光束,并且具有比主光束小的光量。 反射构件设置在入射平面上,以使入射平面反射来自发射平面的反射光。 在其中到达来自入射面的入射光的发射面的区域中形成未进行防反射处理的非涂层区域,并且在除了非涂覆区域以外的发射面进行防反射处理, 发射机。

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