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    Methods For Directed Irradiation Synthesis With Ion and Thermal Beams
    1.
    发明申请
    Methods For Directed Irradiation Synthesis With Ion and Thermal Beams 有权
    使用离子和热束进行定向辐射合成的方法

    公开(公告)号：US20150292077A1

    公开(公告)日：2015-10-15

    申请号：US14441140

    申请日：2013-11-06

    Applicant: PURDUE RESEARCH FOUNDATION

    Inventor： Jean Paul Allain ,  Osman J. El-Atwani ,  Juan Jose Pavon Palacio

    IPC: C23C14/22

    CPC classification number: C23C14/221 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/304 ,  H01J2237/317 ,  Y10S977/896

    Abstract: A method for fabricating structures on substrate having a substrate surface includes providing a set of control parameters to an ion beam source and thermal source corresponding to a desired nanostructure topology. The method also includes forming a plurality of nanostructures in a first surface area of the substrate by exposing the substrate surface to an ion beam from the ion beam source and thermal energy from the thermal source. The ion beam has a first area of effect on the substrate surface, and the thermal energy has an second area of effect on the substrate surface Each of the first area and the second area includes the first surface area. In other words, the coincident beams under the set of control parameters produces a plurality of nano structures.

    Abstract translation: 一种用于在具有衬底表面的衬底上制造结构的方法包括向对应于期望的纳米结构拓扑的离子束源和热源提供一组控制参数。 该方法还包括通过将衬底表面暴露于离子束源的离子束和来自热源的热能在衬底的第一表面区域中形成多个纳米结构。 离子束具有在衬底表面上的第一效果区域，并且热能在衬底表面上具有第二区域效应。第一区域和第二区域中的每一个包括第一表面区域。 换句话说，在该组控制参数下的重合光束产生多个纳米结构。

    Methods for directed irradiation synthesis with ion and thermal beams
    4.
    发明授权
    Methods for directed irradiation synthesis with ion and thermal beams 有权

    公开(公告)号：US10309006B2

    公开(公告)日：2019-06-04

    申请号：US15924026

    申请日：2018-03-16

    Applicant: Purdue Research Foundation

    Inventor： Jean Paul Allain ,  Osman J. El-Atwani ,  Juan Jose Pavon Palacio

    IPC: C23C14/22 ,  H01J37/304 ,  H01J37/302 ,  B82Y40/00

    Abstract: A method for fabricating structures includes on a substrate includes providing a set of control parameters to an ion beam source and to a thermal source corresponding to a desired structure topology. The method also includes using directed irradiation synthesis to form nano structures and/or microstructures in a first surface area of the substrate by exposing the substrate surface to an ion beam from the ion beam source and to thermal particles from the thermal source. The ion beam having a first area of effect on the substrate surface, and the thermal particles having a second area of effect on the substrate surface, each of the first area of effect and the second area of effect including the first surface area.

    Methods for Directed Irradiation Synthesis with Ion and Thermal Beams
    6.
    发明申请
    Methods for Directed Irradiation Synthesis with Ion and Thermal Beams 有权

    公开(公告)号：US20210040600A1

    公开(公告)日：2021-02-11

    申请号：US17075132

    申请日：2020-10-20

    Applicant: Purdue Research Foundation

    Inventor： Jean Paul Allain ,  Osman J. El-Atwani ,  Juan Jose Pavon Palacio

    IPC: C23C14/22 ,  H01J37/304 ,  H01J37/302 ,  B82Y40/00

    Abstract: A method for fabricating structures includes on a substrate includes providing the substrate having a substrate surface, and generating nanostructures or microstructures on the substrate surface at least in part by exposing the substrate surface to thermal particles from a thermal particle source while irradiating the substrate surface with an ion beam. The generated nanostructures or microstructures have a smaller surface area than the area of incidence of the ion beam or a beam generated by the thermal particle source. The method also includes obtaining a measurement of a characteristic of the substrate surface and adjusting at least one of the thermal particle source and the ion beam based on the measurement.

    Methods for directed irradiation synthesis with ion and thermal beams
    7.
    发明授权
    Methods for directed irradiation synthesis with ion and thermal beams 有权

    公开(公告)号：US10808313B2

    公开(公告)日：2020-10-20

    申请号：US16426961

    申请日：2019-05-30

    Applicant: Purdue Research Foundation

    Inventor： Jean Paul Allain ,  Osman J. El-Atwani ,  Juan Jose Pavon Palacio

    IPC: B82Y40/00 ,  C23C14/22 ,  H01J37/304 ,  H01J37/302

    Abstract: A method for fabricating structures includes on a substrate includes providing the substrate having a substrate surface, and providing a set of control parameters to an ion beam source and to a thermal source corresponding to a desired structure topology. The method further includes using directed irradiation synthesis to cause self-organization of a plurality of structures comprising at least one of the group of nanostructures and microstructures in a first surface area of the substrate by exposing the substrate surface to an ion beam from the ion beam source and to thermal particles from the thermal source. The ion beam has a first area of effect on the substrate surface, and the thermal particles has a second area of effect on the substrate surface. Each of the first area of effect and the second area of effect including the first surface area.

    Methods for Directed Irradiation Synthesis with Ion and Thermal Beams
    8.
    发明申请
    Methods for Directed Irradiation Synthesis with Ion and Thermal Beams 审中-公开

    公开(公告)号：US20190292652A1

    公开(公告)日：2019-09-26

    申请号：US16426961

    申请日：2019-05-30

    Applicant: Purdue Research Foundation

    Inventor： Jean Paul Allain ,  Osman J. El-Atwani ,  Juan Jose Pavon Palacio

    IPC: C23C14/22 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/304

    Abstract: A method for fabricating structures includes on a substrate includes providing the substrate having a substrate surface, and providing a set of control parameters to an ion beam source and to a thermal source corresponding to a desired structure topology. The method further includes using directed irradiation synthesis to cause self-organization of a plurality of structures comprising at least one of the group of nanostructures and microstructures in a first surface area of the substrate by exposing the substrate surface to an ion beam from the ion beam source and to thermal particles from the thermal source. The ion beam has a first area of effect on the substrate surface, and the thermal particles has a second area of effect on the substrate surface. Each of the first area of effect and the second area of effect including the first surface area.

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