公开(公告)号：US20210175067A1

公开(公告)日：2021-06-10

申请号：US16616723

申请日：2018-04-26

Applicant: PLANSEE SE ,  OSRAM GMBH

Inventor： HANNES TRAXLER ,  INGMAR WESEMANN ,  WOLFRAM KNABL ,  ALEXANDER TAUTERMANN ,  MARIA NILIUS

IPC: H01J61/073 ,  H01J9/04 ,  C22C1/05

Abstract: A cathode material for use in a high-pressure discharge lamp contains a matrix based on tungsten having a tungsten content of greater than or equal to 95% by weight, tungsten carbide, and oxides and/or predominantly oxidic phases of one or more emitter elements from the group of rare earth metals, Hf, and Zr. The cathode material additionally contains predominantly carbidic phases of the one or more emitter elements from the group of rare earth metals, Hf, and Zr. A high-pressure discharge lamp would contain such a cathode composed of the above cathode material.

公开(公告)号：US20190024260A1

公开(公告)日：2019-01-24

申请号：US16073184

申请日：2017-01-26

Applicant: PLANSEE SE

Inventor： MICHAEL MARK ,  HANNES TRAXLER ,  MICHAEL O'SULLIVAN ,  WOLFRAM KNABL ,  ALEXANDER LORICH ,  ROBERT SCHIFTNER

IPC: C30B35/00

Abstract: A crucible includes a wall made of a base material of tungsten or molybdenum or of a material based on tungsten or molybdenum. A barrier layer is disposed at least in sections on an outer side of the wall and/or in the wall. The barrier layer is made of a metallic material having a greater affinity for carbon and/or oxygen than the base material. A method for using a crucible for producing single-crystal sapphire or fused quartz and a method for producing a crucible for high-temperature applications are also provided.

公开(公告)号：US20180130631A1

公开(公告)日：2018-05-10

申请号：US15572240

申请日：2016-05-02

Applicant: PLANSEE SE

Inventor： NICO EBERHARDT ,  WOLFRAM KNABL ,  STEFAN SCHOENAUER ,  ANDREAS WUCHERPFENNIG

IPC: H01J35/08

CPC classification number: H01J35/08 ,  H01J35/10 ,  H01J2235/084 ,  H01J2235/088

Abstract: An x-ray anode for generating x-radiation includes a carrier body and a first emission layer and at least one second emission layer, which generate x-radiation when they are impinged by electrons. The emission layers are separated by an intermediate layer on one side of the carrier body and are arranged a distance apart in a central direction of the x-ray anode.

公开(公告)号：US20160254128A1

公开(公告)日：2016-09-01

申请号：US15033427

申请日：2014-10-27

Applicant: PLANSEE SE

Inventor： NIKOLAUS REINFRIED ,  MICHAEL SCHOBER ,  WOLFRAM KNABL ,  JOERG WINKLER

IPC: H01J37/34 ,  C23C14/14 ,  C23C14/34 ,  B22F3/20 ,  B22F3/16 ,  B22F3/17 ,  B22F3/18 ,  C22C27/04 ,  B22F1/00

CPC classification number: H01J37/3429 ,  B22F1/0003 ,  B22F3/16 ,  B22F3/17 ,  B22F3/18 ,  B22F3/20 ,  B22F2201/01 ,  B22F2201/10 ,  B22F2201/20 ,  B22F2301/20 ,  C22C27/04 ,  C23C14/14 ,  C23C14/3414 ,  H01J37/342 ,  H01J37/3423 ,  H01J37/3491

Abstract: A sputtering target is composed of an Mo alloy containing at least one metal of group 5 of the Periodic Table, where the average content of group 5 metal is from 5 to 15 at % and the Mo content is ≧80 at %. The sputtering target has an average C/O ratio in (at %/at %) of ≧1. The sputtering targets can be produced by shaping or forming and have an improved sputtering behavior.

Abstract translation: 溅射靶由含有周期表第5族金属的至少一种金属的Mo合金构成，其中第5族金属的平均含量为5〜15原子％，Mo含量为≥80原子％。 溅射靶的平均C / O比（at％/ at％）为≥1。 溅射靶可以通过成形或成型制造并具有改进的溅射行为。

公开(公告)号：US20160254115A1

公开(公告)日：2016-09-01

申请号：US15133480

申请日：2016-04-20

Applicant: PLANSEE SE

Inventor： JOHANN EITER ,  JUERGEN SCHATTE ,  WOLFGANG GLATZ ,  WOLFRAM KNABL ,  GERHARD LEICHTFRIED ,  STEFAN SCHOENAUER

IPC: H01J35/10

CPC classification number: H01J35/108 ,  H01J2235/081 ,  H01J2235/085

Abstract: A rotary X-ray anode has a support body and a focal track formed on the support body. The support body and the focal track are produced as a composite by powder metallurgy. The support body is formed from molybdenum or a molybdenum-based alloy and the focal track is formed from tungsten or a tungsten-based alloy. Here, in the conclusively heat-treated rotary X-ray anode, at least one portion of the focal track is located in a non-recrystallized and/or in a partially recrystallized structure.

Abstract translation: 旋转X射线阳极具有形成在支撑体上的支撑体和焦点轨迹。 支撑体和焦轨通过粉末冶金制成复合材料。 支撑体由钼或钼基合金形成，焦点轨道由钨或钨基合金形成。 这里，在最终热处理的旋转X射线阳极中，焦点轨道的至少一部分位于未再结晶和/或部分重结晶的结构中。

公开(公告)号：US20200222985A1

公开(公告)日：2020-07-16

申请号：US16626644

申请日：2018-06-12

Applicant: PLANSEE SE

Inventor： THOMAS HUBER ,  KATRIN KNITTL ,  WOLFRAM KNABL ,  WOLFGANG SIMADER

IPC: B22F3/17 ,  B22D11/06 ,  C22F1/18 ,  B22F3/06 ,  B22F3/18

Abstract: A slinger, or slinger ring, for a melt spinning apparatus has a cylindrical, mechanically shaped main element that is composed of a refractory metal or a refractory metal-based alloy and has a circumferential surface running in a tangential direction. The circumferential surface is delimited in the axial direction by two end faces. A degree of deformation in the radial direction is greater than the degree of deformation in the axial direction.

公开(公告)号：US20190177201A1

公开(公告)日：2019-06-13

申请号：US16088164

申请日：2017-03-23

Applicant: PLANSEE SE

Inventor： HANNES TRAXLER ,  MICHAEL MARK ,  ROBERT SCHIFTNER ,  WOLFRAM KNABL

IPC: C03B5/425 ,  C22F1/18 ,  B22F3/24 ,  C03B5/167 ,  C03B5/43

Abstract: A process for producing a glass melting component composed of refractory metal. A surface zone of the glass melting component is densified at least in sections by application of local compressive stress. As a result the surface zone has its porosity reduced compared to a volume section which is located underneath the surface zone and which has residual porosity.

公开(公告)号：US20150354055A1

公开(公告)日：2015-12-10

申请号：US14764007

申请日：2014-01-29

Applicant: PLANSEE SE

Inventor： CHRISTIAN LINKE ,  JIEHUA LI ,  PETER SCHUMACHER ,  WOLFRAM KNABL ,  GERHARD LEICHTFRIED

IPC: C23C14/34 ,  B22F3/12 ,  B22F9/08 ,  H01L31/18 ,  B22F1/00 ,  C22C30/02 ,  C22C24/00 ,  H01J37/34 ,  B22F3/02 ,  B22F9/04

CPC classification number: C23C14/3414 ,  B22F1/00 ,  B22F3/02 ,  B22F3/12 ,  B22F3/15 ,  B22F9/04 ,  B22F9/082 ,  B22F2003/1051 ,  B22F2998/10 ,  C22C1/0425 ,  C22C1/0491 ,  C22C9/00 ,  C22C24/00 ,  C22C28/00 ,  C22C30/02 ,  H01J37/3426 ,  H01L31/18 ,  B22F3/10 ,  B22F3/20 ,  B22F3/18 ,  B22F3/17

Abstract: A sputtering target is composed of an alloy consisting of 5 to 70 at % of at least one element from the group of (Ga, In) and 0.1 to 15 at % of Na, the remainder being Cu and typical impurities. The sputtering target includes at least one intermetallic Na-containing phase.

Abstract translation: 溅射靶由5〜70at％的由（Ga，In）组成的至少一种元素和0.1〜15at％的Na组成的合金构成，余量为Cu和典型的杂质。 溅射靶包括至少一种金属间含Na的相。