公开(公告)号：US20190285520A1

公开(公告)日：2019-09-19

申请号：US16352140

申请日：2019-03-13

Applicant: SYSMEX CORPORATION

Inventor： Koya YAMAWAKI ,  Kichitarou NAKAJIMA ,  Katsumi NAKANISHI ,  Yasuko KAWAMOTO ,  Ayato TAGAWA

IPC: G01N1/38

Abstract: A sample processing method comprises storing a processing liquid (11) containing a target component (10) and a diluent (12) for diluting the processing liquid (11) in a reservoir (110) of a sample processing chip (100), and agitating the processing liquid (11) and the diluent (12) in the reservoir (110) by introducing a gas into the reservoir (110). The processing liquid (11) is diluted in order to prepare a droplet forming sample (13) for forming droplets (14) individually encapsulating the target component (10).